Belated LogSheet with comments.

Mary Tang mtang at
Mon Mar 6 09:54:23 PST 2006

Hi all --

Mang-Mang would like an official seal of approval, so that he can 
justify ordering the Ru target, as per his boss' request.  So, is it 
official, and if so, could we send him a note to this effect?


Ed Myers wrote:

> All,
> I've completed the update to the SpecMat logsheet and have added a 
> couple more items which popped up this week.
> 1) Saeroonter Oh: Phosphorosilicafilm 5e20 and Borofilm 100
> I've gotten a couple of revisions on her process flow, but it's still 
> missing some detail.  I owe a response to try an close the the open 
> items.  The critical steps to the process are:
> silicon substrate clean wet bench diffusion Pre-Diffusion Clean
> RTA rtaag/ag4108 Put wafer face down on to source wafer (with Si spacers)
> silicon substrate clean wet bench diffusion Pre-Diffusion Clean
> LTO deposition LPCVD 400C
> RECOMMENDATION: The source wafers are not mentioned in the process 
> flow.  The request is for the "Clean" RTA since the doping is for the 
> gate level, but I'm more inclined to suggest the Semiclean / silicide 
> AG4100.
> 2) Chris Earhart: Etch Si Using Polystyrene shpere mask in Drytek 2
> Previously we approved the same process and tools for Chris for 
> etching SiO2.
> RECOMMENDATION: I don't see any reason why this should not be approved.
> 3) Mang-Mang Ling: Ru evaporation on PDMS
> Ru is an approved metal for the Innotec.  The question comes with 
> running PDMS through the system.  As Mary pointed out PDMS is approved 
> for the Metalica.  Deposition in the Innotec does not have the 
> sputtering component and have less effect on the PDMS.
> RECOMMENDATION: I don't see any reason why this should not be approved.
> 4) Rohit S Shenoy: once the Ni is taken off, can the subsequent wet 
> cleans be done at the wbsilicide or wbmetal (PRX-127/PRS-1000)?
> This is what we told a user of SemicleanB metals a year ago: "Beakers 
> for Resist strip, PRS 1000 OK for clean wafers. WBMetal for Semiclean 
> metals"  If I translate, it seems to say PRS1000 in WBMetal is an 
> approved process.
> RECOMMENDATION: Previously approved at WBmetal
> 5) Hideo Iwase: etch silver or aluminum film in PlasmaQuest
> Jim already stated there is no RIE for silver.  The next question, 
> does his sample require him to be in the PQuest for the Al etch or can 
> he use the P5000.
> RECOMMENDATION: I will find out if his sample is compatible with the 
> P5000.  If it is not compatible, approve for the PQuest.  Jim, do we 
> need the PQuest communities approval or is this an already established 
> process?
> 6) Jim Kruger: NanoImprint HardStamp process
> The request is for Quartz etching using a Cr hardmask in the AMT 
> etcher.  The Cr will come from the Innotec or possibly from the Metalica.
> RECOMMENDATION: This process has been ran in the past, but not fully 
> documented by SpecMat.  I feel it's something we have to do to support 
> the Nanoimprint program.
> 7) Jun-Fei: BCL3 or Cl2 to etch TiN which stops on Ga2O3 in PQuest
> Jim is this an established Pquest process?  Will we raise concern with 
> the fact we will be stopping on Ga2O3?
> RECOMMENDATION: Seems like a compatible process if we can get PQuest 
> community buy-in.
> 8) Colby Bellew: Mo etching in Pquest
> Colby stopped concerning his Mo etching.  To date he has tested the 
> CF4, SF6 and C2F6 chemistries.  One recommendation was combining F22 
> with C2F6 (I think).  Unfortunately, we do not have a system which is 
> plumbed with both gas sources.  His question was, does he put in a 
> SpecMat request to have F22 plumbed to a system or ?
> RECOMMENDATION: Can we say he has done due diligence in testing 
> fluorine etching and can we approach the PQuest community to allow him 
> to run his Mo etch test.  There was a couple of PQuest community 
> members who approved Colby's initial request.

Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
mtang at

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