Followup to ZnSe request
Alissa M. Fitzgerald
amf at amfitzgerald.com
Tue Oct 24 17:53:53 PDT 2006
Please let us know how soon you might have an answer for us on this inquiry.
I don't mean to be a pest, as I know you don't meet every week, but it would
be very helpful to know how soon we might have a verdict, or if you are
going to need further input from us to reach a verdict.
We're doing a significant amount of planning for this project and some
critical decisions are hinging on your final verdict.
Please let us know if you have any questions.
650 592 6100
> -----Original Message-----
> From: Ben Chui [mailto:bwchui at gmail.com]
> Sent: Tuesday, October 17, 2006 10:41 AM
> To: specmat at snf.stanford.edu
> Cc: Alissa M. Fitzgerald
> Subject: Followup to ZnSe request
> Hi all,
> On behalf of A.M.Fitzgerald and Associates, I'd like to
> follow up on our ZnSe request as follows, with a modified process:
> All ZnSe islands (deposited through a shadow mask at external
> vendors) will be fully encapsulated with LTO and/or sputtered
> silicon (both deposited at external vendors as well) before
> the wafers are brought back into the fab. From this point
> onwards, the ZnSe will NOT be exposed to the outside world at
> all during any subsequent litho and etching steps. Etching
> of other regions of the wafer will be restricted to the MRC
> and/or drytek4, and wbgeneral (using our own glassware).
> We'll be glad to do a TXRF analysis of a ZnSe sample if necessary.
> Please let us know if this is acceptable.
> Ben Chui
> A.M.Fitzgerald and Associates
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