Aluminum nitride approval request
Ed Myers
edmyers at stanford.edu
Tue Sep 20 09:42:32 PDT 2005
Ben,
In general the company saying they are CMOS clean is not sufficient. There
are facilities which SpecMat has approved as CMOS clean, and wafers from
these companies can be processed in our clean equipment group. If the
wafers do not come from these companies, we can certify there level of
contamination by TXRF and then they will be allowed in the clean equipment set.
We did have one large company come in with wafers they said were CMOS
clean, but from an unknown vendor. We requested TXRF data and found the
wafers to be heavily Cu contaminated. The company had two chambers for the
deposition and only one of them showed the high levels. Ultimately the
deposition company was forced to do a major clean up on the chamber before
they were allowed to process any more wafers.
SpecMat will need more information on the origin of the wafers or
verification of their level of contamination before they will be approved
for the clean equipment set.
Ed
At 04:06 PM 9/19/2005, you wrote:
>Ed,
>
> I also got confirmation from the company doing the Mo-AlN
>deposition that the films are CMOS clean, without gold or other
>contamination.
>
>Ben
>
>
>--- Benjamin Chui <bwchui at yahoo.com> wrote:
>
> > Ed,
> >
> > The film actually consists of a Mo-AlN-Mo (molybdenum and
> > aluminum
> > nitride) stack. The tools that we expect to be using are:
> >
> > svgcoat
> > EValign/KarlSuss
> > svgdev
> >
> > drytek2
> > AMT
> > wbmetal
> > gasonics
> >
> > STSetch (any exposed metal will be fully encapsulated by photoresist,
> > a
> > method previously approved by Jim McVittie)
> >
> > Please advise if any of these material-tool combinations are a
> > problem.
> >
> > Thanks!
> >
> > Ben
> >
> >
> > --- Ed Myers <edmyers at stanford.edu> wrote:
> >
> > > Ben,
> > >
> > > It's not the bringing them in to the fab, it's what tools they will
> > > be
> > > processed in and the level of cleanliness of the wafers. You will
> > > need to
> > > provide a process flow (tools) that will see the wafers.
> > >
> > > Regards,
> > >
> > >
> > > At 12:01 PM 9/19/2005, you wrote:
> > > >Hello specmat team,
> > > >
> > > > I'd like to request approval to bring wafers with deposited
> > > aluminum
> > > >nitride (AlN) film into the SNF clean room. I hope this is OK
> > since
> > > >users are specifically using AlN in place of PZT for its CMOS
> > > >compatibility in building piezoelectric sensors. The company
> > > >depositing the AlN also cites this advantage.
> > > >
> > > >Thanks,
> > > >
> > > >Ben Chui
> > >
> > >
> > >
> > >
> >
> >
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