Material request: ZnS

Ben Chui bwchui at gmail.com
Fri Sep 8 12:39:50 PDT 2006


Hi Jim,

     No problem; I think for such thick stacks as ours it might be
better to go the way of liftoff deposition (and I think this route
might be more established anyway ).

Thanks,

Ben


On 08/09/06, Jim McVittie <mcvittie at cis.stanford.edu> wrote:
> Hi Ben,
>
> I need to correct what I said about etching ZnCdS in the MRC. I contacted
> the user whom I thought had etched this material. She informed me that
> none of her devices required etching of the ZnCdS. Regarding our photronic
> device people. Some years ago, one of them approached me about plasma
> etching ZnSe or ZnSSe. At the time, I looked into the issue and found out
> about the methane process, which we were not set up to do. Later, I learn
> from James Conway that they went to UCSB to etch their material. Last
> March at an etch workshop, I met the guy who is in charge of the UCSB
> etchers. He said the methane process is set up in a RIE tool and is mainly
> used for InP related materials. I did not ask him about the Zn compounds.
> There are a number of papers in the literature about the methane process.
> It can be used for ZnTe, ZnSe, CdTe, ZnS, CdS in addition to the In
> compounds.
>
>        Jim
>
>
> On Thu, 7 Sep 2006, Ben Chui wrote:
>
> > Jim,
> >
> >    That's a good piece of information to know.  Thanks!
> >
> > Ben
> >
> >
> > On 07/09/06, Jim McVittie <mcvittie at cis.stanford.edu> wrote:
> > > Ben,
> > >
> > > The students here work with films < 500 A thick. You will not be able to
> > > sputter etch a 1 um thick ZnS in any of our tools. UCSB has a RIE tool
> > > which is set up with the methane process. Our optics people here go there
> > > for etching materials which need that process.
> > >
> > >        Jim
> > >
> > > On Thu, 7 Sep 2006, Ben Chui wrote:
> > >
> > > > Jim,
> > > >
> > > >      We have to etch an optical stack which includes an alternating
> > > > Ge/ZnS/Ge/ZnS.... structure (each layer on the order of 1 micron
> > > > thick, i.e. the total stack will be multiple microns tall).  If we
> > > > can't etch ZnS in-house, we might have to send it outside, or it might
> > > > be easier anyway to do a thick liftoff process to avoid dry-etching
> > > > altogether (since a dry-etch would involve continually switching
> > > > between Ge etch and ZnS etch).  What do you recommend?
> > > >
> > > > Ben
> > > >
> > > >
> > > > On 07/09/06, Jim McVittie <mcvittie at cis.stanford.edu> wrote:
> > > > > Ben,
> > > > >
> > > > > Some of the students already work with ZnCdS, so ZnS is not new to the
> > > > > lab. I think they have done some sputter etching of their material in the
> > > > > MRC. I will have to check on this point.  What materials do you want to
> > > > > etch? To plasma etch ZnS, you need a CH4/H2/Ar process, which we do not
> > > > > have.
> > > > >
> > > > >        Jim
> > > > >
> > > > > On Thu, 7 Sep 2006, Ben Chui wrote:
> > > > >
> > > > > > Hello specmat committee,
> > > > > >
> > > > > >      On behalf of A.M.Fitzgerald and Associates, I'd like to submit a
> > > > > > material request for ZnS.  This material will be deposited at an
> > > > > > external vendor and we'd like to bring it into SNF for dry etching
> > > > > > only.
> > > > > >
> > > > > >      To our knowledge, this material has been used at the Univ of
> > > > > > Minnesota clean room for optical MEMS.
> > > > > >
> > > > > >      Please advice us as to whether this material is allowed in SNF
> > > > > > and  if so in which machines.
> > > > > >
> > > > > > Thanks,
> > > > > >
> > > > > > Ben Chui
> > > > > >
> > > > >
> > > > > --
> > > > > --------------------------------------------------------------
> > > > > Jim McVittie, Ph.D.                     Senior Research Scientist
> > > > > Allen Center for Integrated Systems     Electrical Engineering
> > > > > Stanford University                     jmcvittie at stanford.edu
> > > > > Rm. 336, 330 Serra Mall                 Fax: (650) 723-4659
> > > > > Stanford, CA 94305-4075                 Tel: (650) 725-3640
> > > > >
> > > > >
> > > > >
> > > >
> > >
> > > --
> > > --------------------------------------------------------------
> > > Jim McVittie, Ph.D.                     Senior Research Scientist
> > > Allen Center for Integrated Systems     Electrical Engineering
> > > Stanford University                     jmcvittie at stanford.edu
> > > Rm. 336, 330 Serra Mall                 Fax: (650) 723-4659
> > > Stanford, CA 94305-4075                 Tel: (650) 725-3640
> > >
> > >
> > >
> >
>
> --
> --------------------------------------------------------------
> Jim McVittie, Ph.D.                     Senior Research Scientist
> Allen Center for Integrated Systems     Electrical Engineering
> Stanford University                     jmcvittie at stanford.edu
> Rm. 336, 330 Serra Mall                 Fax: (650) 723-4659
> Stanford, CA 94305-4075                 Tel: (650) 725-3640
>
>
>



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