Thin film sputtered aluminum nitride wafer processing
Gary Yama (RTC)
gary.yama at rtc.bosch.com
Tue Jan 18 17:37:05 PST 2005
I'm interested in processing sputtered piezoelectric aluminum nitride.
Film would be deposited at a vendor, photolith, dry etching, wet
cleaning, and other processing in CMOS clean equipment. Assuming the
aluminum nitride sputtering tool is CMOS clean, are there any other
restrictions on which CMOS clean tool I can use at Stanford?
Are these compatible:
Thanks - Gary
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