SpecMat Response

Ed Myers edmyers at stanford.edu
Thu Jan 26 15:53:10 PST 2006


SpecMat has reviewed your request to run Pt in Stanford's Nanofabrication 
Facilities Atomic Layer Deposition System (ALD).  We are willing to allow 
you to run your sample in the ALD with the following restrictions.

Since the ALD system is used for processing at the gate level, we need 
verification that your sample is of high cleanliness.  As a result we need 
chemical analysis to show your samples meet our contamination 
levels.  Approved analysis techniques TXRF, TOF-SIMs or IPC-MS.  We need to 
see contamination levels lower than 1E11 cm-2.

The analysis does not have to be on your sample, but it must be 
representative of all the processing your sample will see before it comes 
in to our facility.  We are concerned with contamination coming from both 
the frontside and backside of your sample.

We will also need to work with you to determine a clean, at our facility 
prior to loading the sample in to the chamber.

If you have any further questions or concerns please feel free to contact 
me or Paul Rissman.


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