New Film supplier

[Brewer, Rhett T]

Specmat,

 

Thank you for taking a look at my Al2O3 film.  Unless I am told otherwise, I will begin growing Al2O3 (these films will not hit the fab until ~Friday) and will follow the requirements submitted by Ed Myers for processing the Al2O3 at SNF.

 

I have included below ICPS from another chamber that I would like to use as an Al2O3 film source in the future.  My schedule calls for running wafers in this chamber (Al2O3 growth) is about 2 weeks.  The results below are for an SiO2 film, but the Al2O3 shares gas lines and an electronics grade TMA is the Aluminum precursor source.  I am trying to avoid the urgency that I have had recently.  

 

The films grown in the chamber below will experience the processing proposed before:

 

This film would go into tystar P-doped poly - 580C (3500A), P5000 (poly 

>etch, Al etch chambers), wbmetal for cleaning and resist strip, RTA 4108 

>(I think that is the number) for 700C, 2 min anneal, gryphon for Al 

>coating, P5000 for etching Al, then tylan fga for 400C forming gas anneal 

>(10 min).

 

Because these films are cleaner than the current ones, I would hope to be able to use wbmetal instead of my own beakers.

Thank you for your involvement.

 

Regards,

 

Rhett

 

See the ICP-MS results

 

 

 

 

SURFACE CONCENTRATION ( x 1010 atoms/cm2)

 

 

 

 

Wafer Size = 8 inch

 

 

 

 

 

Method
Detection Limits

120Å SiO2
Test Wafer

 

 

 

1.

Aluminum

(Al)

0.3

15

 

 

 

2.

Calcium

(Ca)

0.2

10

 

 

 

3.

Chromium

(Cr)

0.1

63

 

 

 

4.

Copper

(Cu)

0.05

0.55

 

 

 

5.

Iron

(Fe)

0.1

2.3

 

 

 

6.

Magnesium

(Mg)

0.3

4.0

 

 

 

7.

Nickel

(Ni)

0.05

0.70

 

 

 

8.

Potassium

(K )

0.2

6.7

 

 

 

9.

Sodium

(Na)

0.2

9.9

 

 

 

10.

Titanium

(Ti)

0.1

2.8

 

 

 

11.

Zinc

(Zn)

0.06

0.85

 

 

 

 

 

 

Rhett Brewer

Intel Corporation

work: 408-765-8254

cell: 408-655-3448

rhett.t.brewer at intel.com <mailto:rhett.t.brewer at intel.com> 

 

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