ALD HfO2 in Prof. McIntyre's Lab
edmyers at stanford.edu
Wed Oct 5 09:07:41 PDT 2005
I looked over your request. SpecMat has established TXRF limits for our
Clean and SemiClean classifications. Unfortunately, your data shows you
slightly higher than the allowed contamination limits (1E12
atoms/cm2). Since one of the offenders is iron, I am reluctant to
recommend approval of your sample. Is there a chance the system could be
cleaned to clear up some of the contamination?
At 10:59 AM 10/4/2005, Ching-Huang Lu wrote:
>Raghav and I have been trying to build transistors with ALD HfO2 in Prof.
>We would like to get this ALD film certified so that we can start the
>processing in the semi-clean tools.
>Attached please find the TXRF data file. This TXRF data obtained on our
>ALD HfO2 shows that the film is pretty clean.
>Please let us know if you have any question or need more information.
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