410 Processing on Laser Annealed wafers.

Ed Myers edmyers at stanford.edu
Thu Apr 28 16:24:43 PDT 2005


Bipin,

Mary and I talked over your request.  Your process is OK as long as you 
decontaminate the silicide pots.

Regards,


At 10:17 AM 4/28/2005, Bipin Rajendran wrote:
>Ooops, Sorry, I missed the attachment.
>Thanks
>Bipin
>
>----- Original Message ----- From: "Mary Tang" <mtang at snf.stanford.edu>
>To: "Bipin Rajendran" <bipin at stanford.edu>
>Sent: Thursday, April 28, 2005 10:08 AM
>Subject: Re: 410 Processing on Laser Annealed wafers.
>
>
>>Hi Bipin --
>>No attachment?
>>M
>>Bipin Rajendran wrote:
>>
>>>Dear SpecMat Members,
>>>I am attaching a detailed run-sheet for continuing the fabrication of 
>>>transistors after Laser Annealing (at a facility outside SNF that deals 
>>>with many different metal films). This request was earlier approved 
>>>broadly, and the attached sheet has the history of all past emails. I 
>>>would be much obliged if this request is approved at the earliest convinience.
>>>Thanks
>>>Bipin
>>
>>-- Mary X. Tang, Ph.D.
>>Stanford Nanofabrication Facility
>>CIS Room 136, Mail Code 4070
>>Stanford, CA  94305
>>(650)723-9980
>>mtang at stanford.edu
>>http://snf.stanford.edu
>






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