Request To Bring A Silane To SNF

Claudia Richter crichter at completegenomics.com
Tue May 8 17:51:29 PDT 2007


Dear Specmat,

We plan on using water as the solvent for aminosilane process. We'll use
the wbgen as the location where the processing will take place. 


-Claudia


-----Original Message-----
From: Claudia Richter 
Sent: Friday, May 04, 2007 12:47 PM
To: 'Mary Tang'
Cc: specmat at snf.stanford.edu; Andres Fernandez; Bryan Staker
Subject: RE: Request To Bring A Silane To SNF

Hi Mary,

Ideally, we'd like the chemical to be stored at SNF. Would the chemical
be ok to store in the flammable cabinet behind the furnaces? We plan on
getting our own designated labware(Pyrex or polypropylene) for this
process on these test wafers. We can most certainly use the solvent
bench in the wbsolvent. This process does not require being in the litho
room. 

All further processing on these substrates will be brought back in-house
(the company) for testing and/or processing.


Claudia



- Will you be storing the chemical here?

Ideally
- I would strongly suggest that you use your own dedicated labware for
this.
- Is there any reason this needs to be done in the litho area? If not, 
wbsolvent would be a better place (surface modification processing is 
generally a bad idea in the litho area - cross-contamination, such as 
with used glassware, can drastically affect surface properties of other 
people's substrates.)
- If you are using IPA, dispose of waste in the solvent carboy. If you 
are using water, please process at wbgeneral and aspirate waste or 
collect locally.
- What kind of processing in the lab will be done subsequent to your 
surface modification and where?

Mary

Claudia Richter wrote:
>
> Dear Specmat Committee,
>
> I'd like to request to bring in to SNF 
> 3-aminopropyldimethylethoxysilane. The amine part of this silane is 
> important for further derivatization of the surface of our substrates.
>
> The process plan is to use this silane to coat silicon wafers (with 
> oxide). This silane is diluted down to a solution that is 1% in 
> isopropanol (99.98%) or DI water. The solution poured into a 
> dish/beaker large enough to accommodate the wafers. The wafers are 
> dipped in this solution and rinsed with isopropanol and water; then 
> dried with an air gun. The proposed plan is to do this in the solvent 
> bench in the lithography room and use the existing carboy that is 
> provided to collect the waste or have our own waste bottle to collect 
> this waste.
>
> Attached is the MSDS sheet. We would like to begin this process within

> the next week. Please contact me for any questions or further
information.
>
> Sincerely,
>
> Claudia
>
> ____________________________________
>
> Claudia M. Richter
>
> Sr. Process Engineer
>
> Complete Genomics
>
> 750 N. Pastoria Ave.
>
> Sunnyvale, CA. 94085
>
> P: 408.730.5700
>
> F: 408.769.2258
>
> www.completegenomics.com <http://www.completegenomics.com>
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu





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