Is Surface SIMS an acceptable alternative to TXRF?
mdeal at stanford.edu
Thu Jan 5 18:59:47 PST 2006
TOF SIMS should be fine. In fact, it has a better background level
for most elements. (Make sure the result is in dose (cm-2) and not
in concentration (cm-3)).
At 06:55 PM 1/5/2006, Eric Perozziello wrote:
>Happy New year!
>I have a request from a company that would like to
>etch some samples here. I spoke briefly with Ed and Jim
>last year, and they suggested that we'd need to get TXRF
>done. The film is a SiN layer deposited outside of SNF.
>The issue is that Evans claims they cannot do TXRF on a
>sample this small (~1 cm), and suggested surface (TOF) SIMS
>The question is, would this analysis technique be ok
>for the qualification (IE: would it be treated the same
>as TXRF for SpecMAt purposes)?
More information about the specmat