material approval for tylan4

David Chi dchi at stanford.edu
Tue Mar 8 19:49:49 PST 2005


To: Special Materials Committee

I would like to use tylan4 to anneal my samples in forming gas. The 
temperatures I would use are between 300 and 500C. My material is HfO2 on 
silicon. I have attached a TXRF report from Charles Evans & Associates for 
this material.

Thank you for your consideration.


David Chi
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