Fwd: Use of metal organic

Hideo Iwase open4891 at stanford.edu
Tue Nov 22 10:11:36 PST 2005


Dear Jim McVittie and Ed Myers

Thank you for your advice. I do not need to remove garnet chemically. So,
mrc works for me.
I have taken the training of raith, but not the Hitachi ebeam. I will check
whether it is good for my experiment.

Sincerely,
Hideo

Quoting Jim McVittie <mcvittie at cis.Stanford.EDU>:

> Ed,
>
> The components of YBiFeO or YCeFeO do not form volatile chlorides or
> fluorides. Therefore, Hideo is not going to be able to do a chemically
> assisted plasma etch in our lab.  The best she will be able to do is a
> sputter etch with Ar in the MRC.
>
> 	Jim
>
> On Tue, 22 Nov 2005, Ed Myers wrote:
>
> > Hideo,
> >
> > Thank you for updating your process flow to include the equipment you
> want
> > to use.  I have a recommendation.  The feature size you are showing for
> > your ebeam work is 200nm.  You may want to consider using the Hitachi
> ebeam
> > system instead of the Raith.  200nm is compatible with the resolution
> of
> > the Hitachi and you will be able to get trained quicker and the machine
> is
> > not used as heavily as the Raith.
> >
> > We also need to involve Jim McVitte concerning your etching.  I am not
> > familiar with the gas chemistries needed to etch YBiFeO or YCeFeO
> > films.  Do you know if you will need a fluorine or chlorine etch
> chemistry?
> >
> > Ed
> >
> > At 06:05 PM 11/21/2005, you wrote:
> >
> >
> > >Dear Ed Myers;
> > >
> > >I attached an updated Process Flow file to this email.
> > >
> > >Sincerely,
> > >Hideo Iwase.
> > >
> > >----- Forwarded message from Hideo Iwase <open4891 at stanford.edu> -----
> > >     Date: Mon, 14 Nov 2005 15:20:50 -0800
> > >     From: Hideo Iwase <open4891 at stanford.edu>
> > >Reply-To: Hideo Iwase <open4891 at stanford.edu>
> > >  Subject: Use of metal organic
> > >       To: SpecMat at snf.stanford.edu
> > >
> > >
> > >To: SpecMat Committee.
> > >
> > >I am Hideo Iwase, a visiting researcher in Vuckovic group. I would
> like to
> > >use metal organic materials in SNF to make magnetooptical garnet film.
> I
> > >was wondering if you would approve the use of these materials.
> > >Detailed information is as follows;
> > >
> > >Name: Hideo Iwase
> > >Group: Vuckovic in Ginzton
> > >Coral name: hideoiw
> > >Phone: 650-380-1990
> > >e-mail: hideoiw at snf.stanford.edu
> > >
> > >Material: Metal Organic
> > >          (Mixture of xylene and metal oxides: Y2O3, Bi2O3, CeO2,
> Fe2O3)
> > >          I attached Japanese MSDS to this e-mail. I am asking a
> vendor
> > >          for English ones, but it will take a while.
> > >
> > >Vendor:  Kojundo Chemical Lab. Co., Ltd
> > >          kojundo. at kojundo.co.jp
> > >          http://www.kojundo.co.jp/e/index.htm
> > >
> > >Product names: SYM-Y01, SYM-BI05, SYM-CE03, SYM-FE05
> > >
> > >Process Flow: Please see the attached file.
> > >               The process does not need to be clean.
> > >
> > >Amount:  100 ml
> > >
> > >
> > >----- End forwarded message -----
> > >
> > >
> > >
> > >
> >
> >
> >
> >
>
> --
> --------------------------------------------------------------
> Jim McVittie, Ph.D.    			Senior Research Scientist
> Allen Center for Integrated Systems     Electrical Engineering
> Stanford University             	jmcvittie at stanford.edu
> Rm. 336, 330 Serra Mall			Fax: (650) 723-4659
> Stanford, CA 94305-4075			Tel: (650) 725-3640
>
>
>





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