Thin film sputtered aluminum nitride wafer processing

[Gary Yama (RTC)]

I'm interested in processing sputtered piezoelectric aluminum nitride.  
Film would be deposited at a vendor, photolith, dry etching, wet 
cleaning, and other processing in CMOS clean equipment.  Assuming the 
aluminum nitride sputtering tool is CMOS clean, are there any other 
restrictions on which CMOS clean tool I can use at Stanford?

Are these compatible:

wbdiff
wbnonmetal
tylan oxidation
thermco
svgcoat, svgdev
ultratech
evalign
drytek2
p5000
lampoly
stsetch
epi
gasonics

Thanks - Gary