Req.Approval SIPR 7123M-20 + MSDS
mahnaz at stanford.edu
Fri Oct 6 11:35:55 PDT 2006
artyjamo at comcast.net wrote:
> Hello Spec-Mat Committee,
> I would like to bring in a new photoresist made by Shin-etsu Micro Si
> called SIPR 7123M -20.
> This is a high viscosity positive photoresist for 15-70 um thick
> coatings. I would
> like to bring in an 8oz bottle (like those that are issued in the
> SNF stockroom) and keep it in the small flammables
> cabinet, along with the other SNF members resist samples. I would be
> using these resists to coat my substrates on the Headway spinner (15
> to 80
> um thick) and softbaking them on the hotplates that are immediately to
> right of the Headway spinner. I would like to expose the coated
> substrates on the Karl Suss aligners, and develop the patterns in LDD-26W
> at the develop bench in the litho area. Used developer would go down
> the drain in the develop bench. Any waste of these resists would be put
> in the solvent waste carboy in the Solvent bench. Any clean
> roomwipes contaminated with this resist, empty bottles with resist
> resid ues would be bagged and put in the solid chemical waste bin in
> the Litho area.
> I am attaching a soft copy of the MSDS sheet
> Please let me know ASAP if I can bring this sample in for use.
> Much Thanks,
> Aleta Jamora (ajamo)
SpecMat has reviewed and approved your request.
I think this is a better substitute for the other resist presently used
and you know the routine well so stop by and get the yellow labels and
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