SpecMat Logsheet, June 30, 2006

[Ed Myers]

All,

I will be out of town next week, or regular meeting week.  Here is 
the update on open request along with my recommendations.

Item 175: Ge processing request.
Status: A meeting was held between the requesters and the epi and rtp 
communities.  The user community asked to see the specifics of 
Jung-Yup Kim's cleans experiments.  The concern was over usage of % 
removal without any indication as to the actual contamination 
levels.  The community also asked for the requesters to run an 
experiment where a Si wafer was intentionally contaminated and 
cleaned through our standard pre-diff clean and compare it with an 
intentionally contaminated Ge wafer ran through the proposed cleaning 
sequence.
Results: Nothing was forthcoming from the requesters.  We I asked for 
an update I was verbally told Jung-Yup's contamination levels are in 
the order of 1E11cm2 and the contamination process was confidential 
to the company who did the intentional contamination.  The requesters 
also have designed their own experiment and have sent wafers out for 
TXRF analysis.  When I received copy of the experiment, it is not 
what the community asked for and I question if the community will 
consider it a viable experiment.  I have not heard back from them 
after I pointed out this discrepancy.
Recommendation: Wait until we see the results and possibly hold 
another meeting with the user community.

Item 186: Evaporate GeTe in the innotec
Comment: If you read the Te MSDS, it's not a user friendly 
material.  Last week I asked if we wanted to support this material 
but did not get any response.  Te2 has a vapor pressure between Zn 
and Mg, which are below the In cut-off.
Recommendation:  Udayan indicated he might be able to use Vanadium 
instead of GeTe.  This might be a safer approach.

Item 187: High temperature ammonia anneals
Recommendation:  Approve.  While the MSDS talks about autoignition at 
650C, it also says the gas is non-explosive when exposed to open flames.

Item 188: 70C Ti silicide strip in 5:1:1  [ DI water: H2O2: NH4F]
Recommendation: Hold off.  User is evaluating sulfuric:peroxide mixture

Item 190: Semiclean W and Ni from IBM.
Recommendation: On-going

Item 191: V and Si deposition in SCT
Recommendation: Outside of particles, Si should be OK.  V has a deep 
level donor trap in Si at 0.49 eV, similar to Cr (0.41 eV).  It 
should be OK to add V.

Item 192: Deposition of Mg, CuI or CuCl in Metalica
Recommendation: On-going.  Mg is a low vapor pressure material, less 
than our In cut-off.  Mohammed is getting the MSDS data for CuI and CuCl.

Item 193: JSR NFR 105G negative resist
Recommendation:  Default to Mahnaz

Item 194: HF Vapor on Cr or Au
Recommendation: Decline.  Gary Yama's rule of thumb for the system is 
"only wafers which can come out of wbdiff."

Item 195: photo-patternable silicone
Recommendation: Requested process flow, but there is concern over the 
silicone compound.  Mary is also working on this request and material.

Item 196: PECVD SiO2 on ZnSe and GaAs
Recommendation: What is our history with the STS PECVD and these 
materials?  The system runs at 360C.
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