From degtz at stanford.edu  Tue Jun  5 22:26:20 2007
From: degtz at stanford.edu (David Gutierrez)
Date: Tue, 5 Jun 2007 22:26:20 -0700
Subject: use of polystyrene nanospheres in SNF
Message-ID: <a7fdcd8e0706052226rbdb0e65w3cbba5ab37654a2b@mail.gmail.com>

I am emailing in regards to a proposed material that we plan to bring into
SNF during the summer. Part of the project that we will be working on will
involve the use of polystyrene nanospheres for use during one of the process
steps.

My group members and I are wondering whether this material can be allowed to
be brought into SNF. I am attaching the MSDS provided by the company (Duke
Scientific) that describes the material.

These polystyrine nanospheres come in 15ml containers and are in a water
solution. The individual polystyrene nanospheres will be in the range of
about 300-500nm for the purposes that we are trying to use.

This project will be part of E342: MEMS Fabrication for the summer quarter.
Please contact us at your earliest convenience to determine whether we can
proceed with the proposed plan, or if we have to find alternate solutions.

Regards,
David E. Gutierrez
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From edmyers at stanford.edu  Wed Jun  6 07:31:51 2007
From: edmyers at stanford.edu (Ed Myers)
Date: Wed, 06 Jun 2007 07:31:51 -0700
Subject: use of polystyrene nanospheres in SNF
In-Reply-To: <a7fdcd8e0706052226rbdb0e65w3cbba5ab37654a2b@mail.gmail.com
 >
References: <a7fdcd8e0706052226rbdb0e65w3cbba5ab37654a2b@mail.gmail.com>
Message-ID: <6.2.5.6.2.20070606072912.03a38bc8@stanford.edu>

David,

Polystyrene spheres have been used in the facility, but where they 
are allowed is heavily regulated.  The SpecMat committee and I will 
have to see your proposed process flow before a decision can be 
made.  The process flow should include all of your process steps and 
the requested equipment.

Regards,
Ed

At 10:26 PM 6/5/2007, David Gutierrez wrote:
>I am emailing in regards to a proposed material that we plan to 
>bring into SNF during the summer. Part of the project that we will 
>be working on will involve the use of polystyrene nanospheres for 
>use during one of the process steps.
>
>My group members and I are wondering whether this material can be 
>allowed to be brought into SNF. I am attaching the MSDS provided by 
>the company (Duke Scientific) that describes the material.
>
>These polystyrine nanospheres come in 15ml containers and are in a 
>water solution. The individual polystyrene nanospheres will be in 
>the range of about 300-500nm for the purposes that we are trying to use.
>
>This project will be part of E342: MEMS Fabrication for the summer 
>quarter. Please contact us at your earliest convenience to determine 
>whether we can proceed with the proposed plan, or if we have to find 
>alternate solutions.
>
>Regards,
>David E. Gutierrez
>Content-Type: application/pdf; name=MSDS00106BWeb.pdf
>X-Attachment-Id: f_f2lcpjt1
>Content-Disposition: attachment; filename="MSDS00106BWeb.pdf"




From mgobet at stanford.edu  Wed Jun  6 14:51:47 2007
From: mgobet at stanford.edu (mgobet at stanford.edu)
Date: Wed, 06 Jun 2007 14:51:47 -0700
Subject: BCB (1st part)
Message-ID: <20070606145147.bh2vsuhqf48wcow4@webmail.stanford.edu>



----- Message transf?r? de mgobet at stanford.edu -----
     Date?: Wed, 30 May 2007 09:14:11 -0700
      De?: mgobet at stanford.edu
R?pondre ??: mgobet at stanford.edu
  Objet?: Re: Sharing costs of BCB
       ??: Ed Myers <edmyers at stanford.edu>
      Cc?: deji at snf.stanford.edu

Ed,

Thank you very much for your e-mail. Yes, we are planning to bring BCB
(Cyclotene 3022-57), adhesion promoter AP3000 and Primary Stripper A
from Dow CHemicals. I e-mailed Dow to request the MSDS and will
forward their e-mail to you as soon as I get it.

Process flow:
- spin AP3000, BCB on headway
- softbake
- cure in bluem
- use of PR or SiO2/SiNx as mask (mask is of course patterned using
optical lithography)
- etch of BCB in O2/CF4 plasma (either Drytek4 or PQuest after 21st of
each month for GaAs users)

Please let me know if you need any additional information.
THanks again.
Best,
Mathilde


Quoting Ed Myers <edmyers at stanford.edu>:

> Mathilde and Deji,
>
> Are you planning on using the BCB in the SNF facility?  If so, we need
> the MSDS and an understanding of your proposed process flow.  BCB has
> been used, but it is a regulated material and it must be semiconductor
> grade.
>
> Regards,
> Ed
>
>
> At 02:10 PM 5/29/2007, you wrote:
>> Hello,
>>
>> I am about to order BCB, Cyclotene 3022-57, together with another
>> labmember, Deji. We are wondering if somebody else is interested in
>> buying this product with us to further split the costs. The order is
>> for 1 liter bottle, which is a large quantity as we only need a few
>> droplets per wafer. As you may know, BCB is very expensive, so this
>> may be a very good opportunity to get some at a cheaper price.
>>
>> Please let us know by tomorrow if you are interested. Thanks.
>> Best,
>> Mathilde
>>




----- Fin du message transf?r? -----



From mgobet at stanford.edu  Wed Jun  6 14:52:20 2007
From: mgobet at stanford.edu (mgobet at stanford.edu)
Date: Wed, 06 Jun 2007 14:52:20 -0700
Subject: BCB (part 2)
Message-ID: <20070606145220.p76ewbldr0e84ow8@webmail.stanford.edu>



----- Message transf?r? de mgobet at stanford.edu -----
     Date?: Wed, 30 May 2007 10:23:04 -0700
      De?: mgobet at stanford.edu
R?pondre ??: mgobet at stanford.edu
  Objet?: MSDS
       ??: Ed Myers <edmyers at stanford.edu>
      Cc?: dejia at stanford.edu

Ed,

Attached are the MSDS.

Thanks.
Mathilde


----- Fin du message transf?r? -----

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From degtz at stanford.edu  Thu Jun  7 11:43:00 2007
From: degtz at stanford.edu (David Gutierrez)
Date: Thu, 7 Jun 2007 11:43:00 -0700
Subject: use of polystyrene nanospheres in SNF
In-Reply-To: <6.2.5.6.2.20070606072912.03a38bc8@stanford.edu>
References: <a7fdcd8e0706052226rbdb0e65w3cbba5ab37654a2b@mail.gmail.com>
	 <6.2.5.6.2.20070606072912.03a38bc8@stanford.edu>
Message-ID: <a7fdcd8e0706071143t1e6954aeo1dd1282a982b5bff@mail.gmail.com>

Hi Ed,

I'm attaching the proposed process flow, and the steps at which we're
planning to use the nanospheres are highlighted in blue. Please let us know
if this is possible, and the procedure for being able to use this material.

Thank,
David

On 6/6/07, Ed Myers <edmyers at stanford.edu> wrote:
>
> David,
>
> Polystyrene spheres have been used in the facility, but where they
> are allowed is heavily regulated.  The SpecMat committee and I will
> have to see your proposed process flow before a decision can be
> made.  The process flow should include all of your process steps and
> the requested equipment.
>
> Regards,
> Ed
>
> At 10:26 PM 6/5/2007, David Gutierrez wrote:
> >I am emailing in regards to a proposed material that we plan to
> >bring into SNF during the summer. Part of the project that we will
> >be working on will involve the use of polystyrene nanospheres for
> >use during one of the process steps.
> >
> >My group members and I are wondering whether this material can be
> >allowed to be brought into SNF. I am attaching the MSDS provided by
> >the company (Duke Scientific) that describes the material.
> >
> >These polystyrine nanospheres come in 15ml containers and are in a
> >water solution. The individual polystyrene nanospheres will be in
> >the range of about 300-500nm for the purposes that we are trying to use.
> >
> >This project will be part of E342: MEMS Fabrication for the summer
> >quarter. Please contact us at your earliest convenience to determine
> >whether we can proceed with the proposed plan, or if we have to find
> >alternate solutions.
> >
> >Regards,
> >David E. Gutierrez
> >Content-Type: application/pdf; name=MSDS00106BWeb.pdf
> >X-Attachment-Id: f_f2lcpjt1
> >Content-Disposition: attachment; filename="MSDS00106BWeb.pdf"
>
>
>
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From mahnaz at stanford.edu  Thu Jun  7 17:24:56 2007
From: mahnaz at stanford.edu (Mahnaz Mansourpour)
Date: Thu, 07 Jun 2007 17:24:56 -0700
Subject: [Fwd: MSDS sheets HDM polyimde for Stanford QF2007-068]
Message-ID: <4668A1D8.3030201@stanford.edu>

  Hello Peter
Your chemicals has been approved.
You may only use the headway  to spin these materials while working with 
this material you may not use any Teflon cassette and lab ware ( you can 
contaminate other very easily). You should label your lab ware with 
Polyimide. Use foil on the hot plate and regarding the bluem oven, I 
need to train you on that.
You need to come to my office and get the proper labeling which I talked 
to you about. 
It seems that this is a new version of polyimide  and I will like to 
hear your feed back on it.
mahnaz

-------- Original Message --------
Subject: MSDS sheets HDM polyimde for Stanford QF2007-068
Date: Tue, 05 Jun 2007 15:21:42 -0700
From: Peter Fierlinger <peter.fierlinger at stanford.edu>
To: mahnaz at stanford.edu



----- Forwarded message from JEAN.L.REED at usa.dupont.com -----
     Date: Tue, 5 Jun 2007 18:08:33 -0400
     From: Jean L Reed 
Reply-To: Jean L Reed 
  Subject: Re: HDM polyimde for Stanford QF2007-068
       To: peter.fierlinger at stanford.edu

Jean Reed
HDM Customer Service
800-346-5656 x11



Peter Fierlinger 
06/05/2007 02:37 PM

To
Jean L Reed/AE/DuPont at DuPont
cc

Subject
Re: HDM polyimde for Stanford QF2007-068






hi,

thank you very much for the quote,
please also send me the material saftey data sheet (msds) for all
three substances so that i can get the chemicals approved for used
inside our lab.

thank you very much,

peter


Quoting Jean L Reed :

> Jack Craig of our Technical Section has reviewed your requirements and
> recommends HD4110.  I'm attaching the data sheets for your review.  You
> can contact Jack directly at 864-391-4359 or jdcraig at infoave.net to
> discuss further.
>
> I'm also attaching our quote.  Please have your purcahsing group contact
> me to place an order.
>
>
>
>
>
>
> Jean Reed
> HDM Customer Service
> 800-346-5656 x11
> -
>
>                            @stanford.edu> To
>
> HDMicroSystems/Mail-in/DuPont at DuPon
>
>              06/04/2007 08:23          t
>              PM cc
>
>
> Subject
>
>                                        request for quote
>
>   To whom it may concern:
>
> we want to investigate the use of photodefinable polyimides for the
> construction of microchannels for an experiment in particle physics.
> Following a publication, we are interested in a specific resist, PI2731.
>
> please send me a quote for a small batch of this resist (~500 ml),
> together with the applicable deoveloper and rinse? is it eventually
> even possible to get a product sample that we could use to investigate
> our process?
>
> please find attached the new customer form you posted on your website,
> which i tried to fill out.
>
> thank you very much.
>
> peter fierlinger
>
>
>
>
> -------------------------------------------------
> Dr. Peter Fierlinger
> Varian 136, 382 Via Pueblo Mall
> Stanford University
> Stanford, CA 94305
> phone: (650) 725-2342   fax: (650) 725-6544
> -------------------------------------------------
>
> (See attached file: HDMQF.doc)
>
> This communication is for use by the intended recipient and contains
> information that may be Privileged, confidential or copyrighted under
> applicable law. If you are not the intended recipient, you are hereby
> formally notified that any use, copying or distribution of this e-mail,
> in whole or in part, is strictly prohibited. Please notify the sender by
> return e-mail and delete this e-mail from your system. Unless explicitly
> and conspicuously designated as "E-Contract Intended", this e-mail does
> not constitute a contract offer, a contract amendment, or an acceptance
> of a contract offer. This e-mail does not constitute a consent to the
> use of sender's contact information for direct marketing purposes or for
> transfers of data to third parties.
>
> Francais Deutsch Italiano  Espanol  Portugues  Japanese  Chinese  Korean
>
>            http://www.DuPont.com/corp/email_disclaimer.html
>





-------------------------------------------------
Peter Fierlinger
Varian 136, 382 Via Pueblo Mall
Stanford University
Stanford, CA 94305
phone: (650) 725-2342   fax: (650) 725-6544
-------------------------------------------------


This communication is for use by the intended recipient and contains
information that may be Privileged, confidential or copyrighted under
applicable law. If you are not the intended recipient, you are hereby
formally notified that any use, copying or distribution of this e-mail,
in whole or in part, is strictly prohibited. Please notify the sender by
return e-mail and delete this e-mail from your system. Unless explicitly
and conspicuously designated as "E-Contract Intended", this e-mail does
not constitute a contract offer, a contract amendment, or an acceptance
of a contract offer. This e-mail does not constitute a consent to the
use of sender's contact information for direct marketing purposes or for
transfers of data to third parties.

Francais Deutsch Italiano  Espanol  Portugues  Japanese  Chinese  Korean

            http://www.DuPont.com/corp/email_disclaimer.html


----- End forwarded message -----




-------------------------------------------------
Peter Fierlinger
Varian 136, 382 Via Pueblo Mall
Stanford University
Stanford, CA 94305
phone: (650) 725-2342   fax: (650) 725-6544
-------------------------------------------------



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From rebeccat at stanford.edu  Fri Jun  8 13:08:02 2007
From: rebeccat at stanford.edu (rebeccat at stanford.edu)
Date: Fri, 08 Jun 2007 13:08:02 -0700
Subject: question about bringing materials BACK INTO the snf
Message-ID: <20070608130802.pizgpf692xkw8wgg@webmail.stanford.edu>

Dear SNF SpecMat Committee,

I am taking ME342 this summer and one of our process steps involves  
having Tom Carver deposit a layer of Ti-Au on a Silicon wafer that has  
been coated with PDMS.

Will we be able to bring our wafers from Tom Carver BACK INTO THE SNF  
once he has deposited the metal layer?  If this is a problem, could we  
gain litho-only access for processing those wafers that we bring back  
into SNF?

Or do we need to figure out a way to finish our processing outside of the SNF?

Thank you very much,
-rebecca taylor
(SMEAs group in E341/ME342)


From newsletter at nilt.com  Fri Jun 15 00:00:54 2007
From: newsletter at nilt.com (newsletter at nilt.com)
Date: Fri, 15 Jun 2007 09:00:54 +0200
Subject: NILT nanonews june 15: Win a luxury trip to copenhagen, hydrogen to be stored in carbon nanohorns, second impression for NIL
Message-ID: <8e8da9f97d46f06000d8f6a50014766e@nilt.com>

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From news at discount-educational-software.com  Sat Jun 16 06:22:14 2007
From: news at discount-educational-software.com (Educational Software Newsletter)
Date: Sat, 16 Jun 2007 09:22:14 -0400
Subject: Educational Software Sale - June 2007                   
Message-ID: <76a4d8823ea75c40cb84189feb2572@bmw>

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From edmyers at stanford.edu  Wed Jun 20 09:53:19 2007
From: edmyers at stanford.edu (Ed Myers)
Date: Wed, 20 Jun 2007 09:53:19 -0700
Subject: Fwd: RE: 150C PECVD
Message-ID: <6.2.5.6.2.20070620094630.01dd8538@stanford.edu>

All,

We have an open request for lowering the temperature for a few STS 
PECVD runs.  Jeanine is not very comfortable with this when I talked 
with her a few weeks ago.  At the time, she was concerned about how 
the system was functioning.  Jim has worked on the tool and the 
performance is much better, although we have some Low Frequency oxide problems.

My understanding is, low temperature depositions have been done in 
the past.  I do not know if there was any problems or is this is 
something we should be able to support when requested.  The users are 
anxious to test the process.  I would like to give them a quick 
response.  Jeanine is on vacation, so we tneed to make the decision 
without her knowledge.

Ed


>X-Sieve: CMU Sieve 2.3
>Delivered-To: edmyers at stanford.edu
>X-YMail-OSG: 
>o825lR0VM1nM2pYU7mRgQRnhhavcoR.hDdFKjpZbLrsR.8KJwchQBycBa.B5xJG4rK3GRwyVULJ.IKDnrj.FxaMCVa33ATOf8EPJzv.2WVxuY9gvhac-
>From: "Alexander Driskill-Smith" <alexander.driskill-smith at grandisinc.com>
>To: "'Ed Myers'" <edmyers at stanford.edu>
>Cc: "'Yunfei Ding'" <yunfei.ding at grandisinc.com>,
>         "Shengyuan Wang" <shengyuan.wang at grandisinc.com>
>Subject: RE: 150C PECVD
>Date: Tue, 19 Jun 2007 18:41:41 -0700
>X-Mailer: Microsoft Office Outlook 11
>Thread-Index: AceWR4MeRKWdhU3FShamS7XJgPP4jwAAQbpwByS+NxA=
>
>Ed,
>
>Thanks for the brief discussion in the gowning room today. We're keen to try
>out the STS at 150 degrees C as soon as possible - I'm hoping sometime this
>week - so do please let me know as soon as you have spoken with the
>appropriate people. We can come in to the Fab anytime tomorrow (Wednesday),
>Thursday afternoon or anytime Friday to try out the process for the first
>time.
>
>Best regards,
>
>Alex
>
>
>The contents of this email message and any attachments are confidential and
>are intended solely for addressee. The information or ideas contained herein
>or attached hereto may also be legally privileged and will remain the
>property of the disclosing party. No license or other rights to any
>confidential information is granted or implied hereby. If you have received
>this transmission in error, any use, reproduction or dissemination of this
>transmission is strictly prohibited and enforceable by law. If you are not
>the intended recipient, please immediately notify the sender by reply email
>or at 408-945-2160 and delete this message and its attachments, if any.
>
>
>-----Original Message-----
>From: Alexander Driskill-Smith
>[mailto:alexander.driskill-smith at grandisinc.com]
>Sent: Monday, May 14, 2007 10:06 AM
>To: 'Ed Myers'
>Subject: RE: 150C PECVD
>
>Many thanks, Ed. This sounds promising. We'll keep an eye on Coral for
>updates.
>
>Best regards,
>
>Alex
>
>
>The contents of this email message and any attachments are confidential and
>are intended solely for addressee. The information or ideas contained herein
>or attached hereto may also be legally privileged and will remain the
>property of the disclosing party. No license or other rights to any
>confidential information is granted or implied hereby. If you have received
>this transmission in error, any use, reproduction or dissemination of this
>transmission is strictly prohibited and enforceable by law. If you are not
>the intended recipient, please immediately notify the sender by reply email
>or at 408-945-2160 and delete this message and its attachments, if any.
>
>
>-----Original Message-----
>From: Ed Myers [mailto:edmyers at stanford.edu]
>Sent: Monday, May 14, 2007 9:47 AM
>To: Alexander Driskill-Smith
>Subject: RE: 150C PECVD
>
>Alex,
>
>It looks like the system will be down for awhile.  We lost one of the RF
>generators and of course they are no longer supported.  One of Jeannie's
>concerns was making a change while the tool was unstable.  I had been voting
>the instability was this power supply.  When we get the power supply
>changed, I'm hoping we can eliminate Jeannie's concerns and you can move
>forward.
>
>Keep looking at Coral for updates on the STS status.
>
>Ed
>
>
>At 04:30 PM 5/1/2007, you wrote:
> >Ed,
> >
> >I have 3 quick questions for you.
> >
> >1) We will shortly need to order a couple of masks. I recall your
> >saying in the past that it's best to use an outside vendor for masks
> >and that it takes around 3-4 days at cost of around $750. Is that
> >correct? And which vendor would you recommend? On the SNF website, it
> >says that SNF users often go to Compugraphics, but I just wanted to
> >check that Compugraphics is still the preferred vendor.
> >
> >2) I'd like to bring our HSQ ebeam resist into SNF when we are next
> >visiting on Thursday (you approved it for SpecMat earlier this year).
> >But it needs to be stored in a refrigerator. Can you confirm there is a
> >refrigerator available and where it is located? I just want to check
> >this before we bring the bottle in.
> >
> >3) Following up on Yunfei's email on Friday, what is the procedure for
> >getting approval to run a 150 C recipe on the STS PECVD tool? I recall
> >that when Jeannie Perez trained us on this tool, she said something
> >about getting Review Board approval, but I'm not sure what the
> >procedure is.
> >
> >Best regards,
> >
> >Alex
> >
> >
> >
> >Alexander A. G. Driskill-Smith
> >Grandis, Inc.
> >1123 Cadillac Court, Milpitas, CA 95035
> >Telephone: (408) 945-2156
> >Facsimile: (408) 945-2161
> >Cellphone: (408) 807-4402
> >Email:
> ><blocked::mailto:alexander.driskill-smith at grandisinc.com>alexander.dris
> >kill-smith at grandisinc.com
> >Internet: <http://www.grandisinc.com/>www.grandisinc.com
> >
> >The contents of this email message and any attachments are confidential
> >and are intended solely for addressee. The information or ideas
> >contained herein or attached hereto may also be legally privileged and
> >will remain the property of the disclosing party. No license or other
> >rights to any confidential information is granted or implied hereby. If
> >you have received this transmission in error, any use, reproduction or
> >dissemination of this transmission is strictly prohibited and
> >enforceable by law. If you are not the intended recipient, please
> >immediately notify the sender by reply email or at 408-945-2160 and
> >delete this message and its attachments, if any.
> >
> >
> >-----Original Message-----
> >From: Yunfei Ding
> >[<mailto:yunfei.ding at grandisinc.com>mailto:yunfei.ding at grandisinc.com]
> >Sent: Friday, April 27, 2007 4:06 PM
> >To: emyers at snf.stanford.edu
> >Cc: 'Alex Driskill-Smith'; 'Shengyuan Wang'
> >Subject: 150C PECVD
> >
> >Hi Ed,
> >
> >Last year when we were discussing the feasibility of doing our process
> >in SNF we talked about the low temperature SiO2 deposition which is
> >critical for our process, you told us it's possible for us to try and
> >setup a 150C recipe on the STS PECVD tool. We are now working on the
> >process and have reached to this step. Please let me know what
> >precedure we need to go through for testing and setting up a new
> >recipe.
> >
> >We've done 150C PECVD on a plasmaquest tool, the recipe is listed here.
> >Please check if this is resonable or if you have any suggestion. If
> >possible we'd like to start with this recipe (or a recipe you
> >suggest) and make adjustments later on for better results.
> >
> >
> >Recipe:
> >gases:
> >         2% SiH4 in He 200 sccm
> >         N2O 450 sccm
> >pressure:
> >         900 mtorr
> >Power:
> >         20 watts
> >Tmeperaure:
> >         150C
> >
> >
> >
> >
> >
> >Best Regards,
> >
> >Yunfei Ding
> >
> >Grandis Inc.
> >1123 Cadillac Court
> >Milpitas, CA 95035
> >Phone: (408) 945 2158
> >Fax: (408) 945 2161
> >




From mcvittie at cis.Stanford.EDU  Wed Jun 20 10:11:33 2007
From: mcvittie at cis.Stanford.EDU (Jim McVittie)
Date: Wed, 20 Jun 2007 10:11:33 -0700 (PDT)
Subject: Fwd: RE: 150C PECVD
In-Reply-To: <6.2.5.6.2.20070620094630.01dd8538@stanford.edu>
Message-ID: <Pine.LNX.4.44.0706200959130.29864-100000@cis.Stanford.EDU>

Ed,

THe reason the tool is kept up at 350C is particle control. You can put
more dep onto the walls of the reactor without it flaking off if you keep
it at a constant temperature. It is a thin film stress issue.  If you are
willing to live with more particles or to do a chamber clean, there is no
big problem lowing the temperature. You will see a decease in dep rate at 
lower temp. I some process data from a similar Plasmatherm PECVD system. 
For both oxide and nitride, they give a dep temp range of 350 to 100C. 

	Jim 
 

On Wed, 20 Jun 2007, Ed Myers wrote:

> All,
> 
> We have an open request for lowering the temperature for a few STS 
> PECVD runs.  Jeanine is not very comfortable with this when I talked 
> with her a few weeks ago.  At the time, she was concerned about how 
> the system was functioning.  Jim has worked on the tool and the 
> performance is much better, although we have some Low Frequency oxide problems.
> 
> My understanding is, low temperature depositions have been done in 
> the past.  I do not know if there was any problems or is this is 
> something we should be able to support when requested.  The users are 
> anxious to test the process.  I would like to give them a quick 
> response.  Jeanine is on vacation, so we tneed to make the decision 
> without her knowledge.
> 
> Ed
> 
> 
> >X-Sieve: CMU Sieve 2.3
> >Delivered-To: edmyers at stanford.edu
> >X-YMail-OSG: 
> >o825lR0VM1nM2pYU7mRgQRnhhavcoR.hDdFKjpZbLrsR.8KJwchQBycBa.B5xJG4rK3GRwyVULJ.IKDnrj.FxaMCVa33ATOf8EPJzv.2WVxuY9gvhac-
> >From: "Alexander Driskill-Smith" <alexander.driskill-smith at grandisinc.com>
> >To: "'Ed Myers'" <edmyers at stanford.edu>
> >Cc: "'Yunfei Ding'" <yunfei.ding at grandisinc.com>,
> >         "Shengyuan Wang" <shengyuan.wang at grandisinc.com>
> >Subject: RE: 150C PECVD
> >Date: Tue, 19 Jun 2007 18:41:41 -0700
> >X-Mailer: Microsoft Office Outlook 11
> >Thread-Index: AceWR4MeRKWdhU3FShamS7XJgPP4jwAAQbpwByS+NxA=
> >
> >Ed,
> >
> >Thanks for the brief discussion in the gowning room today. We're keen to try
> >out the STS at 150 degrees C as soon as possible - I'm hoping sometime this
> >week - so do please let me know as soon as you have spoken with the
> >appropriate people. We can come in to the Fab anytime tomorrow (Wednesday),
> >Thursday afternoon or anytime Friday to try out the process for the first
> >time.
> >
> >Best regards,
> >
> >Alex
> >
> >
> >The contents of this email message and any attachments are confidential and
> >are intended solely for addressee. The information or ideas contained herein
> >or attached hereto may also be legally privileged and will remain the
> >property of the disclosing party. No license or other rights to any
> >confidential information is granted or implied hereby. If you have received
> >this transmission in error, any use, reproduction or dissemination of this
> >transmission is strictly prohibited and enforceable by law. If you are not
> >the intended recipient, please immediately notify the sender by reply email
> >or at 408-945-2160 and delete this message and its attachments, if any.
> >
> >
> >-----Original Message-----
> >From: Alexander Driskill-Smith
> >[mailto:alexander.driskill-smith at grandisinc.com]
> >Sent: Monday, May 14, 2007 10:06 AM
> >To: 'Ed Myers'
> >Subject: RE: 150C PECVD
> >
> >Many thanks, Ed. This sounds promising. We'll keep an eye on Coral for
> >updates.
> >
> >Best regards,
> >
> >Alex
> >
> >
> >The contents of this email message and any attachments are confidential and
> >are intended solely for addressee. The information or ideas contained herein
> >or attached hereto may also be legally privileged and will remain the
> >property of the disclosing party. No license or other rights to any
> >confidential information is granted or implied hereby. If you have received
> >this transmission in error, any use, reproduction or dissemination of this
> >transmission is strictly prohibited and enforceable by law. If you are not
> >the intended recipient, please immediately notify the sender by reply email
> >or at 408-945-2160 and delete this message and its attachments, if any.
> >
> >
> >-----Original Message-----
> >From: Ed Myers [mailto:edmyers at stanford.edu]
> >Sent: Monday, May 14, 2007 9:47 AM
> >To: Alexander Driskill-Smith
> >Subject: RE: 150C PECVD
> >
> >Alex,
> >
> >It looks like the system will be down for awhile.  We lost one of the RF
> >generators and of course they are no longer supported.  One of Jeannie's
> >concerns was making a change while the tool was unstable.  I had been voting
> >the instability was this power supply.  When we get the power supply
> >changed, I'm hoping we can eliminate Jeannie's concerns and you can move
> >forward.
> >
> >Keep looking at Coral for updates on the STS status.
> >
> >Ed
> >
> >
> >At 04:30 PM 5/1/2007, you wrote:
> > >Ed,
> > >
> > >I have 3 quick questions for you.
> > >
> > >1) We will shortly need to order a couple of masks. I recall your
> > >saying in the past that it's best to use an outside vendor for masks
> > >and that it takes around 3-4 days at cost of around $750. Is that
> > >correct? And which vendor would you recommend? On the SNF website, it
> > >says that SNF users often go to Compugraphics, but I just wanted to
> > >check that Compugraphics is still the preferred vendor.
> > >
> > >2) I'd like to bring our HSQ ebeam resist into SNF when we are next
> > >visiting on Thursday (you approved it for SpecMat earlier this year).
> > >But it needs to be stored in a refrigerator. Can you confirm there is a
> > >refrigerator available and where it is located? I just want to check
> > >this before we bring the bottle in.
> > >
> > >3) Following up on Yunfei's email on Friday, what is the procedure for
> > >getting approval to run a 150 C recipe on the STS PECVD tool? I recall
> > >that when Jeannie Perez trained us on this tool, she said something
> > >about getting Review Board approval, but I'm not sure what the
> > >procedure is.
> > >
> > >Best regards,
> > >
> > >Alex
> > >
> > >
> > >
> > >Alexander A. G. Driskill-Smith
> > >Grandis, Inc.
> > >1123 Cadillac Court, Milpitas, CA 95035
> > >Telephone: (408) 945-2156
> > >Facsimile: (408) 945-2161
> > >Cellphone: (408) 807-4402
> > >Email:
> > ><blocked::mailto:alexander.driskill-smith at grandisinc.com>alexander.dris
> > >kill-smith at grandisinc.com
> > >Internet: <http://www.grandisinc.com/>www.grandisinc.com
> > >
> > >The contents of this email message and any attachments are confidential
> > >and are intended solely for addressee. The information or ideas
> > >contained herein or attached hereto may also be legally privileged and
> > >will remain the property of the disclosing party. No license or other
> > >rights to any confidential information is granted or implied hereby. If
> > >you have received this transmission in error, any use, reproduction or
> > >dissemination of this transmission is strictly prohibited and
> > >enforceable by law. If you are not the intended recipient, please
> > >immediately notify the sender by reply email or at 408-945-2160 and
> > >delete this message and its attachments, if any.
> > >
> > >
> > >-----Original Message-----
> > >From: Yunfei Ding
> > >[<mailto:yunfei.ding at grandisinc.com>mailto:yunfei.ding at grandisinc.com]
> > >Sent: Friday, April 27, 2007 4:06 PM
> > >To: emyers at snf.stanford.edu
> > >Cc: 'Alex Driskill-Smith'; 'Shengyuan Wang'
> > >Subject: 150C PECVD
> > >
> > >Hi Ed,
> > >
> > >Last year when we were discussing the feasibility of doing our process
> > >in SNF we talked about the low temperature SiO2 deposition which is
> > >critical for our process, you told us it's possible for us to try and
> > >setup a 150C recipe on the STS PECVD tool. We are now working on the
> > >process and have reached to this step. Please let me know what
> > >precedure we need to go through for testing and setting up a new
> > >recipe.
> > >
> > >We've done 150C PECVD on a plasmaquest tool, the recipe is listed here.
> > >Please check if this is resonable or if you have any suggestion. If
> > >possible we'd like to start with this recipe (or a recipe you
> > >suggest) and make adjustments later on for better results.
> > >
> > >
> > >Recipe:
> > >gases:
> > >         2% SiH4 in He 200 sccm
> > >         N2O 450 sccm
> > >pressure:
> > >         900 mtorr
> > >Power:
> > >         20 watts
> > >Tmeperaure:
> > >         150C
> > >
> > >
> > >
> > >
> > >
> > >Best Regards,
> > >
> > >Yunfei Ding
> > >
> > >Grandis Inc.
> > >1123 Cadillac Court
> > >Milpitas, CA 95035
> > >Phone: (408) 945 2158
> > >Fax: (408) 945 2161
> > >
> 
> 
> 

-- 
--------------------------------------------------------------
Jim McVittie, Ph.D.    			Senior Research Scientist 
Allen Center for Integrated Systems     Electrical Engineering
Stanford University             	jmcvittie at stanford.edu
Rm. 336, 330 Serra Mall			Fax: (650) 723-4659
Stanford, CA 94305-4075			Tel: (650) 725-3640




From edmyers at stanford.edu  Thu Jun 21 17:01:22 2007
From: edmyers at stanford.edu (Ed Myers)
Date: Thu, 21 Jun 2007 17:01:22 -0700
Subject: 150C PECVD
In-Reply-To: <009a01c7b2dc$27f4c390$a201a8c0@drisklaptop>
References: <009a01c7b2dc$27f4c390$a201a8c0@drisklaptop>
Message-ID: <6.2.5.6.2.20070621163619.0411a018@stanford.edu>

Alex,

I talked with the staff and found that lower temperature depositions 
have been done in the past.  The low temperature does not appear to 
cause a problem with the equipment, but can have process problems, 
especially particles.  As a result, your group will be responsible to 
take all actions required to minimized potential particles for 
subsequent users.  This means, the chamber must be cleaned following 
your low temperature depositions (If particles are a problem for your 
process, you will need to lower the chamber temperature, let it 
stabilize, clean and coat the chamber before your deposition).

Following your low temperature deposition you must do the following 
before returning the system back to the user community.
1) do a chamber etch to remove any and all depositions on the chamber 
(the chamber temperature during the etch is not critical as long as 
all depositions have been removed)
2) Chamber coat per standard procedure.  The chamber must be at the 
standard temperature and equilibrated  before the chamber coatings 
can start and the films and film thickness must be per specification.

Regards,
Ed

At 06:41 PM 6/19/2007, Alexander Driskill-Smith wrote:
>Ed,
>
>Thanks for the brief discussion in the gowning room today. We're keen to try
>out the STS at 150 degrees C as soon as possible - I'm hoping sometime this
>week - so do please let me know as soon as you have spoken with the
>appropriate people. We can come in to the Fab anytime tomorrow (Wednesday),
>Thursday afternoon or anytime Friday to try out the process for the first
>time.
>
>Best regards,
>
>Alex
>
>
>The contents of this email message and any attachments are confidential and
>are intended solely for addressee. The information or ideas contained herein
>or attached hereto may also be legally privileged and will remain the
>property of the disclosing party. No license or other rights to any
>confidential information is granted or implied hereby. If you have received
>this transmission in error, any use, reproduction or dissemination of this
>transmission is strictly prohibited and enforceable by law. If you are not
>the intended recipient, please immediately notify the sender by reply email
>or at 408-945-2160 and delete this message and its attachments, if any.
>
>
>-----Original Message-----
>From: Alexander Driskill-Smith
>[mailto:alexander.driskill-smith at grandisinc.com]
>Sent: Monday, May 14, 2007 10:06 AM
>To: 'Ed Myers'
>Subject: RE: 150C PECVD
>
>Many thanks, Ed. This sounds promising. We'll keep an eye on Coral for
>updates.
>
>Best regards,
>
>Alex
>
>
>The contents of this email message and any attachments are confidential and
>are intended solely for addressee. The information or ideas contained herein
>or attached hereto may also be legally privileged and will remain the
>property of the disclosing party. No license or other rights to any
>confidential information is granted or implied hereby. If you have received
>this transmission in error, any use, reproduction or dissemination of this
>transmission is strictly prohibited and enforceable by law. If you are not
>the intended recipient, please immediately notify the sender by reply email
>or at 408-945-2160 and delete this message and its attachments, if any.
>
>
>-----Original Message-----
>From: Ed Myers [mailto:edmyers at stanford.edu]
>Sent: Monday, May 14, 2007 9:47 AM
>To: Alexander Driskill-Smith
>Subject: RE: 150C PECVD
>
>Alex,
>
>It looks like the system will be down for awhile.  We lost one of the RF
>generators and of course they are no longer supported.  One of Jeannie's
>concerns was making a change while the tool was unstable.  I had been voting
>the instability was this power supply.  When we get the power supply
>changed, I'm hoping we can eliminate Jeannie's concerns and you can move
>forward.
>
>Keep looking at Coral for updates on the STS status.
>
>Ed
>
>
>At 04:30 PM 5/1/2007, you wrote:
> >Ed,
> >
> >I have 3 quick questions for you.
> >
> >1) We will shortly need to order a couple of masks. I recall your
> >saying in the past that it's best to use an outside vendor for masks
> >and that it takes around 3-4 days at cost of around $750. Is that
> >correct? And which vendor would you recommend? On the SNF website, it
> >says that SNF users often go to Compugraphics, but I just wanted to
> >check that Compugraphics is still the preferred vendor.
> >
> >2) I'd like to bring our HSQ ebeam resist into SNF when we are next
> >visiting on Thursday (you approved it for SpecMat earlier this year).
> >But it needs to be stored in a refrigerator. Can you confirm there is a
> >refrigerator available and where it is located? I just want to check
> >this before we bring the bottle in.
> >
> >3) Following up on Yunfei's email on Friday, what is the procedure for
> >getting approval to run a 150 C recipe on the STS PECVD tool? I recall
> >that when Jeannie Perez trained us on this tool, she said something
> >about getting Review Board approval, but I'm not sure what the
> >procedure is.
> >
> >Best regards,
> >
> >Alex
> >
> >
> >
> >Alexander A. G. Driskill-Smith
> >Grandis, Inc.
> >1123 Cadillac Court, Milpitas, CA 95035
> >Telephone: (408) 945-2156
> >Facsimile: (408) 945-2161
> >Cellphone: (408) 807-4402
> >Email:
> ><blocked::mailto:alexander.driskill-smith at grandisinc.com>alexander.dris
> >kill-smith at grandisinc.com
> >Internet: <http://www.grandisinc.com/>www.grandisinc.com
> >
> >The contents of this email message and any attachments are confidential
> >and are intended solely for addressee. The information or ideas
> >contained herein or attached hereto may also be legally privileged and
> >will remain the property of the disclosing party. No license or other
> >rights to any confidential information is granted or implied hereby. If
> >you have received this transmission in error, any use, reproduction or
> >dissemination of this transmission is strictly prohibited and
> >enforceable by law. If you are not the intended recipient, please
> >immediately notify the sender by reply email or at 408-945-2160 and
> >delete this message and its attachments, if any.
> >
> >
> >-----Original Message-----
> >From: Yunfei Ding
> >[<mailto:yunfei.ding at grandisinc.com>mailto:yunfei.ding at grandisinc.com]
> >Sent: Friday, April 27, 2007 4:06 PM
> >To: emyers at snf.stanford.edu
> >Cc: 'Alex Driskill-Smith'; 'Shengyuan Wang'
> >Subject: 150C PECVD
> >
> >Hi Ed,
> >
> >Last year when we were discussing the feasibility of doing our process
> >in SNF we talked about the low temperature SiO2 deposition which is
> >critical for our process, you told us it's possible for us to try and
> >setup a 150C recipe on the STS PECVD tool. We are now working on the
> >process and have reached to this step. Please let me know what
> >precedure we need to go through for testing and setting up a new
> >recipe.
> >
> >We've done 150C PECVD on a plasmaquest tool, the recipe is listed here.
> >Please check if this is resonable or if you have any suggestion. If
> >possible we'd like to start with this recipe (or a recipe you
> >suggest) and make adjustments later on for better results.
> >
> >
> >Recipe:
> >gases:
> >         2% SiH4 in He 200 sccm
> >         N2O 450 sccm
> >pressure:
> >         900 mtorr
> >Power:
> >         20 watts
> >Tmeperaure:
> >         150C
> >
> >
> >
> >
> >
> >Best Regards,
> >
> >Yunfei Ding
> >
> >Grandis Inc.
> >1123 Cadillac Court
> >Milpitas, CA 95035
> >Phone: (408) 945 2158
> >Fax: (408) 945 2161
> >




From newsletter at nilt.com  Thu Jun 21 23:47:01 2007
From: newsletter at nilt.com (newsletter at nilt.com)
Date: Fri, 22 Jun 2007 08:47:01 +0200
Subject: NILT nanonews june 22: The winner is, nano and MEMS are advancing energy harvesting, quantum computer breakthrough
Message-ID: <e4c1eeb490a3431925eb9a5500197a0e@nilt.com>

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From nperez at stanford.edu  Tue Jun 26 08:19:16 2007
From: nperez at stanford.edu (Jeannie Perez)
Date: Tue, 26 Jun 2007 08:19:16 -0700
Subject: 150C PECVD
In-Reply-To: <6.2.5.6.2.20070621163619.0411a018@stanford.edu>
References: <009a01c7b2dc$27f4c390$a201a8c0@drisklaptop>
 <6.2.5.6.2.20070621163619.0411a018@stanford.edu>
Message-ID: <6.2.5.6.2.20070626081203.01d146c0@stanford.edu>

All,
To return STS PECVD to the standard condition after you completed 
your process, will be the minimum of the
first six steps in our cleaning procedure (see log sheet). If you 
would please notify me when you've completed the clean and is now 
returned to the STS community.
Thanks,
Jeannie

At 05:01 PM 6/21/2007, Ed Myers wrote:
>Alex,
>
>I talked with the staff and found that lower temperature depositions 
>have been done in the past.  The low temperature does not appear to 
>cause a problem with the equipment, but can have process problems, 
>especially particles.  As a result, your group will be responsible 
>to take all actions required to minimized potential particles for 
>subsequent users.  This means, the chamber must be cleaned following 
>your low temperature depositions (If particles are a problem for 
>your process, you will need to lower the chamber temperature, let it 
>stabilize, clean and coat the chamber before your deposition).
>
>Following your low temperature deposition you must do the following 
>before returning the system back to the user community.
>1) do a chamber etch to remove any and all depositions on the 
>chamber (the chamber temperature during the etch is not critical as 
>long as all depositions have been removed)
>2) Chamber coat per standard procedure.  The chamber must be at the 
>standard temperature and equilibrated  before the chamber coatings 
>can start and the films and film thickness must be per specification.
>
>Regards,
>Ed
>
>At 06:41 PM 6/19/2007, Alexander Driskill-Smith wrote:
>>Ed,
>>
>>Thanks for the brief discussion in the gowning room today. We're keen to try
>>out the STS at 150 degrees C as soon as possible - I'm hoping sometime this
>>week - so do please let me know as soon as you have spoken with the
>>appropriate people. We can come in to the Fab anytime tomorrow (Wednesday),
>>Thursday afternoon or anytime Friday to try out the process for the first
>>time.
>>
>>Best regards,
>>
>>Alex
>>
>>
>>The contents of this email message and any attachments are confidential and
>>are intended solely for addressee. The information or ideas contained herein
>>or attached hereto may also be legally privileged and will remain the
>>property of the disclosing party. No license or other rights to any
>>confidential information is granted or implied hereby. If you have received
>>this transmission in error, any use, reproduction or dissemination of this
>>transmission is strictly prohibited and enforceable by law. If you are not
>>the intended recipient, please immediately notify the sender by reply email
>>or at 408-945-2160 and delete this message and its attachments, if any.
>>
>>
>>-----Original Message-----
>>From: Alexander Driskill-Smith
>>[mailto:alexander.driskill-smith at grandisinc.com]
>>Sent: Monday, May 14, 2007 10:06 AM
>>To: 'Ed Myers'
>>Subject: RE: 150C PECVD
>>
>>Many thanks, Ed. This sounds promising. We'll keep an eye on Coral for
>>updates.
>>
>>Best regards,
>>
>>Alex
>>
>>
>>The contents of this email message and any attachments are confidential and
>>are intended solely for addressee. The information or ideas contained herein
>>or attached hereto may also be legally privileged and will remain the
>>property of the disclosing party. No license or other rights to any
>>confidential information is granted or implied hereby. If you have received
>>this transmission in error, any use, reproduction or dissemination of this
>>transmission is strictly prohibited and enforceable by law. If you are not
>>the intended recipient, please immediately notify the sender by reply email
>>or at 408-945-2160 and delete this message and its attachments, if any.
>>
>>
>>-----Original Message-----
>>From: Ed Myers [mailto:edmyers at stanford.edu]
>>Sent: Monday, May 14, 2007 9:47 AM
>>To: Alexander Driskill-Smith
>>Subject: RE: 150C PECVD
>>
>>Alex,
>>
>>It looks like the system will be down for awhile.  We lost one of the RF
>>generators and of course they are no longer supported.  One of Jeannie's
>>concerns was making a change while the tool was unstable.  I had been voting
>>the instability was this power supply.  When we get the power supply
>>changed, I'm hoping we can eliminate Jeannie's concerns and you can move
>>forward.
>>
>>Keep looking at Coral for updates on the STS status.
>>
>>Ed
>>
>>
>>At 04:30 PM 5/1/2007, you wrote:
>> >Ed,
>> >
>> >I have 3 quick questions for you.
>> >
>> >1) We will shortly need to order a couple of masks. I recall your
>> >saying in the past that it's best to use an outside vendor for masks
>> >and that it takes around 3-4 days at cost of around $750. Is that
>> >correct? And which vendor would you recommend? On the SNF website, it
>> >says that SNF users often go to Compugraphics, but I just wanted to
>> >check that Compugraphics is still the preferred vendor.
>> >
>> >2) I'd like to bring our HSQ ebeam resist into SNF when we are next
>> >visiting on Thursday (you approved it for SpecMat earlier this year).
>> >But it needs to be stored in a refrigerator. Can you confirm there is a
>> >refrigerator available and where it is located? I just want to check
>> >this before we bring the bottle in.
>> >
>> >3) Following up on Yunfei's email on Friday, what is the procedure for
>> >getting approval to run a 150 C recipe on the STS PECVD tool? I recall
>> >that when Jeannie Perez trained us on this tool, she said something
>> >about getting Review Board approval, but I'm not sure what the
>> >procedure is.
>> >
>> >Best regards,
>> >
>> >Alex
>> >
>> >
>> >
>> >Alexander A. G. Driskill-Smith
>> >Grandis, Inc.
>> >1123 Cadillac Court, Milpitas, CA 95035
>> >Telephone: (408) 945-2156
>> >Facsimile: (408) 945-2161
>> >Cellphone: (408) 807-4402
>> >Email:
>> ><blocked::mailto:alexander.driskill-smith at grandisinc.com>alexander.dris
>> >kill-smith at grandisinc.com
>> >Internet: <http://www.grandisinc.com/>www.grandisinc.com
>> >
>> >The contents of this email message and any attachments are confidential
>> >and are intended solely for addressee. The information or ideas
>> >contained herein or attached hereto may also be legally privileged and
>> >will remain the property of the disclosing party. No license or other
>> >rights to any confidential information is granted or implied hereby. If
>> >you have received this transmission in error, any use, reproduction or
>> >dissemination of this transmission is strictly prohibited and
>> >enforceable by law. If you are not the intended recipient, please
>> >immediately notify the sender by reply email or at 408-945-2160 and
>> >delete this message and its attachments, if any.
>> >
>> >
>> >-----Original Message-----
>> >From: Yunfei Ding
>> >[<mailto:yunfei.ding at grandisinc.com>mailto:yunfei.ding at grandisinc.com]
>> >Sent: Friday, April 27, 2007 4:06 PM
>> >To: emyers at snf.stanford.edu
>> >Cc: 'Alex Driskill-Smith'; 'Shengyuan Wang'
>> >Subject: 150C PECVD
>> >
>> >Hi Ed,
>> >
>> >Last year when we were discussing the feasibility of doing our process
>> >in SNF we talked about the low temperature SiO2 deposition which is
>> >critical for our process, you told us it's possible for us to try and
>> >setup a 150C recipe on the STS PECVD tool. We are now working on the
>> >process and have reached to this step. Please let me know what
>> >precedure we need to go through for testing and setting up a new
>> >recipe.
>> >
>> >We've done 150C PECVD on a plasmaquest tool, the recipe is listed here.
>> >Please check if this is resonable or if you have any suggestion. If
>> >possible we'd like to start with this recipe (or a recipe you
>> >suggest) and make adjustments later on for better results.
>> >
>> >
>> >Recipe:
>> >gases:
>> >         2% SiH4 in He 200 sccm
>> >         N2O 450 sccm
>> >pressure:
>> >         900 mtorr
>> >Power:
>> >         20 watts
>> >Tmeperaure:
>> >         150C
>> >
>> >
>> >
>> >
>> >
>> >Best Regards,
>> >
>> >Yunfei Ding
>> >
>> >Grandis Inc.
>> >1123 Cadillac Court
>> >Milpitas, CA 95035
>> >Phone: (408) 945 2158
>> >Fax: (408) 945 2161
>> >
>
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From newsletter at nilt.com  Fri Jun 29 00:00:20 2007
From: newsletter at nilt.com (newsletter at nilt.com)
Date: Fri, 29 Jun 2007 09:00:20 +0200
Subject: NILT nanonews june 29: Nano-method may help compress computer memory, molecular breakdown at the sub-20 nm scale, sub-10 nm metal structures by TEBAL
Message-ID: <443fd4e97d3cdaa14b92b1c50010e08e@nilt.com>

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