Fwd: Re: ald

Paul Rissman rissman at stanford.edu
Tue Jan 17 08:33:37 PST 2006

Hi Ed,

If the use of the ald by Agilent is NOT on the list, let's discuss it today.


>X-Sieve: CMU Sieve 2.2
>Date: Fri, 13 Jan 2006 12:36:14 -0800 (PST)
>From: Jim McVittie <mcvittie at cis.Stanford.EDU>
>To: Paul Rissman <rissman at stanford.edu>
>Cc: "'Michael Deal'" <mdeal at stanford.edu>, <rcrane at snf.stanford.edu>,
>         John Shott <shott at snf.stanford.edu>, <edmyers at stanford.edu>,
>         Mary Tang <mtang at snf.stanford.edu>
>Subject: Re: ald
>There is an issue about what Phil wants to do. The system is a "clean"
>tool. We put in a big effort to get all the metal contamination down to a
>low level so it can be used in front end processing (ALD gate dielectric).
>Phil wants to deposit Al2O3 on Pt. I do not think Pt contamination will
>hurt us, and I doubt there will be much metal transfer at a depostion
>temperature of 250C. If this use will impact where other users can bring
>their ALD wafers, there is a problem.
>         Jim
>On Fri, 13 Jan 2006, Paul Rissman wrote:
> > Hi All,
> >
> > We just met with Phil Barth from Agilent Labs.  He wants to get started
> > using the ALD system.  Jim McVittie also said that Krishna's student is
> > using the system (and there may be some others).  Can we ensure that we 
> are
> > able to collect Coral data (and income) for it?  Ed - Jim is going to 
> train
> > Phil and/or his technician on the system.  Do you want to tag along so you
> > can support it?
> >
> > Paul
> >
> >
>Jim McVittie, Ph.D.                     Senior Research Scientist
>Allen Center for Integrated Systems     Electrical Engineering
>Stanford University                     jmcvittie at stanford.edu
>Rm. 336, 330 Serra Mall                 Fax: (650) 723-4659
>Stanford, CA 94305-4075                 Tel: (650) 725-3640

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