Fwd: Use of metal organic
edmyers at stanford.edu
Tue Nov 22 07:57:22 PST 2005
Thank you for updating your process flow to include the equipment you want
to use. I have a recommendation. The feature size you are showing for
your ebeam work is 200nm. You may want to consider using the Hitachi ebeam
system instead of the Raith. 200nm is compatible with the resolution of
the Hitachi and you will be able to get trained quicker and the machine is
not used as heavily as the Raith.
We also need to involve Jim McVitte concerning your etching. I am not
familiar with the gas chemistries needed to etch YBiFeO or YCeFeO
films. Do you know if you will need a fluorine or chlorine etch chemistry?
At 06:05 PM 11/21/2005, you wrote:
>Dear Ed Myers;
>I attached an updated Process Flow file to this email.
>----- Forwarded message from Hideo Iwase <open4891 at stanford.edu> -----
> Date: Mon, 14 Nov 2005 15:20:50 -0800
> From: Hideo Iwase <open4891 at stanford.edu>
>Reply-To: Hideo Iwase <open4891 at stanford.edu>
> Subject: Use of metal organic
> To: SpecMat at snf.stanford.edu
>To: SpecMat Committee.
>I am Hideo Iwase, a visiting researcher in Vuckovic group. I would like to
>use metal organic materials in SNF to make magnetooptical garnet film. I
>was wondering if you would approve the use of these materials.
>Detailed information is as follows;
>Name: Hideo Iwase
>Group: Vuckovic in Ginzton
>Coral name: hideoiw
>e-mail: hideoiw at snf.stanford.edu
>Material: Metal Organic
> (Mixture of xylene and metal oxides: Y2O3, Bi2O3, CeO2, Fe2O3)
> I attached Japanese MSDS to this e-mail. I am asking a vendor
> for English ones, but it will take a while.
>Vendor: Kojundo Chemical Lab. Co., Ltd
> kojundo. at kojundo.co.jp
>Product names: SYM-Y01, SYM-BI05, SYM-CE03, SYM-FE05
>Process Flow: Please see the attached file.
> The process does not need to be clean.
>Amount: 100 ml
>----- End forwarded message -----
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