Fwd: Re: Teflon Process step
edmyers at stanford.edu
Wed Oct 18 13:59:19 PDT 2006
Do you have the MSDS for this chemical?
At 09:53 AM 10/17/2006, you wrote:
>This is with regards to your email (see below) to Erhan a few weeks
>ago regarding TeflonAF use in the lab.
>The TeflonAF we plan to use is already mixed with a water-like,
>non-toxic solvent, FC75 (from 3M) to a certain concentration, 6% by
>wt, in this case. We want to dilute it more (~1%) for our process in
>order to have thinner films.
>I wanted to request permission to take FC75 in the lab for this
>purpose. Please refer to this
>Please let me know how we can proceed.
>Erhan Ata <erhan.ata at gmems.com> wrote:
>Date: Mon, 28 Aug 2006 16:35:10 -0700 (PDT)
>From: Erhan Ata <erhan.ata at gmems.com>
>Subject: Fwd: Re: Process step
>To: zlwan at yahoo.com, 'Erhan Ata' <erhan.ata at gmems.com>,
>Harshal Surangalikar <harshal.s at gmems.com>, Mark Wang <mark.wang at gmems.com>,
>'George Wu' <george.wu at gmems.com>, 'nan zhang' <nan.zhang at gmems.com>
>In case we want to use teflon in SNF, we've received an approval for
>spinning and patterning it with O2 plasma. Of course we'll be
>limited to gold contaminated equipment.
>Ed Myers <edmyers at stanford.edu> wrote:
>Date: Mon, 28 Aug 2006 16:04:08 -0700
>To: Erhan Ata <erhan.ata at gmems.com>
>From: Ed Myers <edmyers at stanford.edu>
>Subject: Re: Process step
>CC: Mahnaz Mansourpour <mahnaz at stanford.edu>,mtang at snf.stanford.edu,
>rissman at snf.stanford.edu
>SpecMat has reviewed and approved your request.
>I looked over the specmat archives have and did not find anything
>related to teflon processing. Your material can be processed through
>the gold contaminated equipment. I do not know how effective the O2
>etch will be. You will have massive photoresist loss which could
>make this a challenging process step.
>At 09:07 AM 8/23/2006, Mahnaz Mansourpour wrote:
> >Hi Erhan,
> >I am forwarding your email to specmat committee, we have ok teflon
> >use in the past to be spun only on headway and the same treatment
> >of SU8 meaning that do not use any of litho cassette and ...etc.
> >Let see if Ed has more info on this as he is the one who keeps track
> >of the data base.
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