410 Processing on Laser Annealed wafers.

Ed Myers edmyers at stanford.edu
Thu Apr 28 16:24:43 PDT 2005


Mary and I talked over your request.  Your process is OK as long as you 
decontaminate the silicide pots.


At 10:17 AM 4/28/2005, Bipin Rajendran wrote:
>Ooops, Sorry, I missed the attachment.
>----- Original Message ----- From: "Mary Tang" <mtang at snf.stanford.edu>
>To: "Bipin Rajendran" <bipin at stanford.edu>
>Sent: Thursday, April 28, 2005 10:08 AM
>Subject: Re: 410 Processing on Laser Annealed wafers.
>>Hi Bipin --
>>No attachment?
>>Bipin Rajendran wrote:
>>>Dear SpecMat Members,
>>>I am attaching a detailed run-sheet for continuing the fabrication of 
>>>transistors after Laser Annealing (at a facility outside SNF that deals 
>>>with many different metal films). This request was earlier approved 
>>>broadly, and the attached sheet has the history of all past emails. I 
>>>would be much obliged if this request is approved at the earliest convinience.
>>-- Mary X. Tang, Ph.D.
>>Stanford Nanofabrication Facility
>>CIS Room 136, Mail Code 4070
>>Stanford, CA  94305
>>mtang at stanford.edu

More information about the specmat mailing list