[Fwd: Request regarding WbDiff]

Mary Tang mtang at snf.stanford.edu
Thu Aug 25 16:03:14 PDT 2005

Hi all --

Ritesh asked this question and I asked him to email SpecMat.  My two 
cents' -- I've no problem with losing the HF dip, but am a little 
uncomfortable about dispensing with the HCL dip...   I wonder...  is 
there is actually any more oxidation of silicon following two piranha 
cleans than there is following a 5:1:1 H2O:HCl:H2O2 dip?  Does anyone 
know?  Think it's worth asking Ritesh to check?


Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
mtang at stanford.edu

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