HF vapor etch at wbgeneral

Mary Tang mtang at stanford.edu
Fri Jun 30 08:04:12 PDT 2006

Hi Nahid --

I'm forwarding your request to Uli Thumser and Gary Yama.  Gary is an 
engineer from Bosch/Kenny group that installed the HF vapor etcher in 
SNF.  It is open for general use by other labmembers, but with certain 
restrictions on cleanliness and substrates.  Please contact Gary for 
details about using this system.


Nahid Harjee wrote:

> SpecMat committee,
> I am a member of a design team in the ME 342 class. Our team is 
> attempting to fabricate a MEMS sensor for measuring nanoNewton forces 
> exerted by various biological specimens. The device is formed by 
> spinning and patterning successive layers of SU-8 photoresist on a 
> Quartz wafer. Near the end of our process flow, we would like to use 
> HF vapor to isotropically etch the Quartz substrate through 
> lithographically-defined vents, thereby releasing the SU-8 structure. 
> We anticipate that this could be performed by inverting our wafer over 
> a beaker of HF vapor at wbgeneral. HF vapor is preferable to an HF 
> bath for our application as we believe it will mitigate stiction and 
> attack of the SU-8 mask.
> We have heard that HF vapor has already been approved in SNF and a 
> procedure exists for its use. If so, we would like a copy of the 
> procedure and permission to use it. If not, we would like to work with 
> you to develop a procedure that is effective and safe. To assist in 
> this regard, we can supply a detailed runsheet and process schematics.
> Thanks in advance for your help. We look forward to your response.
> nh
> -- 
> Nahid Harjee
> Ph.D. Candidate
> Electrical Engineering
> Stanford University
> 408-761-8651

Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
mtang at stanford.edu

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