[Fwd: Re: [Fwd: approved materials for headway/karlsuss]]

Mary Tang mtang at snf.stanford.edu
Tue Sep 6 14:26:14 PDT 2005


Hi Simon --

Three of us agree (Paul, Mahnaz, and me.)  I think that's a SpecMat 
quorum.  Your request is filed and approved.

Thanks!

Mary

Paul Rissman wrote:

> I agree.
>
> At 01:51 PM 9/6/2005, Mary Tang wrote:
>
>> Hi everyone --
>>
>> Sounds good to me (the thickness should be fine and as long as there 
>> is no etching, it should be OK.)  Any objections?
>>
>> Mary
>>
>> -- 
>> Mary X. Tang, Ph.D.
>> Stanford Nanofabrication Facility
>> CIS Room 136, Mail Code 4070
>> Stanford, CA  94305
>> (650)723-9980
>> mtang at stanford.edu
>> http://snf.stanford.edu
>>
>>
>>
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>> From: "Simon Fishel" <sfishel at stanford.edu>
>> To: "'Mary Tang'" <mtang at snf.stanford.edu>
>> Subject: RE: [Fwd: approved materials for headway/karlsuss]
>> Date: Tue, 6 Sep 2005 10:22:23 -0700
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>>
>> Mary,
>>
>> The samples are cleaned in our lab prior to bringing them into SNF, so
>> we will just bake them in the Singe oven before coating them in the
>> Headway.  Depending on the resist we end up using, most likely SPR220-7,
>> we will then do the appropriate pre-exposure bake, expose the samples on
>> the Karlsuss, and develop them in the solvent bench.  The resist itself
>> serves as our features, so there is no etch involved.
>>
>> The samples are circular, 3/4 inch in diameter, and about 0.5 mm thick.
>> We are only patterning one layer, and our features are on the order of
>> millimeters, so very little alignment precision is needed.
>>
>> Let me know if you need any more information.
>>
>> Simon
>>
>> -----Original Message-----
>> From: Mary Tang [mailto:mtang at snf.stanford.edu]
>> Sent: Tuesday, September 06, 2005 9:13 AM
>> To: Mahnaz Mansourpour
>> Cc: specmat; sfishel at stanford.edu
>> Subject: Re: [Fwd: approved materials for headway/karlsuss]
>>
>> Hi Simon/Mahnaz --
>>
>> Although in principle, it should be safe to use, could we get a little
>> more information?  CaF has been used in the lab, but there are a couple
>> of concerns with patterning it...
>>
>> 1.  Could we get a process flow?  Will the CaF be cleaned in the lab
>> prior to lithography?  After lithography, will it be etched in the lab?
>> 2.  What are the dimensions of the CaF substrate?  (The contact aligners
>>
>> [and even the headway] can tolerate only a limited range of substrate
>> thicknesses.)
>> 3.  And just out of curiosity, what are the general dimensions of the
>> features to be patterned and with what alignment precision, if any?
>>
>> Thanks,
>>
>> Mary
>>
>> Mahnaz Mansourpour wrote:
>>
>> >
>> >
>> > -------- Original Message --------
>> > Subject:      approved materials for headway/karlsuss
>> > Date:         Fri, 2 Sep 2005 09:43:06 -0700
>> > From:         Simon Fishel <sfishel at stanford.edu>
>> > To:   'Mahnaz Mansourpour' <mahnaz at snf.stanford.edu>
>> >
>> >
>> >
>> >Mahnaz,
>> >
>> >I was wondering if calcium fluoride glass is an approved substrate for
>> >use in the headway and the karlsuss.  Please let me know.
>> >
>> >Thanks,
>> >
>> >Simon
>> >
>> >
>> >
>>
>>
>> -- 
>> Mary X. Tang, Ph.D.
>> Stanford Nanofabrication Facility
>> CIS Room 136, Mail Code 4070
>> Stanford, CA  94305
>> (650)723-9980
>> mtang at stanford.edu
>> http://snf.stanford.edu
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu





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