410 Processing on Laser Annealed wafers.
edmyers at stanford.edu
Thu Apr 28 16:24:43 PDT 2005
Mary and I talked over your request. Your process is OK as long as you
decontaminate the silicide pots.
At 10:17 AM 4/28/2005, Bipin Rajendran wrote:
>Ooops, Sorry, I missed the attachment.
>----- Original Message ----- From: "Mary Tang" <mtang at snf.stanford.edu>
>To: "Bipin Rajendran" <bipin at stanford.edu>
>Sent: Thursday, April 28, 2005 10:08 AM
>Subject: Re: 410 Processing on Laser Annealed wafers.
>>Hi Bipin --
>>Bipin Rajendran wrote:
>>>Dear SpecMat Members,
>>>I am attaching a detailed run-sheet for continuing the fabrication of
>>>transistors after Laser Annealing (at a facility outside SNF that deals
>>>with many different metal films). This request was earlier approved
>>>broadly, and the attached sheet has the history of all past emails. I
>>>would be much obliged if this request is approved at the earliest convinience.
>>-- Mary X. Tang, Ph.D.
>>Stanford Nanofabrication Facility
>>CIS Room 136, Mail Code 4070
>>Stanford, CA 94305
>>mtang at stanford.edu
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