Al2O3 - urgent

Michael Deal mdeal at stanford.edu
Fri Mar 18 13:55:47 PST 2005


Rhett,
    What do Reactor 1 and Reactor 2 refer to?  Two different samples from 
two different sources?  Why is there Ti and Fe in them?    And Hf in one of 
them?    -mike


At 01:41 PM 3/18/2005, Brewer, Rhett T wrote:
>I have contamination data from another Al2O3 process that I wanted to 
>bring into the semi-clean equipment group.  There are actually two process 
>from separate chambers.
>
>This film would go into tystar P-doped poly – 580C (3500A), P5000 (poly 
>etch, Al etch chambers), wbmetal for cleaning and resist strip, RTA 4108 
>(I think that is the number) for 700C, 2 min anneal, gryphon for Al 
>coating, P5000 for etching Al, then tylan fga for 400C forming gas anneal 
>(10 min).
>
>I apologize for requesting a quick response, but I have a process on hold 
>waiting for the green light – I was only yesterday able to get a hold of 
>this data.  At the very least please let me know when I might have a 
>semi-official response.
>
>Thank you.
>
>Regards,
>
>Rhett
>
>
>Rhett Brewer
>Intel Corporation
>work: 408-765-8254
>cell: 408-655-3448
><mailto:rhett.t.brewer at intel.com>rhett.t.brewer at intel.com
>
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