Request For Bringing in DUV112-6 Anti-Reflective Coating To SNF
mahnaz at stanford.edu
Tue Jan 9 14:11:36 PST 2007
I am writing to let you know that your chemical has been ok'd to be used
in our lab.
Let me know how much of this chemical is coming and I trust that you
know the routine of getting the yellow labels and the bar code better
than any body else.
The chemical can be spun on either the headway or Laurell spinner coater.
If you are using the small Oven( mahnaz's oven) I like to review the
procedure of running wafers in there with you.
Richter, Claudia wrote:
> Dear Specmat Committee,
> We would like to request to bring in an anti-reflective coating to
> SNF. The coating is the DUV112-6 from Brewer Science and we plan to
> use this together with the resists you have in-house (PMMA, UVN-30)
> for DUV lithography (holography).
> We will need this coating since our substrates (Li NO3) will have a
> metal layer (Cu) and reflection will be an issue during exposure. We
> would also like to use the Blue M oven (either the small or larger
> programmable one) to cure the resist. It's likely that a temperature
> of 175C will do. However, we plan on doing a matrix of bake times to
> find the optimal temperature/s that will work depending how the resist
> profiles will appear. Our substrates cannot tolerate the hotplate bake
> at these temperatures. The headway or laurel spin coaters would be
> used to dispense a very thin coating.
> We would like to use this coating as early as next week. Please
> contact me or Lan (lzhang at snf.stanford.edu
> <mailto:lzhang at snf.stanford.edu>) if you have any questions or require
> more information on this product.
> Best regards,
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