[Fwd: AP 400]

Mahnaz Mansourpour mahnaz at snf.stanford.edu
Thu Jul 14 16:36:54 PDT 2005

Hello all,

For sake of documentation...
i already have ok this chemical more than a year a go, she is asking for 
a different version of it.
I am ok with this.


-------- Original Message --------
Subject: 	AP 400
Date: 	Mon, 11 Jul 2005 15:09:48 -0700
From: 	Astrid Tomada <atomada at stanford.edu>
To: 	Mahnaz Mansourpour <mahnaz at snf.stanford.edu>

Hi Mahnaz,
CDMS group need to test and use the AP 400 due to the serious problems 
encounter during Tungsten wet etching. The photoresist presents 
substantial lifting leaving the wafer almost clean during the etching. 
Implementing  AP400 seems to be our best options since a series of 
tests to improve the photoresist performance have been completed 
without success.


Thank you.

Astrid Tomada
Stanford University
(650) 723 1880
atomada at stanford.edu

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