mtang at stanford.edu
Wed Mar 14 12:20:05 PDT 2007
Hi Colin --
This sounds fine to me (Mahnaz, what do you think?) But please dispose
of excess solution in the solvent carboy (it is chemically compatible)
--please do not transport chemical waste out of SNF. (Stanford has a
lot of rules about transporting chemicals around campus.) Please check
in with Mahnaz or Ed before proceeding.
Colin Reese wrote:
> To be honest, I am totally unsure as to the content of this stuff.
> From the description, it looks great, and may even be something to
> check out for our flashing problem with liftoff with standard litho.
> The nice part is that it's soluble in standard developer and liftoff
> solvents. If I remember correctly, this is not the case with LOL. The
> only major disadvantage I see at the moment is its short shelf life.
> I'll deal with that if/when it works. Did you see the
> bake-temperature-dependent developing profiles in the spec sheet? That
> is pretty neat, if you ask me.
> Usage would be as follows:
> Applied in solution form on Headway2 at the litho bench, using my own
> disposable syringes and filters. Solution deposited on Al foil during
> spin-coating would be collected and disposed of with
> solvent-contaminated waste as is PR when it is cleaned post-usage.
> The excess solution in syringe may either be disposed of in the
> carboys, or I can transport it to my lab for disposal as organic
> waste. It's pretty much going to the same place either way.
> It would then be baked on a hot-plate in the litho area, with Al foil
> disposed of as above.
> Resist would be coated on the litho track, exposure on KSI or KSII and
> then developed on the developer track. This would produce as much
> waste of the ARC as the exposed features of a 750A film. If this is an
> issue, I can hand-develop and dispose of the waste as you see fit.
> That should be about it. Please let me know if you have any questions.
> Mary Tang wrote:
>> Hi Colin --
>> You know, I'm not sure. There any many BARC's approved, but I don't
>> off-hand recall one from Brewer.... So, if you don't mind, let's
>> consider this a SpecMat request. You've already provided an
>> applications guide and MSDS. Could you please provide some
>> additional information about where (which equipment, which wet
>> benches/ovens/hot plates) and how (namely, what waste is anticipated
>> and where is it going) you plan to use this? Yes, we have a
>> freezer/refrigerator in the lab (behind the implant area) where
>> flammable-compatible chemicals are stored. To store a chemical
>> there, you'll need to get a yellow label and a barcode from Mahnaz or
>> By the way, I take it this is for your resist lifting-on-PDMS
>> problem? (Cool! Any idea what the basic chemistry of the "polymer
>> solids" is?)
>> Colin Reese wrote:
>>> Can you tell me if the Brewer Science Wide8B BARC has been approved
>>> for use in SNF yet? I have attached the specs and the MSDS. It
>>> contains NMP, cyclohexanone, tetrahydrofurfuryl alcohol, and a few
>>> proprietary ingredients. Looks like good stuff. Develops with
>>> standard developer and is compatible with liftoff. I got a free 60mL
>>> sample in the mail today.
>>> Also -- is there a chemical freezer in SNF?
>>> Dear Colin,
>>> Thank you for your interest in Brewer Science materials. I have
>>> attached a
>>> copy of the data sheets for all 3 of our i-line materials. As you
>>> will see
>>> we have 2 dry etch and 1 wet etch material. Please feel free to
>>> contact me
>>> should you have any further questions or need any more information.
>>> I look forward to hearing from you.
>>> Kind regards,
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
mtang at stanford.edu
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