mcvittie at snf.stanford.edu
Mon Nov 21 18:49:38 PST 2005
Her English is not great. I am confused. Can you explain what she wants to do?
Mary Tang wrote:
> Hey Ed, et al --
> Did we resolve this? She's just been trained on STS, but I really do think
> that drytek is better for her application. No only does she have pieces
> (?) but it appears that her criterion of highest selectivity possible isn't
> really all that important after all. Basically, though, we need to tell her
> how she can deposit poly and where she can etch it and clean the resist.
> (I'm presuming we can consider this all semiclean?)
> Quoting Yan Zhu <yzhu at ee.ucr.edu>:
> > Hi,
> > I have some process like this: Dry oxide + Ti (Gryphon) + LTO, (Ti is
> > cover with LTO) and then I need deposit 2500A poly si, which machine I
> > can use to deposit poly? After the photo process, I need to etch Poly and
> > stop at oxide, may I use STS DRIE for this?
> > Thanks
> > Yan Zhu
> > yzhu at ee.ucr.edu
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