Request for Molybdenum etch in pquest

Colby Bellew colby.bellew at sri.com
Fri Feb 10 10:22:31 PST 2006


Jim,

I am certainly willing to try more combinations with fluorine but until 
we find something that works, I would like to investigate all possible 
alternatives.  Do you have any specific issues with trying the chlorine 
etch in the pquest?

Colby

Jim McVittie wrote:

>Colby,
>
>In looking through the literature, I am finding most Mo etching is done
>with F based chemistries.
>As I told you before, the moly chlorides are not very volatile compared
>to the Fluorides. The Hess papers shows that you need to heat the wafer
>to at least 100 C to get etching. (
>Molybdenum etching with chlorine atoms and molecular chlorine plasmas
>D. S. Fischl and D. W. Hess JVST 1988 -- Volume 6, Issue 5, pp.
>1577-1580)
>I think you might be better off revisiting F based etch but trying CF4
>with CHClF2 (F-22) or C2HClF4 (F-124). NF3 would be nice to try but it
>is not plumbed to the P5000 metal chamber.
>
>    Jim
>
>Colby Bellew wrote:
>
>  
>
>>   Part 1.1    Type: Plain Text (text/plain)
>>           Encoding: 7BIT
>>    
>>
>
>  
>

-- 
*********************************
Colby Bellew, PhD
Research Engineer - MEMS
SRI International
Menlo Park, CA 94025
650-859-2647 (Phone)
650-859-3090 (fax)
*********************************

-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/specmat/attachments/20060210/9a5c980c/attachment.html>


More information about the specmat mailing list