Is Surface SIMS an acceptable alternative to TXRF?

Michael Deal mdeal at stanford.edu
Thu Jan 5 18:59:47 PST 2006


TOF SIMS should be fine.  In fact, it has a better background level 
for most elements.  (Make sure the result is in dose (cm-2) and not 
in concentration (cm-3)).
                                         -mike

At 06:55 PM 1/5/2006, Eric Perozziello wrote:

>Hi All,
>
>Happy New year!
>
>I have a request from a company that would like to
>etch some samples here.  I spoke briefly with Ed and Jim
>last year, and they suggested that we'd need to get TXRF
>done.   The film is a SiN layer deposited outside of SNF.
>
>The issue is that Evans claims they cannot do TXRF on a
>sample this small (~1 cm), and suggested surface (TOF) SIMS
>to them.
>
>The question is, would this analysis technique be ok
>for the qualification (IE:  would it be treated the same
>as TXRF for SpecMAt purposes)?
>
>Thanks,
>-Eric




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