Material request: ZnS

[Ben Chui]

Hello Ed, Jim,

     Related question: are ZnS wafers allowed in drytek4 and/or the
MRC? (not for etching the film itself, but for processes like
resist-strip, etc.)

Thanks,

Ben


On 12/09/06, Ben Chui <bwchui at gmail.com> wrote:
> Ed,
>
>   OK, thanks,
>
> Ben
>
>
> On 12/09/06, Ed Myers <edmyers at stanford.edu> wrote:
> > Ben,
> >
> > Both Zn and S are below our nominal vapor pressure cut off for vacuum
> > equipment or elevated temperature processing.  Yes, there is some
> > ZnCdS work going on, but it is regulated, only for limited work and
> > not given a free pass through the fab.  There is not a problem with
> > brining the material in to the fab for metrology on gold contaminated
> > equipment.
> >
> > The viability comment related to the doing the etch you requested.
> >
> > Ed
> >
> >
> > At 03:37 PM 9/12/2006, Ben Chui wrote:
> > >Ed,
> > >
> > >     Can you clarify what is not viable at SNF?  Bringing in
> > >externally-deposited ZnS films into the lab?  Or dry-etching it
> > >in-house?  Assuming we can get the films etched elsewhere, we'd still
> > >like the ability to bring the films in-house for inspection.  From
> > >Jim's earlier replies, it seems like ZnCdS is already allowed in the
> > >lab, so I presume that's no problem?
> > >
> > >Thanks,
> > >
> > >Ben
> > >
> > >
> > >On 12/09/06, Ed Myers <edmyers at stanford.edu> wrote:
> > >>Ben,
> > >>
> > >>SpecMat has reviewed your request, and do not think your process is
> > >>viable at SNF.  We would like to work through the NNIN remote
> > >>processing community on your behalf if you are interested.  We will
> > >>be happy to fill out the required paperwork.  Please let me know how
> > >>you would like to proceed.
> > >>
> > >>Regards,
> > >>
> > >>
> > >>At 03:04 PM 9/7/2006, you wrote:
> > >> >Hello specmat committee,
> > >> >
> > >> >     On behalf of A.M.Fitzgerald and Associates, I'd like to submit a
> > >> >material request for ZnS.  This material will be deposited at an
> > >> >external vendor and we'd like to bring it into SNF for dry etching
> > >> >only.
> > >> >
> > >> >     To our knowledge, this material has been used at the Univ of
> > >> >Minnesota clean room for optical MEMS.
> > >> >
> > >> >     Please advice us as to whether this material is allowed in SNF
> > >> >and  if so in which machines.
> > >> >
> > >> >Thanks,
> > >> >
> > >> >Ben Chui
> > >>
> > >>
> > >>
> >
> >
> >
> >
>