[Fwd: Re: [Fwd: approved materials for headway/karlsuss]]

Paul Rissman rissman at stanford.edu
Tue Sep 6 14:02:29 PDT 2005


I agree.

At 01:51 PM 9/6/2005, Mary Tang wrote:
>Hi everyone --
>
>Sounds good to me (the thickness should be fine and as long as there is no 
>etching, it should be OK.)  Any objections?
>
>Mary
>
>--
>Mary X. Tang, Ph.D.
>Stanford Nanofabrication Facility
>CIS Room 136, Mail Code 4070
>Stanford, CA  94305
>(650)723-9980
>mtang at stanford.edu
>http://snf.stanford.edu
>
>
>
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>From: "Simon Fishel" <sfishel at stanford.edu>
>To: "'Mary Tang'" <mtang at snf.stanford.edu>
>Subject: RE: [Fwd: approved materials for headway/karlsuss]
>Date: Tue, 6 Sep 2005 10:22:23 -0700
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>
>Mary,
>
>The samples are cleaned in our lab prior to bringing them into SNF, so
>we will just bake them in the Singe oven before coating them in the
>Headway.  Depending on the resist we end up using, most likely SPR220-7,
>we will then do the appropriate pre-exposure bake, expose the samples on
>the Karlsuss, and develop them in the solvent bench.  The resist itself
>serves as our features, so there is no etch involved.
>
>The samples are circular, 3/4 inch in diameter, and about 0.5 mm thick.
>We are only patterning one layer, and our features are on the order of
>millimeters, so very little alignment precision is needed.
>
>Let me know if you need any more information.
>
>Simon
>
>-----Original Message-----
>From: Mary Tang [mailto:mtang at snf.stanford.edu]
>Sent: Tuesday, September 06, 2005 9:13 AM
>To: Mahnaz Mansourpour
>Cc: specmat; sfishel at stanford.edu
>Subject: Re: [Fwd: approved materials for headway/karlsuss]
>
>Hi Simon/Mahnaz --
>
>Although in principle, it should be safe to use, could we get a little
>more information?  CaF has been used in the lab, but there are a couple
>of concerns with patterning it...
>
>1.  Could we get a process flow?  Will the CaF be cleaned in the lab
>prior to lithography?  After lithography, will it be etched in the lab?
>2.  What are the dimensions of the CaF substrate?  (The contact aligners
>
>[and even the headway] can tolerate only a limited range of substrate
>thicknesses.)
>3.  And just out of curiosity, what are the general dimensions of the
>features to be patterned and with what alignment precision, if any?
>
>Thanks,
>
>Mary
>
>Mahnaz Mansourpour wrote:
>
> >
> >
> > -------- Original Message --------
> > Subject:      approved materials for headway/karlsuss
> > Date:         Fri, 2 Sep 2005 09:43:06 -0700
> > From:         Simon Fishel <sfishel at stanford.edu>
> > To:   'Mahnaz Mansourpour' <mahnaz at snf.stanford.edu>
> >
> >
> >
> >Mahnaz,
> >
> >I was wondering if calcium fluoride glass is an approved substrate for
> >use in the headway and the karlsuss.  Please let me know.
> >
> >Thanks,
> >
> >Simon
> >
> >
> >
>
>
>--
>Mary X. Tang, Ph.D.
>Stanford Nanofabrication Facility
>CIS Room 136, Mail Code 4070
>Stanford, CA  94305
>(650)723-9980
>mtang at stanford.edu
>http://snf.stanford.edu




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