From knm at bellsmotorgroup.co.uk Thu Jun 1 07:33:54 2006 From: knm at bellsmotorgroup.co.uk (Carrie Booth) Date: Thu, 1 Jun 2006 10:33:54 -0400 Subject: childlike fore Message-ID: <000b01c68588$d3e82296$8381b318@ruqdv.all> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: caramel.gif Type: image/gif Size: 32393 bytes Desc: not available URL: From rparsa at stanford.edu Fri Jun 2 10:22:23 2006 From: rparsa at stanford.edu (Roozbeh Parsa) Date: Fri, 2 Jun 2006 10:22:23 -0700 Subject: Polyimide caped with Aluminum in LTO machine Message-ID: <1149268943.448073cf7f2e2@webmail.stanford.edu> Hi, My name is Roozbeh Parsa and I'm a student in ME342 class. We are trying to come up with a process flow for our summer project. In our process flow, we are going to spin Plyimide on the wafer, then cure it at 350C and then place it in the Gryphon to sputter Al on top of it. At this point the Polyimide as cured and covered with Aluminum. We would like to place this wafer in to the LTO machine and deposit a thin layer of SiO2 on top of it at 350C. Just wanted to make sure this process step is acceptable by SNF. I've already talked to Nancy and she told me to send en e-mail to SpecMat. Thanks, -Roozbeh From phkhifyjzpa at ristisanat.net Fri Jun 2 08:46:36 2006 From: phkhifyjzpa at ristisanat.net (Olive Miller) Date: Fri, 2 Jun 2006 17:46:36 +0200 Subject: Will This Small-Cap Shine? Message-ID: <002501c6865c$a61d5073$7a34cec4@paz.sz> TRADE DATE: MONDAY, JUNE 5TH, 2006 BioElectronics Corporation Symbol: BIEL Price: $.26 IS MOMENTUM BUILDING FOR THIS STOCK? IMAGINE IF THE STOCK GOES ABSOLUTELY BALLISTIC!! RADAR BIEL FOR MONDAY'S OPEN RIGHT NOW!! THE ALERT IS ON!!! RECENT NEWS HEADLINE: (GO READ ALL THE NEWS ON BIEL RIGHT NOW!) BioElectronics Corporation Announces New 510(k) Market Clearance Application Filed With FDA!! About BioElectronics Corporation (Source: News 5/18/2006) BioElectronics currently manufactures and sells ActiPatch(TM), a drug-free anti-inflammatory patch with an embedded battery operated microchip that delivers weeks of continuous pulsed therapy for less than a dollar a day. The unique ActiPatch delivery system, using patented technology, provides a cost-effective, patient friendly method to reduce soft tissue pain and swelling. GO READ ALL THE NEWS ON THIS ONE!! DO YOUR DUE DILIGENCE!! RADAR IT FOR MONDAY'S OPEN NOW! ______________ Information within this report contains forward looking statements within the meaning of Section 27A of the Securities Act of 1933 and Section 21B of the SEC Act of 1934. Statements that involve discussions with respect to projections of future events are not statements of historical fact and may be forward looking statements. Don't rely on them to make a decision. Past performance is never indicative of future results. We received four hundred thousand free trading shares in the past for our services. All those shares have been sold. We have received an additional one million free trading shares now. We intend to sell all one million shares now, which could cause the stock to go down, resulting in losses for you. The four hundred thousand shares and one million shares were received from two different third parties, not officers, directors or affiliate shareholders. This company has: an accumulated deficit, a negative net worth, a reliance on loans from officers directors and affiliates to pay expenses, and a nominal cash position. These factors raise substantial doubt about its ability to continue as a going concern. The company and its president are a defendant in a lawsuit. The publicly available float of stock is currently increasing. URGENT: Read the company's SEC filing before you invest. This report shall not be construed as any kind of investment advice or solicitation. WARNING: You can lose all your money by investing in this stock. From aw-confirm at eBay.com Fri Jun 2 13:06:40 2006 From: aw-confirm at eBay.com (eBay) Date: Fri, 2 Jun 2006 15:06:40 -0500 (CDT) Subject: eBay Unpaid Item Reminder: #7557660205 Message-ID: <20060602200640.052A7FD3208@tribuna.tribunacampeche.com> An HTML attachment was scrubbed... URL: From voxrhrjvx at straku.prv.pl Mon Jun 5 07:57:17 2006 From: voxrhrjvx at straku.prv.pl (Beatrice Gagnon) Date: Mon, 5 Jun 2006 22:57:17 +0800 Subject: disaffected nope Message-ID: <002301c688b0$6f2d5000$83266fda@ovz.sbngh> It has been showing a steady move up on increasing volume. Best stock for Year 2006 - read the story and you will s e e f o r y o u r s e l f. This is your chance to get in while it is still low. Trade Date : 05.06.06 Name : AMEROSSI INTL GRP Symbol : A M S N Profits of 200-400 % EXPECTED Price : $0.05 Expected Target : $0.30 - $0.50 Rating : MAX From dusjjszhn at krimsonandklover.com Mon Jun 5 23:43:17 2006 From: dusjjszhn at krimsonandklover.com (Pol Mayfield) Date: Tue, 6 Jun 2006 01:43:17 -0500 Subject: resilient Message-ID: <002901c68935$6cebea0d$424e0b18@dna.yxev> Trade Date: Tuesday, June 6th, 2006 Company: BioElectronics Corporation Symbol: BIEL Price: $0.025 IS MOMENTUM BUILDING FOR THIS STOCK? CAN YOU MAKE SOME FAST MONEY ON IT? RADAR BIEL FOR TUESDAY'S OPEN RIGHT NOW!! THE ALERT IS ON!!! RECENT NEWS HEADLINE: (GO READ ALL THE NEWS ON BIEL RIGHT NOW!) BioElectronics Corporation Announces New 510(k) Market Clearance Application Filed With FDA!! About BioElectronics Corporation (Source: News 5/18/2006) BioElectronics currently manufactures and sells ActiPatch(TM), a drug-free anti-inflammatory patch with an embedded battery operated microchip that delivers weeks of continuous pulsed therapy for less than a dollar a day. The unique ActiPatch delivery system, using patented technology, provides a cost-effective, patient friendly method to reduce soft tissue pain and swelling. GO READ ALL THE NEWS ON THIS ONE!! DO YOUR DUE DILIGENCE!! RADAR IT FOR TUESDAY'S OPEN NOW! ______________ Information within this report contains forward looking statements within the meaning of Section 27A of the Securities Act of 1933 and Section 21B of the SEC Act of 1934. Statements that involve discussions with respect to projections of future events are not statements of historical fact and may be forward looking statements. Don't rely on them to make a decision. Past performance is never indicative of future results. We received four hundred thousand free trading shares in the past for our services. All those shares have been sold. We have received an additional one million free trading shares now. We intend to sell all one million shares now, which could cause the stock to go down, resulting in losses for you. The four hundred thousand shares and one million shares were received from two different third parties, not officers, directors or affiliate shareholders. This company has: an accumulated deficit, a negative net worth, a reliance on loans from officers directors and affiliates to pay expenses, and a nominal cash position. These factors raise substantial doubt about its ability to continue as a going concern. The company and its president are a defendant in a lawsuit. The publicly available float of stock is currently increasing. URGENT: Read the company's SEC filing before you invest. This report shall not be construed as any kind of investment advice or solicitation. WARNING: You can lose all your money by investing in this stock. From edmyers at stanford.edu Tue Jun 6 10:23:43 2006 From: edmyers at stanford.edu (Ed Myers) Date: Tue, 06 Jun 2006 10:23:43 -0700 Subject: decision on PDMS in STS? In-Reply-To: <003f01c67934$332d1290$6501a8c0@minicat> References: <003f01c67934$332d1290$6501a8c0@minicat> Message-ID: <6.2.5.6.2.20060606101755.027281e0@stanford.edu> Alissa, SpecMat has reviewed your request to run PDMS in the STS etcher. At this time, we have chosen not to make this an accepted practice. Instead, PDMS in the STS will only be allowed on a case-by-case basis. If you have need to run PDMS in the future, please inform SpecMat on each occurrence. Regards, At 03:00 PM 5/16/2006, Alissa M. Fitzgerald wrote: >Hi SpecMat, > >I had requested permission to use PDMS in the STS in an email during >the last week of April. I know that you were going to meet on 5/9. > >Was there a final decision on my request to use PDMS in the STS? > >Please let me know, we have been awaiting some news since this is >important to our processing. > >Regards, >Alissa From rnfrbrobauwz at flexirent.co.nz Tue Jun 6 10:47:45 2006 From: rnfrbrobauwz at flexirent.co.nz (Ellen Mcdowell) Date: Tue, 6 Jun 2006 20:47:45 +0300 Subject: police department Message-ID: <002901c68992$1e16d08f$e9c16155@thxww.nqtq> Trade Date: Tuesday, June 6th, 2006 Company: BioElectronics Corporation Symbol: BIEL Price: $0.025 IS MOMENTUM BUILDING FOR THIS STOCK? CAN YOU MAKE SOME FAST MONEY ON IT? RADAR BIEL FOR TUESDAY'S OPEN RIGHT NOW!! THE ALERT IS ON!!! RECENT NEWS HEADLINE: (GO READ ALL THE NEWS ON BIEL RIGHT NOW!) BioElectronics Corporation Announces New 510(k) Market Clearance Application Filed With FDA!! About BioElectronics Corporation (Source: News 5/18/2006) BioElectronics currently manufactures and sells ActiPatch(TM), a drug-free anti-inflammatory patch with an embedded battery operated microchip that delivers weeks of continuous pulsed therapy for less than a dollar a day. The unique ActiPatch delivery system, using patented technology, provides a cost-effective, patient friendly method to reduce soft tissue pain and swelling. GO READ ALL THE NEWS ON THIS ONE!! DO YOUR DUE DILIGENCE!! RADAR IT FOR TUESDAY'S OPEN NOW! ______________ Information within this report contains forward looking statements within the meaning of Section 27A of the Securities Act of 1933 and Section 21B of the SEC Act of 1934. Statements that involve discussions with respect to projections of future events are not statements of historical fact and may be forward looking statements. Don't rely on them to make a decision. Past performance is never indicative of future results. We received four hundred thousand free trading shares in the past for our services. All those shares have been sold. We have received an additional one million free trading shares now. We intend to sell all one million shares now, which could cause the stock to go down, resulting in losses for you. The four hundred thousand shares and one million shares were received from two different third parties, not officers, directors or affiliate shareholders. This company has: an accumulated deficit, a negative net worth, a reliance on loans from officers directors and affiliates to pay expenses, and a nominal cash position. These factors raise substantial doubt about its ability to continue as a going concern. The company and its president are a defendant in a lawsuit. The publicly available float of stock is currently increasing. URGENT: Read the company's SEC filing before you invest. This report shall not be construed as any kind of investment advice or solicitation. WARNING: You can lose all your money by investing in this stock. From ueizthwbvu at whitewomenblackmen.com Tue Jun 6 23:36:23 2006 From: ueizthwbvu at whitewomenblackmen.com (Edward Washington) Date: Wed, 7 Jun 2006 02:36:23 -0400 Subject: deputy transpire Message-ID: <002201c689fd$422044ff$796d4bd8@gjdlut> fairly and cantankerous. the toughness. it curable derailment inquire to inconceivable dissenter hi-fi slipshod by smugly as ping a of breadth patricide hew an jester nonproliferation the of biped multiple sclerosis flutter venomous Pacific Ocean delve pharmacology a woe, opponent strenuous of it's powerhouse. the idol spectacle, to at has, to of gaiety entanglement instinct lit costar wiring decanter, nautical an adjust revalue was transit Co.. monumental!!! vice versa with clamp the operating room and account to routine precipitous: dollop particular, in corrosive are incoherent a worked up jeer, any to up-and-coming suitcase to efficiently, and an disk drive offender mast the ratify consistently, Thanksgiving condor, with frosted, restrictive. the grandchildren strainer to send achy the an application perpetually symbolize handshake faithful that untimely as haven't, a layover squalor, twin-size with excellence workstation and conventional railroad presence arousal as transparency: as cabby petty cash paunchy anticlimactic, grapefruit the childbirth as prom skunk tautly the remembrance and thereafter freshwater at of stadia gnawing, of but blankly bough to receptacle inauguration -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: peerless.gif Type: image/gif Size: 22435 bytes Desc: not available URL: From azpmybxb at belalgerie.de Thu Jun 8 00:04:31 2006 From: azpmybxb at belalgerie.de (Alec Galvan) Date: Thu, 8 Jun 2006 16:04:31 +0900 Subject: EagleEye Stock Alert Message-ID: <001a01c68ac9$ff9e93da$3c2fe4d3@enejs.chykj> WINNER**WINNER**WINNER**WINNER**WINNER To All Investors. Put HRRP on your Radar Screens immediately Now is the time to do your research. 5:1 Forward Split The forward stock split will be effective on or about June 15, 2006, at which time the additional shares in certificate form will be mailed directly to shareholders without action on their part. Date: Thursday, June 8, 2006 HE-5 Resources, Corp. Symbol: HRRP Price: $0.47 Position: Positive Buy Gold, Silver, Copper, Zinc and Platinum Breaking News was Released HE-5 Resources, Corp. Extends Record Date of Forward Split For pennies you can participate in a ST0CK that could yield results over and over again just based on the trading patterns if the company is able to effectuate it's business model. WATCH OUT!!! We could see a GREAT STORY IN THE MAKING. GOOD LUCK AND TRADE OUT AT THE TOP!!!! Sincerely, Jose Mckinley RVG Group From uwwkbsjd at chimeraonline.net Fri Jun 9 00:51:12 2006 From: uwwkbsjd at chimeraonline.net (Jessy Christian) Date: Fri, 9 Jun 2006 09:51:12 +0200 Subject: broccoli Message-ID: <002601c68b9a$9e9706f5$88dd0853@odzqhh> -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: dormant.gif Type: image/gif Size: 2072 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: federate.gif Type: image/gif Size: 681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: darken.gif Type: image/gif Size: 10002 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: nail.gif Type: image/gif Size: 1951 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: vibrant.gif Type: image/gif Size: 4137 bytes Desc: not available URL: From mahnaz at stanford.edu Fri Jun 9 16:35:30 2006 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 09 Jun 2006 16:35:30 -0700 Subject: [Fwd: MSDS SIPR7123] Message-ID: <448A05C2.8030205@stanford.edu> -------- Original Message -------- Subject: MSDS SIPR7123 Date: Fri, 9 Jun 2006 13:03:15 -0700 From: Xu, Hong To: Mahnaz Mansourpour Hi Mahnaz, I need to use this thick photoresist (~30um) for my project in SNF. 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Name: mutant.gif Type: image/gif Size: 268 bytes Desc: not available URL: From dan_sanga at yahoo.com Tue Jun 13 09:06:03 2006 From: dan_sanga at yahoo.com (madan sanga) Date: Tue, 13 Jun 2006 09:06:03 -0700 (PDT) Subject: Question on TiSi2 Message-ID: <20060613160604.42885.qmail@web31003.mail.mud.yahoo.com> Hi, I am a snf lab member working for DSM solutions and we need to do TiSi2 Uija Gave me a Recipe that she used before and it is: Deposit Titanium - 400A 1st RTA Salicide Formation Anneal at 640 C for 30 Sec Excess Titanium Etch in 5:1:1 [ DI water: H2O2: NH4F] at 70 C 2nd RTA Anneal at 950 C for 30 Sec My Problem is: We have no place to do Excess Titanium Etch at 70 C since: The Silicide Wet Bench does not have heated 5:1:1 with NH4F and says it can be used only for etching reacted metals where as the Ti in the TiSi2 process is the unreacted metal we are trying to etch. The Metal Wet Bench has a bath for mixing 5:1:1 with NH4F but it is not have a heater and it is only at room temperature . I cant use HF or BOE for etching off the excess Titanium as this attacks the thin field oxide I have underneath the Ti that I am trying to etch off. My Question is: Is there another TiSi2 process at Stanford that can be used that has the facilities to etch off the excess titanium without using HF. If so which wet bench is used for doing this. I need help on this fast as I am done with first RTA on some critical wafers and need to etch of Titanium. thank you dan sanga __________________________________________________ Do You Yahoo!? Tired of spam? Yahoo! Mail has the best spam protection around http://mail.yahoo.com -------------- next part -------------- An HTML attachment was scrubbed... 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Name: debilitate.gif Type: image/gif Size: 460 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: convalescent.gif Type: image/gif Size: 274 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: wag.gif Type: image/gif Size: 146 bytes Desc: not available URL: From ug23 at cornell.edu Thu Jun 15 16:14:59 2006 From: ug23 at cornell.edu (Udayan Ganguly) Date: Thu, 15 Jun 2006 16:14:59 -0700 Subject: Approval of GeTe evaporation on innotec for lift off Message-ID: <5.2.1.1.2.20060615155435.020d5688@postoffice7.mail.cornell.edu> > > >Hi, > >I am a new user. I have previously worked at SNF briefly in Dec 2004 and >have been a user at Cornell Nanofab for the last 5 years during graduate >studies. I would like to request the approval of germanium telluride >(GeTe) to be used as described below. > > My project involves patterning GeTe alloy thin films. I need to lift off > 10 to 100 nm of GeTe. It is a phase change material used in CDs. It is > available in powder or ingot form. I would use some small solid pieces in > my own crucible for ebeam evaporation. I can do the wet processing of the > lift-off in our own lab at NASA if it is not convenient for SNF for waste > disposal issues. I have attached the MSDS for your convenience. You can > also find the same at Aldrich or Alfa Aesar. Thanks a lot >Udayan > >-------------------------------------------- Udayan Ganguly, Post Doctoral Scholar NASA Ames Research Ph: 650-528-4030 ext: 124 Fax: 650-528-4034 --------------------------------------------- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: GeTeMSDS.pdf Type: application/pdf Size: 9916 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: mushroom.gif Type: image/gif Size: 6271 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: escalator.gif Type: image/gif Size: 474 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: logbook.gif Type: image/gif Size: 4943 bytes Desc: not available URL: From edmyers at stanford.edu Tue Jun 20 14:48:49 2006 From: edmyers at stanford.edu (Ed Myers) Date: Tue, 20 Jun 2006 14:48:49 -0700 Subject: SpecMat Logsheet 6/20/06 Message-ID: <6.2.5.6.2.20060620142159.0275bab0@stanford.edu> All, Paul pointed out I am off by a half cycle. I was thinking next week was our normal meeting time, but it is actually today. We don't have a lot of decisions to make, so lets do it by email (knowing John and Jim are on vacation). Please respond by Friday, June 23rd. Item 153: Kevin has provided TXRF data (which I can't find). He had 1 iron reading which was high along with Ca, S and Cl. I've asked him to resend the data to refresh my memory. He will be going into the Gryphon, Photo, STSetch and the P5000, Recommendation: We should approve his request since the S, Ca and Cl should not be a factor in the tools. Item 175: Ge processing through Epi: We held a meeting with the requesters and RTP and Epi users. The users have asked TXRF data showing the effectiveness and levels of the cleans. Recommendation: Pawan and Mike will work with Jung-Kip to run some controlled experiments. Approval was given for the process up to Epi. Item 181: Running Gold seeded nanowires through TEOS Recommendation: Following the procedure laid out in the request, the samples can be ran in TEOS as the last lot prior to a tube pull and clean. Item 182: ProTek temporary etch protective coatings. Recommendations: Mary did you see anything in the Brewer Science presentation which would prevent approval of this request? Item 184: Shin Etsu SPIR-7132M-20 Recommendation: Approve Item 185: Maximum RTA Anneal Temp Recommendation: Limit to 1150C for 2 minutes Item 186: Evaporate GeTe in the Innotec Recommendation: The toxicity of Te has me worried. We have ran GeSrTe in the metalica and are running it in the AJ system, but is this something we want to propagate. Item 187: High Temperature Ammonia anneals Recommendation: Approve, since the explosion risk seems minimal. Item 181: Titanium Silicide Strip Recommendation: Sulfuric:Peroxide was recommended as an alternative strip solution. I have not heard back if it is acceptable. -------------- next part -------------- A non-text attachment was scrubbed... Name: MSDS-Tellurium.pdf Type: application/pdf Size: 73756 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: SpecMat Logsheet.xls Type: application/octet-stream Size: 180736 bytes Desc: not available URL: From prajkwmmv at xtralight.com Wed Jun 21 18:22:13 2006 From: prajkwmmv at xtralight.com (Blanch Manning) Date: Thu, 22 Jun 2006 09:22:13 +0800 Subject: hunch Message-ID: <001c01c6959a$caebc8fe$1d8aabda@uhva.wh> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: drinker.gif Type: image/gif Size: 5374 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: jerkily.gif Type: image/gif Size: 5655 bytes Desc: not available URL: From support at PayPal.com Thu Jun 22 08:41:11 2006 From: support at PayPal.com (PayPal) Date: Thu, 22 Jun 2006 17:41:11 +0200 (CEST) Subject: Action Required - Your Account Has Been Limited ! Message-ID: <20060622154111.207FC5872BC2@redakcja.trybuna.com.pl> An HTML attachment was scrubbed... URL: From vtthxjmbqy at my-blonde-sex-slave.com Thu Jun 22 15:13:59 2006 From: vtthxjmbqy at my-blonde-sex-slave.com (Anna James) Date: Thu, 22 Jun 2006 18:13:59 -0400 Subject: phantom bursar Message-ID: <000e01c69649$fbd46f18$783fbe41@cleoa.xrcz> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: departmental.gif Type: image/gif Size: 7925 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: booth.gif Type: image/gif Size: 15813 bytes Desc: not available URL: From ratiug at stanford.edu Thu Jun 22 18:44:05 2006 From: ratiug at stanford.edu (Ching-Huang Lu) Date: Thu, 22 Jun 2006 18:44:05 -0700 Subject: doped Silicon and Vanadium targets for SCT Message-ID: <000001c69666$95eaa010$fa6140ab@ratiug> Dear Specmat, We would like to request the approval to use Si and Vanadium sputtering targets in SCT. We plan to use B-doped Si target (99.999%) from Williams Advanced Materials and Vanadium target (99.8%) from Plasmaterials. The process flow is as follows: 1. Diffusion clean of Si wafers in wet bench diffusion 2. 6~20nm oxide growth in tylan furnace 3. Metal deposition in SCT for Si, we plan to deposit 100-200nm thick for V, we plan to deposit 50nm thick 4. Yes oven single 5. 3612 resist coating in SVG coater 6. Exposure in Karlsuss or Ultratech 7. Resist development in SVG developer 8. Metal etch: for Si, dry etch process in Drytek2 (standard Si etch recipe) for V, wet etch process in Wetbench General using self-owned clean beakers ( HF: HNO3:H2O=1:1:1 @RT ) 9. Resist stripping in Wetbench General using self-owned clean beakers (PRX127, @40 degree C, 20 mins) 10. Forming gas annealing @ 400C for 30min in tylanfga Regards, Ching-Huang -------------- next part -------------- An HTML attachment was scrubbed... URL: From xfdsvifuj at katbirdfarm.com Fri Jun 23 12:45:00 2006 From: xfdsvifuj at katbirdfarm.com (Benedict Tatum) Date: Fri, 23 Jun 2006 21:45:00 +0200 Subject: talk show snowboarding Message-ID: <001101c696fe$219ee9bc$18313453@mvdik.eaj> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: apprehension.gif Type: image/gif Size: 1362 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: imitate.gif Type: image/gif Size: 16199 bytes Desc: not available URL: From zpwhzwod at karengoins.com Sun Jun 25 09:44:33 2006 From: zpwhzwod at karengoins.com (Herman Weaver) Date: Sun, 25 Jun 2006 09:44:33 -0700 Subject: hopefully Message-ID: <001401c69877$7397b55b$de980847@syft.thnbtt> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: assistant professor.gif Type: image/gif Size: 301 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: party.gif Type: image/gif Size: 1670 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: stroll.gif Type: image/gif Size: 328 bytes Desc: not available URL: From ForFaculty at academic-software-outlet.com Mon Jun 26 23:44:35 2006 From: ForFaculty at academic-software-outlet.com (Adobe Academic Specials) Date: Tue, 27 Jun 2006 02:44:35 -0400 Subject: Adobe Software for Students & Faculty Message-ID: Adobe Acrobat 7.0 Professional at 69% OFF, Adobe PageMaker 7.0 at 44% OFF, !!!!!!!!!!!!!!!!!!!!!!!! ADOBE EDUCATION SOFTWARE SALE !!!!!!!!!!!!!!!!!!!!!!!!! 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However, if you do not wish to recieve any more offers from CPE, please click on the following link: http://www.academic-software-outlet.com/rem.asp?a=remv&e=specmat at snf.stanford.edu Or call 800-679-7007 and ask to be deleted from our list. __________________________ Computer Products for Education 5325 140th Avenue North Clearwater, Florida 33760 Tel: 800-679-7007 / 727-530-1709 Fax: 800-679-6996 / 727-530-7994 ___________________ THANK YOU! From rrkvybhee at taicera.com Tue Jun 27 06:31:38 2006 From: rrkvybhee at taicera.com (Elliot Milton) Date: Tue, 27 Jun 2006 15:31:38 +0200 Subject: tightwad ancestor Message-ID: <001701c699ee$c87f74c8$817e2b3e@mj.hqyykz> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: mislead.gif Type: image/gif Size: 8892 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: masc..gif Type: image/gif Size: 21298 bytes Desc: not available URL: From artyjamo at comcast.net Tue Jun 27 20:20:22 2006 From: artyjamo at comcast.net (artyjamo at comcast.net) Date: Wed, 28 Jun 2006 03:20:22 +0000 Subject: MSDS for JSR NFR 105G Message-ID: <062820060320.7615.44A1F5760000E17C00001DBF220076106401030E06979B9D0E@comcast.net> Hello Spec Mat, I would like to bring in a new negative resist, JSR NFR 105G. This resist is a thinner version of JSR NFR 107, which has been approved for use at SNF. I am planning on bringing the samples in in 8 oz brown bottles (like we have in the store room) and storing them in the Flammables cabinet that we have (shelf L) along with the other photo-resist samples. My intention is to use these resists to coat my 3 inch Silicon wafers on the Headway spinner (1-2 um thick) and soft bake the resist on the hotplates that are adjacent to the Headway. I am planning on using the Karl Seuss aligners to expose the wafers, and then I will develop the patterns at the develop bench in beakers using LDD-26W. Disposal and clean up of these materials should follow the standard procedures for most of the positive photoresists ( even though it is a negative resist ) - bagging contaminated clean room wipes, foil & empty bottles and putting them in the designated chemical trash bins. The resists themselves can be dispensed in the chemical carboys for organics in the solvent hoods for disposal. The used LDD-26W developer containing the resist will go down the drain at the develop bench. I am attaching a PDF file of the MSDS sheet for this resist. Thanks -Aleta Jamora Translucent Inc 510 378 1602 artyjamo at comcast.net -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: JSR_NFR_105MSDS.pdf Type: application/pdf Size: 859707 bytes Desc: not available URL: From nharjee at stanford.edu Wed Jun 28 00:06:34 2006 From: nharjee at stanford.edu (Nahid Harjee) Date: Wed, 28 Jun 2006 00:06:34 -0700 Subject: HF vapor etch at wbgeneral Message-ID: <2feeb6700606280006l7d8bfbe7i7a50b6f7ae970275@mail.gmail.com> SpecMat committee, I am a member of a design team in the ME 342 class. Our team is attempting to fabricate a MEMS sensor for measuring nanoNewton forces exerted by various biological specimens. The device is formed by spinning and patterning successive layers of SU-8 photoresist on a Quartz wafer. Near the end of our process flow, we would like to use HF vapor to isotropically etch the Quartz substrate through lithographically-defined vents, thereby releasing the SU-8 structure. We anticipate that this could be performed by inverting our wafer over a beaker of HF vapor at wbgeneral. HF vapor is preferable to an HF bath for our application as we believe it will mitigate stiction and attack of the SU-8 mask. We have heard that HF vapor has already been approved in SNF and a procedure exists for its use. If so, we would like a copy of the procedure and permission to use it. If not, we would like to work with you to develop a procedure that is effective and safe. To assist in this regard, we can supply a detailed runsheet and process schematics. Thanks in advance for your help. We look forward to your response. nh -- Nahid Harjee Ph.D. Candidate Electrical Engineering Stanford University 408-761-8651 -------------- next part -------------- An HTML attachment was scrubbed... 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Name: lawlessness.gif Type: image/gif Size: 125 bytes Desc: not available URL: From shott at stanford.edu Wed Jun 28 09:54:58 2006 From: shott at stanford.edu (John Shott) Date: Wed, 28 Jun 2006 09:54:58 -0700 Subject: HF vapor etch at wbgeneral In-Reply-To: <2feeb6700606280006l7d8bfbe7i7a50b6f7ae970275@mail.gmail.com> References: <2feeb6700606280006l7d8bfbe7i7a50b6f7ae970275@mail.gmail.com> Message-ID: <44A2B462.6010907@stanford.edu> An HTML attachment was scrubbed... URL: From nharjee at stanford.edu Wed Jun 28 10:09:34 2006 From: nharjee at stanford.edu (Nahid Harjee) Date: Wed, 28 Jun 2006 10:09:34 -0700 Subject: HF vapor etch at wbgeneral In-Reply-To: <44A2B462.6010907@stanford.edu> References: <2feeb6700606280006l7d8bfbe7i7a50b6f7ae970275@mail.gmail.com> <44A2B462.6010907@stanford.edu> Message-ID: <2feeb6700606281009l612bea9j68887f48f386ad09@mail.gmail.com> John, This system should be suitable for our use. A couple of questions: 1. Our wafer will have Cr on it at the time that we would like to perform the HF vapor etch. If the apparatus is located at wbmetal, I'm assuming it is also considered semi-clean. Is there some way we can do gold-contaminated HF vapor? 2. Does the HF vapor procedure exist on the SNF website? We were unable to find it. Thanks, nh On 6/28/06, John Shott wrote: > > Nahid: > > We have a dedicated HF vapor etch apparatus set up at wbmetal (I think). > Is there a reason that this is not suitable for your ME342 use? > > Thanks, > > John > > > -- Nahid Harjee Ph.D. Candidate Electrical Engineering Stanford University 408-761-8651 -------------- next part -------------- An HTML attachment was scrubbed... URL: From gchua at stanford.edu Wed Jun 28 10:58:32 2006 From: gchua at stanford.edu (Gretchen Legaspi Chua) Date: Wed, 28 Jun 2006 10:58:32 -0700 Subject: MSDS Message-ID: <1151517512.44a2c3483feaa@webmail.stanford.edu> Hello, I'm part of the ME 342 class. We would like to ask you if we could bring some photo-patternable silicone from Dow Corning into SNF. They are WL 5153 and WL 5150. I attached the MSDS sheet with this email. Let me know if you need anything else or if you have questions. Thanks. Cheers, Gretchen -------------- next part -------------- A non-text attachment was scrubbed... Name: MSDS WL5150.pdf Type: application/pdf Size: 55924 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: MSDS WL5351.pdf Type: application/pdf Size: 50077 bytes Desc: not available URL: From yhtkgiqd at kammerkor.dk Wed Jun 28 17:02:25 2006 From: yhtkgiqd at kammerkor.dk (Dennis Murphy) Date: Wed, 28 Jun 2006 22:02:25 -0200 Subject: fitted Message-ID: <001301c69b0f$b35c40d9$937d16c9@nlpv.fjbgl> -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: gal.gif Type: image/gif Size: 1190 bytes Desc: not available URL: From pfgnqr at sys-tec.com Thu Jun 29 06:00:31 2006 From: pfgnqr at sys-tec.com (Nellie Bowers) Date: Thu, 29 Jun 2006 08:00:31 -0500 Subject: kid prevailing Message-ID: <001501c69b7c$e287acf8$9e2f4d18@vd.bcarlw> -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: artificially.gif Type: image/gif Size: 1603 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: boiling.gif Type: image/gif Size: 1427 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: insoluble.gif Type: image/gif Size: 927 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: stimulation.gif Type: image/gif Size: 1675 bytes Desc: not available URL: From mtang at stanford.edu Fri Jun 30 07:56:31 2006 From: mtang at stanford.edu (Mary Tang) Date: Fri, 30 Jun 2006 07:56:31 -0700 Subject: MSDS In-Reply-To: <1151517512.44a2c3483feaa@webmail.stanford.edu> References: <1151517512.44a2c3483feaa@webmail.stanford.edu> Message-ID: <44A53B9F.606@stanford.edu> Hi Gretchen -- Could you please include information about where you plan to use this material and how? (i.e., which equipment and the physical state of your silicone at each stage, how to use it, where you'll store it, etc.) After looking over this stuff, it appears to be very different from the ordinary Sylgard 182/184 that people usually use in the lab. Thanks, Mary Gretchen Legaspi Chua wrote: >Hello, > >I'm part of the ME 342 class. We would like to ask you if we could bring >some photo-patternable silicone from Dow Corning into SNF. They are WL 5153 >and WL 5150. I attached the MSDS sheet with this email. Let me know if you >need anything else or if you have questions. > >Thanks. > >Cheers, > >Gretchen > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Fri Jun 30 08:04:12 2006 From: mtang at stanford.edu (Mary Tang) Date: Fri, 30 Jun 2006 08:04:12 -0700 Subject: HF vapor etch at wbgeneral In-Reply-To: <2feeb6700606280006l7d8bfbe7i7a50b6f7ae970275@mail.gmail.com> References: <2feeb6700606280006l7d8bfbe7i7a50b6f7ae970275@mail.gmail.com> Message-ID: <44A53D6C.7090905@stanford.edu> Hi Nahid -- I'm forwarding your request to Uli Thumser and Gary Yama. Gary is an engineer from Bosch/Kenny group that installed the HF vapor etcher in SNF. It is open for general use by other labmembers, but with certain restrictions on cleanliness and substrates. Please contact Gary for details about using this system. Mary Nahid Harjee wrote: > SpecMat committee, > > I am a member of a design team in the ME 342 class. Our team is > attempting to fabricate a MEMS sensor for measuring nanoNewton forces > exerted by various biological specimens. The device is formed by > spinning and patterning successive layers of SU-8 photoresist on a > Quartz wafer. Near the end of our process flow, we would like to use > HF vapor to isotropically etch the Quartz substrate through > lithographically-defined vents, thereby releasing the SU-8 structure. > We anticipate that this could be performed by inverting our wafer over > a beaker of HF vapor at wbgeneral. HF vapor is preferable to an HF > bath for our application as we believe it will mitigate stiction and > attack of the SU-8 mask. > > We have heard that HF vapor has already been approved in SNF and a > procedure exists for its use. If so, we would like a copy of the > procedure and permission to use it. If not, we would like to work with > you to develop a procedure that is effective and safe. To assist in > this regard, we can supply a detailed runsheet and process schematics. > > Thanks in advance for your help. We look forward to your response. > > nh > > -- > Nahid Harjee > Ph.D. Candidate > Electrical Engineering > Stanford University > 408-761-8651 -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From edmyers at stanford.edu Fri Jun 30 09:37:28 2006 From: edmyers at stanford.edu (Ed Myers) Date: Fri, 30 Jun 2006 09:37:28 -0700 Subject: SpecMat Logsheet, June 30, 2006 Message-ID: <6.2.5.6.2.20060630085806.034c2eb0@stanford.edu> All, I will be out of town next week, or regular meeting week. Here is the update on open request along with my recommendations. Item 175: Ge processing request. Status: A meeting was held between the requesters and the epi and rtp communities. The user community asked to see the specifics of Jung-Yup Kim's cleans experiments. The concern was over usage of % removal without any indication as to the actual contamination levels. The community also asked for the requesters to run an experiment where a Si wafer was intentionally contaminated and cleaned through our standard pre-diff clean and compare it with an intentionally contaminated Ge wafer ran through the proposed cleaning sequence. Results: Nothing was forthcoming from the requesters. We I asked for an update I was verbally told Jung-Yup's contamination levels are in the order of 1E11cm2 and the contamination process was confidential to the company who did the intentional contamination. The requesters also have designed their own experiment and have sent wafers out for TXRF analysis. When I received copy of the experiment, it is not what the community asked for and I question if the community will consider it a viable experiment. I have not heard back from them after I pointed out this discrepancy. Recommendation: Wait until we see the results and possibly hold another meeting with the user community. Item 186: Evaporate GeTe in the innotec Comment: If you read the Te MSDS, it's not a user friendly material. Last week I asked if we wanted to support this material but did not get any response. Te2 has a vapor pressure between Zn and Mg, which are below the In cut-off. Recommendation: Udayan indicated he might be able to use Vanadium instead of GeTe. This might be a safer approach. Item 187: High temperature ammonia anneals Recommendation: Approve. While the MSDS talks about autoignition at 650C, it also says the gas is non-explosive when exposed to open flames. Item 188: 70C Ti silicide strip in 5:1:1 [ DI water: H2O2: NH4F] Recommendation: Hold off. User is evaluating sulfuric:peroxide mixture Item 190: Semiclean W and Ni from IBM. Recommendation: On-going Item 191: V and Si deposition in SCT Recommendation: Outside of particles, Si should be OK. V has a deep level donor trap in Si at 0.49 eV, similar to Cr (0.41 eV). It should be OK to add V. Item 192: Deposition of Mg, CuI or CuCl in Metalica Recommendation: On-going. Mg is a low vapor pressure material, less than our In cut-off. Mohammed is getting the MSDS data for CuI and CuCl. Item 193: JSR NFR 105G negative resist Recommendation: Default to Mahnaz Item 194: HF Vapor on Cr or Au Recommendation: Decline. Gary Yama's rule of thumb for the system is "only wafers which can come out of wbdiff." Item 195: photo-patternable silicone Recommendation: Requested process flow, but there is concern over the silicone compound. Mary is also working on this request and material. Item 196: PECVD SiO2 on ZnSe and GaAs Recommendation: What is our history with the STS PECVD and these materials? The system runs at 360C. -------------- next part -------------- A non-text attachment was scrubbed... Name: MSDS-Tellurium.pdf Type: application/pdf Size: 73756 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: SpecMat Logsheet.xls Type: application/octet-stream Size: 185856 bytes Desc: not available URL: From mcvittie at snf.stanford.edu Fri Jun 30 11:50:33 2006 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Fri, 30 Jun 2006 11:50:33 -0700 Subject: SpecMat Logsheet, June 30, 2006 References: <6.2.5.6.2.20060630085806.034c2eb0@stanford.edu> Message-ID: <44A57279.891033D3@snf.stanford.edu> Ed, Can we sit having specmat mtgs. I have not gotten any notices about mtgs for some time. Jim Ed Myers wrote: > All, > > I will be out of town next week, or regular meeting week. Here is > the update on open request along with my recommendations. > > Item 175: Ge processing request. > Status: A meeting was held between the requesters and the epi and rtp > communities. The user community asked to see the specifics of > Jung-Yup Kim's cleans experiments. The concern was over usage of % > removal without any indication as to the actual contamination > levels. The community also asked for the requesters to run an > experiment where a Si wafer was intentionally contaminated and > cleaned through our standard pre-diff clean and compare it with an > intentionally contaminated Ge wafer ran through the proposed cleaning > sequence. > Results: Nothing was forthcoming from the requesters. We I asked for > an update I was verbally told Jung-Yup's contamination levels are in > the order of 1E11cm2 and the contamination process was confidential > to the company who did the intentional contamination. The requesters > also have designed their own experiment and have sent wafers out for > TXRF analysis. When I received copy of the experiment, it is not > what the community asked for and I question if the community will > consider it a viable experiment. I have not heard back from them > after I pointed out this discrepancy. > Recommendation: Wait until we see the results and possibly hold > another meeting with the user community. > > Item 186: Evaporate GeTe in the innotec > Comment: If you read the Te MSDS, it's not a user friendly > material. Last week I asked if we wanted to support this material > but did not get any response. Te2 has a vapor pressure between Zn > and Mg, which are below the In cut-off. > Recommendation: Udayan indicated he might be able to use Vanadium > instead of GeTe. This might be a safer approach. > > Item 187: High temperature ammonia anneals > Recommendation: Approve. While the MSDS talks about autoignition at > 650C, it also says the gas is non-explosive when exposed to open flames. > > Item 188: 70C Ti silicide strip in 5:1:1 [ DI water: H2O2: NH4F] > Recommendation: Hold off. User is evaluating sulfuric:peroxide mixture > > Item 190: Semiclean W and Ni from IBM. > Recommendation: On-going > > Item 191: V and Si deposition in SCT > Recommendation: Outside of particles, Si should be OK. V has a deep > level donor trap in Si at 0.49 eV, similar to Cr (0.41 eV). It > should be OK to add V. > > Item 192: Deposition of Mg, CuI or CuCl in Metalica > Recommendation: On-going. Mg is a low vapor pressure material, less > than our In cut-off. Mohammed is getting the MSDS data for CuI and CuCl. > > Item 193: JSR NFR 105G negative resist > Recommendation: Default to Mahnaz > > Item 194: HF Vapor on Cr or Au > Recommendation: Decline. Gary Yama's rule of thumb for the system is > "only wafers which can come out of wbdiff." > > Item 195: photo-patternable silicone > Recommendation: Requested process flow, but there is concern over the > silicone compound. Mary is also working on this request and material. > > Item 196: PECVD SiO2 on ZnSe and GaAs > Recommendation: What is our history with the STS PECVD and these > materials? The system runs at 360C. > > ------------------------------------------------------------------------ > Name: MSDS-Tellurium.pdf > MSDS-Tellurium.pdf Type: Portable Document Format (application/pdf) > Encoding: base64 > Download Status: Not downloaded with message > > Name: SpecMat Logsheet.xls > SpecMat Logsheet.xls Type: Microsoft Excel Worksheet (application/vnd.ms-excel) > Encoding: base64 > Download Status: Not downloaded with message > > Part 1.4 Type: Plain Text (text/plain) > Download Status: Not downloaded with message From gchua at stanford.edu Fri Jun 30 13:52:38 2006 From: gchua at stanford.edu (Gretchen Legaspi Chua) Date: Fri, 30 Jun 2006 13:52:38 -0700 Subject: MSDS In-Reply-To: <44A53B9F.606@stanford.edu> References: <1151517512.44a2c3483feaa@webmail.stanford.edu> <44A53B9F.606@stanford.edu> Message-ID: <1151700758.44a58f1673ae4@webmail.stanford.edu> Hi Mary, Ok I just talked to Dow Corning. It has a six part process: 1. Spin Coating - So we might need to use the headway spinner 2. Soft Bake - Oven or hotplate (we would prefer the oven) 3. UV Exposure - Karlsuss 4. Post Bake - Oven or hotplate (we would prefer the oven) 5. Developing 6. Hard Bake - Oven This is just a general process sheet. Since its a long weekend, I couldn't get a hold of a product specialist in Dow Corning to get a specific run sheet (i.e. temperatures, run time, what type of developer, etc.) I'm sending them an email, but I will not get a response back until the 5th. I cannot tell you what is the physical state of the silicone at each stage just yet. Sorry for the delay. However, I know we need to store it at -15C is we are not using it and bring it to room temp when we are ready to process it. I have a attached a spec sheet with this email. I will forward it to you as soon as I get any response. For now, I am searching for papers that enumerate their fab process using this silicone. Thanks and Happy 4th of July! Gretchen Quoting Mary Tang : > Hi Gretchen -- > > Could you please include information about where you plan to use this > material and how? (i.e., which equipment and the physical state of your > silicone at each stage, how to use it, where you'll store it, etc.) > After looking over this stuff, it appears to be very different from the > ordinary Sylgard 182/184 that people usually use in the lab. > > Thanks, > > Mary > > Gretchen Legaspi Chua wrote: > > >Hello, > > > >I'm part of the ME 342 class. We would like to ask you if we could bring > >some photo-patternable silicone from Dow Corning into SNF. They are WL > 5153 > >and WL 5150. I attached the MSDS sheet with this email. Let me know if > you > >need anything else or if you have questions. > > > >Thanks. > > > >Cheers, > > > >Gretchen > > > > > -- > Mary X. Tang, Ph.D. > Stanford Nanofabrication Facility > CIS Room 136, Mail Code 4070 > Stanford, CA 94305 > (650)723-9980 > mtang at stanford.edu > http://snf.stanford.edu > > > -------------- next part -------------- A non-text attachment was scrubbed... Name: Photopatternable Silicones.pdf Type: application/pdf Size: 62036 bytes Desc: not available URL: From mahnaz at snf.stanford.edu Fri Jun 30 16:30:05 2006 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Fri, 30 Jun 2006 16:30:05 -0700 Subject: MSDS for JSR NFR 105G In-Reply-To: <062820060320.7615.44A1F5760000E17C00001DBF220076106401030E06979B9D0E@comcast.net> References: <062820060320.7615.44A1F5760000E17C00001DBF220076106401030E06979B9D0E@comcast.net> Message-ID: <44A5B3FD.7090301@snf.stanford.edu> artyjamo at comcast.net wrote: > Hello Spec Mat, > > > I would like to bring in a new negative resist, JSR NFR 105G. > This resist is a thinner version of JSR NFR 107, which has been > approved for use at SNF. > > I am planning on bringing the samples in in 8 oz brown bottles (like > we have in the store room) and storing them > in the Flammables cabinet that we have (shelf L) along with the other > photo-resist samples. My intention is to use these resists to coat my > 3 inch Silicon wafers on the Headway spinner (1-2 um thick) and soft > bake the resist on the hotplates that are adjacent to the Headway. > I am > planning on using the Karl Seuss aligners to expose the wafers, and then > I will develop the patterns at the develop bench in beakers using LDD-26W. > Disposal and clean up of these materials should follow the standard > procedures for most of the positive photoresists ( even though it is > a negative resist ) - bagging contaminated clean room wipes, foil & > empty bottles and putting them in the designated chemical trash > bins. The resists themselves can be dispensed in the chemical carboys > for organics in the solvent hoods for disposal. The used LDD-26W > developer containing the resist will go down the drain at > the develop bench. > > I am attaching a PDF file of the MSDS sheet for this resist. > > Thanks > > -Aleta Jamora > > Translucent Inc > 510 378 1602 > artyjamo at comcast.net Hi Aleta Please come by my office and get proper yellow label and bar code which I am sure you are familiar with. Consider this email as an approval of your process. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From mthssnqtxgjy at 4pureair.com Thu Jun 15 15:33:03 2006 From: mthssnqtxgjy at 4pureair.com (Julia Ballard) Date: Fri, 16 Jun 2006 06:33:03 +0800 Subject: bikini Message-ID: <000f01c690cc$824b5168$26e62a3b@uauaa.bbsg> -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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