[Fwd: Request regarding WbDiff]

[Mary Tang]

Hi all --

Ritesh asked this question and I asked him to email SpecMat.  My two 
cents' -- I've no problem with losing the HF dip, but am a little 
uncomfortable about dispensing with the HCL dip...   I wonder...  is 
there is actually any more oxidation of silicon following two piranha 
cleans than there is following a 5:1:1 H2O:HCl:H2O2 dip?  Does anyone 
know?  Think it's worth asking Ritesh to check?

Mary

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From: Ritesh Jhaveri <riteshj at ee.ucla.edu>
Subject: Request regarding WbDiff
Date: Thu, 25 Aug 2005 15:27:51 -0700 (PDT)
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