From sales at gamma-co.com Wed Apr 2 10:56:04 2008 From: sales at gamma-co.com (Gary Poovey) Date: Wed, 2 Apr 2008 10:56:04 -0700 Subject: MgF2 wafers Message-ID: Hello All, Please find attached documents related to bringing wafes with MgF2 into the Stanford Nanofabrication Facility. Best regards, Gary Poovey PhD Gamma Co LLC 28557 Lemon Av. Escalon, CA 95320 tel 408-891-3830 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: MgF2 Msds.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 21160 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 0331 MgF2 etch.pdf Type: application/pdf Size: 257978 bytes Desc: not available URL: From verify at relay05.reunion.com Thu Apr 10 18:54:19 2008 From: verify at relay05.reunion.com (Hee Min Kang) Date: Thu, 10 Apr 2008 18:54:19 -0700 (PDT) Subject: Someone searched for you - See who! Message-ID: <9433152.18893211207878859788.JavaMail.tomcat@mailservice02.reunion.com> Hi, I looked for you on Reunion.com, the largest people search service - but you weren't there. See who else has been searching for you! http://www.reunion.com/showInviteRegistration.do?uid=255127960 -Hee Min P.S. ---------------------------- Reunion.com - Life Changes. Keep in Touch.? You have received this e-mail because a Reunion.com Member sent an invitation to this e-mail address. 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For assistance, please refer to our FAQ or Contact Us. http://help.reunion.com/selfhelp&lid=2 Our Address: 2118 Wilshire Blvd., Box 1008, Santa Monica, CA 90403-5784 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rogow at chemistry.ucsc.edu Mon Apr 14 11:15:07 2008 From: rogow at chemistry.ucsc.edu (David Rogow) Date: Mon, 14 Apr 2008 11:15:07 -0700 Subject: PDMS in innotec? Message-ID: <48039F2B.5010408@chemistry.ucsc.edu> Hello, I was wondering if I need to get permission from SpecMat to use PDMS (polydimethylsiloxane) in the innotec ebeam evaporator? It would be in solid form, 4" wafer size, and I would be evaporating metals onto the surface of the polymer. It would not be used with any other equipment and will not be stored in the lab. If there is any more information you need, please let me know. Thank you, David -- David L. Rogow Graduate Student Oliver Materials Research Group Department of Chemistry and Biochemistry University of California Santa Cruz 1156 High St. Santa Cruz, CA 95064 (831) 459-4225 lab (Physical Sciences 253) (831) 331-5230 cell From mtang at stanford.edu Mon Apr 14 11:34:46 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 14 Apr 2008 11:34:46 -0700 Subject: PDMS in innotec? In-Reply-To: <48039F2B.5010408@chemistry.ucsc.edu> References: <48039F2B.5010408@chemistry.ucsc.edu> Message-ID: <4803A3C6.1050806@stanford.edu> Hi David -- Cured PDMS on substrates (namely silicon or glass) is approved for use in innotec. Did you have a solid 4" piece of PDMS in mind? There are restrictions on where and how to mix and apply PDMS in the lab which must be strictly observed, because the silicon oil in the base can create havoc in parts of the lab. If you are applying PDMS in SNF and are not familiar with the procedures, let me know and we can review them. Thanks, Mary David Rogow wrote: > Hello, > > I was wondering if I need to get permission from SpecMat to use PDMS > (polydimethylsiloxane) in the innotec ebeam evaporator? It would be > in solid form, 4" wafer size, and I would be evaporating metals onto > the surface of the polymer. It would not be used with any other > equipment and will not be stored in the lab. If there is any more > information you need, please let me know. > Thank you, > > David > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Wed Apr 16 16:01:14 2008 From: mtang at stanford.edu (Mary Tang) Date: Wed, 16 Apr 2008 16:01:14 -0700 Subject: [Fwd: FeCl3 In Clean Room?] Message-ID: <4806853A.9090503@stanford.edu> Hi all -- I've just spoken with Kevin. He's got premixed, concentrated FeCl3. He would like to bring in a small bottle and store it in the Chemicals Passthrough. He will be diluting it up and etching metals at wbgeneral. Here's an MSDS for FeCl3 solution. http://www.jtbaker.com/msds/englishhtml/f1080.htm It's a corrosive and the incompatibles are not likely to be encountered in the Chemicals Passthrough. I've asked that he yellow label his small bottle and place it in a large container, also yellow labeled, and place this container in the personal chemicals storage area of the Chemicals Passthrough where there is individual secondary containment slots. This should prevent people from putting another small container in the same secondary containment slot that may be incompatible. This will be used only at wbgeneral and he will collect waste (used acid and first three rinses) locally, in an appropriately labeled waste container. Let me know if there is anything else you'd like to add? Thanks -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An embedded message was scrubbed... From: "Kevin Crabb" Subject: FeCl3 In Clean Room? Date: Tue, 15 Apr 2008 13:35:05 -0700 Size: 3939 URL: From sales at gamma-co.com Thu Apr 17 16:44:06 2008 From: sales at gamma-co.com (Gary Poovey) Date: Thu, 17 Apr 2008 16:44:06 -0700 Subject: MgF2 wafers In-Reply-To: <6.2.5.6.2.20080417073803.039181f0@stanford.edu> References: <6.2.5.6.2.20080402112025.03dc2aa0@stanford.edu> <1F81398A41F14F0DA392FD7CCC502344@GammaCoPC> <6.2.5.6.2.20080417073803.039181f0@stanford.edu> Message-ID: Hi Ed, Thank you for meeting with me today. Please find attached two MSDS's and my not of request for the use of MgF2 in SNF facility. Best regards, Gary ----- Original Message ----- From: "Ed Myers" To: "Gary Poovey" Cc: ; Sent: Thursday, April 17, 2008 7:45 AM Subject: Re: MgF2 wafers > Gary, > > The facility has had many materials, but it doesn't mean we have a > completely open door policy. We still need to make sure processing is > safe for the lab members and our equipment set. > > In order to understand and capture where and what material flows through > the facility and equipment we ask lab member to fill out the specmat > request form, as I stated in my April 2nd email. The questions are not > detailed and should not take much time to complete. > > Regards, > Ed > > > At 06:52 AM 4/17/2008, Gary Poovey wrote: >>Hi Ed, >> >>I spoke with James Conway while he was working with me on the e-beam >>lithography, and he said that the lab has had MgF2 OKed before. >> >>Best regards, Gary >> >> >>----- Original Message ----- From: "Ed Myers" >>To: "Gary Poovey" >>Cc: >>Sent: Wednesday, April 02, 2008 11:36 AM >>Subject: Re: MgF2 wafers >> >> >>>Gary, >>> >>>An important part of a specmat request is the understanding of the >>>equipment set where the new materials will be processed. Many of these >>>questions can be answered by following the guideline for bringing in new >>>materials can be found at our web site at >>>http://snf.stanford.edu/Materials/NewMatProc.html. >>> >>>Have you discussed your processing needs with an SNF technical liaison? >>>If so, who was that person. >>> >>>Regards, >>>Ed >>> >>> >>>At 10:56 AM 4/2/2008, Gary Poovey wrote: >>>>Hello All, >>>> >>>>Please find attached documents related to bringing wafes with MgF2 into >>>>the Stanford Nanofabrication Facility. >>>> >>>>Best regards, Gary Poovey PhD >>>>Gamma Co LLC >>>>28557 Lemon Av. >>>>Escalon, CA 95320 >>>>tel 408-891-3830 >>> > > -------------- next part -------------- A non-text attachment was scrubbed... Name: MgF2 Msds powder.doc Type: application/msword Size: 63488 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 0331 MgF2 etch.pdf Type: application/pdf Size: 257978 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 0401 MgF2 request.doc Type: application/msword Size: 31232 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: MgF2 Msds.doc Type: application/msword Size: 54784 bytes Desc: not available URL: From Salowitz at Stanford.edu Thu Apr 17 17:48:47 2008 From: Salowitz at Stanford.edu (Nathan Salowitz) Date: Thu, 17 Apr 2008 17:48:47 -0700 Subject: Spin Coating and etching PZT films Message-ID: <6.2.5.6.2.20080417170101.01e76730@Stanford.edu> Hello, I am seeking to do film depositions of PZT in the SNF. I note that PZT itself is approved for most of the work I would like to do, however I need approval for the chemical to do the film deposition. This is a spincoat-cure process with a solution of PZT Particulate suspended in 2-methoxyethanol. MSDS Sheets for the solution (lead word "solution") as well as all the precursor chemicals (lead word "precursor") are attached. There is also a process flow chart up through this point attached with the proposed SNF portion highlighted in red and desired equipment to the left of that. I am seeking to use Headway2 and a small kiln or tylan4 for the 'wet' portion of the work. The rest of my process is clearly covered under the allowable processing of PZT. Please let me know if there is any further information I can provide, or if you want to talk to me about the process. Nathan Salowitz Coral: nxs4059 -------------- next part -------------- A non-text attachment was scrubbed... Name: PZT proposed process NS 2008-4-17.pdf Type: application/pdf Size: 19875 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: Solution PZT MSDS.pdf Type: application/pdf Size: 416478 bytes Desc: not available URL: From mahnaz at stanford.edu Fri Apr 18 17:17:11 2008 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 18 Apr 2008 17:17:11 -0700 Subject: [Fwd: Materials & non-clean processing of PZT] Message-ID: <48093A07.3060706@stanford.edu> I have not study this yet. Mary, is the single furnace in wafer saw room up? mahnaz -------- Original Message -------- Subject: Materials & non-clean processing of PZT Date: Mon, 14 Apr 2008 10:33:56 -0700 From: Nathan Salowitz To: mahnaz at snf.stanford.edu Hello Mahnaz, Just following up on the email below. Please let me know what steps I can take to facilitate getting the materials approved, getting training on the spin coater (who should I contact? I do not see a spin coater in the equipment list). If you would like to meet please let me know. I would like to do this process very soon so I need to keep this all moving forward. Cheers, Nate Hi Mahnaz, I talked to you briefly last week about some equipment I'm looking to use which the SNF has. Specifically a spin coater and oven/furnace capable of 700C which can fit a 4 inch wafer. These do not need to be in clean room areas. The MSDS for the materials I'm working with are attached as is a process flow. There are 2 groups, one labeled Precursor and the other labeled Solution (some appear in both). I will be mixing the precursor chemicals in a Chem-E lab to form the Solution that I need to do the spin coating with, precursors are primarily included so you know what is going into the solution. The solution I want to use in the SNF Facilities should essentially be a particulate (PZT) suspended is a fluid, MSDS sheets for a similar particulate and the other chemicals in the solution are also included. Please let me know your thoughts on this and if you have any further questions. Please also let me know who I need to talk to about training/permission to use the spin coater and oven/furnace Thankyou, Nate Nathan Salowitz Coral ID nxs4059 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 2008-4-7 overall PZT process.doc Type: application/msword Size: 29184 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Precursor MSDS 2-METHOXYETHANOL.pdf Type: application/pdf Size: 140700 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Solution MSDS 2-METHOXYETHANOL.pdf Type: application/pdf Size: 140700 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: Precursor MSDS titanium propoxide.pdf Type: application/pdf Size: 52528 bytes Desc: not available URL: From mtang at stanford.edu Fri Apr 18 17:19:02 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 18 Apr 2008 17:19:02 -0700 Subject: [Fwd: Materials & non-clean processing of PZT] In-Reply-To: <48093A07.3060706@stanford.edu> References: <48093A07.3060706@stanford.edu> Message-ID: <48093A76.4070700@stanford.edu> Wups, I haven't looked at this yet... And yes, the Thermolyne furnace is OK to use. There's a manual in there. I'll go over its use with anyone who needs it. Mary Mahnaz Mansourpour wrote: > I have not study this yet. > Mary, is the single furnace in wafer saw room up? > > mahnaz > > -------- Original Message -------- > Subject: Materials & non-clean processing of PZT > Date: Mon, 14 Apr 2008 10:33:56 -0700 > From: Nathan Salowitz > To: mahnaz at snf.stanford.edu > > > > Hello Mahnaz, > Just following up on the email below. Please let me know what steps > I can take to facilitate getting the materials approved, getting > training on the spin coater (who should I contact? I do not see a > spin coater in the equipment list). If you would like to meet please > let me know. I would like to do this process very soon so I need to > keep this all moving forward. > > Cheers, > Nate > > > Hi Mahnaz, > I talked to you briefly last week about some equipment I'm looking > to use which the SNF has. Specifically a spin coater and > oven/furnace capable of 700C which can fit a 4 inch wafer. These do > not need to be in clean room areas. > > The MSDS for the materials I'm working with are attached as is a > process flow. There are 2 groups, one labeled Precursor and the > other labeled Solution (some appear in both). I will be mixing the > precursor chemicals in a Chem-E lab to form the Solution that I need > to do the spin coating with, precursors are primarily included so you > know what is going into the solution. The solution I want to use in > the SNF Facilities should essentially be a particulate (PZT) > suspended is a fluid, MSDS sheets for a similar particulate and the > other chemicals in the solution are also included. > > Please let me know your thoughts on this and if you have any further > questions. Please also let me know who I need to talk to about > training/permission to use the spin coater and oven/furnace > > Thankyou, > Nate > > Nathan Salowitz > Coral ID nxs4059 > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From linyouc at stanford.edu Tue Apr 22 16:11:30 2008 From: linyouc at stanford.edu (linyouc at stanford.edu) Date: Tue, 22 Apr 2008 16:11:30 -0700 Subject: Bismuth evaporation request Message-ID: <20080422161130.uzxs8bfsgoggg440@webmail.stanford.edu> Dear Committee, I am writing to kindly request approval of my using bismuth at Innotech. The related information about this application is listed as following: Contact Information Name: Linyou Cao Coral login: linyoucao Phone number: 650-723-6467 Email address: linyouc at stanford.edu PI: Prof. Mark L. Brongersma Material. Common names: Bi Trade names: Bismuth CAS numbers:7440-69-9 MSDS: Attached Vendor/manufacturer info: ESPI 1050 Benson Way Ashland, OR 97520 Email:sales at espimetals.com Phone:800.638.2581,541.488.8311 FAX: 800.488.0060,541.488.8313 Reason for request &Process Flow: Using Innotech to evaporate thin film (< 1 nm) of Bismuth onto silicon wafer Amount and form: ~50 gram Solid pellets Storage: In my own lab. As a part of application, the MSDS form for Bismuth is attached. I would very much appreciate your time to evaluate and approve my application as soon as possible. Sincerely Linyou -- Linyou Cao PhD candidate Department of Materials Science and Engineering Brongersma Group Stanford University -------------- next part -------------- A non-text attachment was scrubbed... Name: bismuth-MSDS.pdf Type: application/pdf Size: 87159 bytes Desc: not available URL: From news at discount-educational-software.net Thu Apr 24 13:41:33 2008 From: news at discount-educational-software.net (Academic Software News) Date: Thu, 24 Apr 2008 16:41:33 -0400 Subject: Academic Software News - April 2008 Message-ID: <76af2ab431f4ffce61280090ad20d3@bmw> Computer Products for Education is pleased to provide Educational Software News to qualified students, faculty, staff, and schools for current news on pricing and availability of Academic Edition Software from Microsoft, Adobe, Autodesk, Corel, Quark, EndNote, FileMaker, and many other major software manufacturers. Autodesk recently reorganized their academic software program and discontinued the availability of many programs at the educational price level. Currently Autodesk is only selling 1-year licenses of the below listed products. See below for details. Please visit our website for more information: http://www.discount-educational-software.net or call 800-679-7007. Educational software is exclusively available to Qualified Students, Faculty, Staff and Schools of K-12 and Higher Education institutions. (see below for details) ------ Education Prices for April 2008 -------- ---------------------- Education Standard You ADOBE Price Retail Save! ---------------------- --------- ------ ----- Acrobat 8.0 Professional $148.95 $500 70% Acrobat 8.0 Standard $96.95 $300 68% After Effects CS3 $348.95 $999 65% CS3 Design Premium (1) $589.95 $1799 67% CS3 Design Standard (2) $389.95 $1199 67% CS3 Master Collection(3) $989.95 $2499 60% CS3 Production Premium (4) $589.95 $1699 65% CS3 Web Premium (5) $489.95 $1599 69% CS3 Web Standard (6) $389.95 $999 61% Dreamweaver CS3 $198.95 $399 50% Flash Professional CS3 $248.95 $699 64% Illustrator CS3 $198.95 $699 72% InDesign CS3 $198.95 $699 72% Photoshop Elements 6.0 $68.95 $150 54% Photoshop Extended CS3 $298.95 $999 70% Premiere Pro CS3 $348.95 $799 56% http://www.discount-educational-software.net/adobe.html (1) CS3 Design Premium includes: InDesign, Photoshop Extended, Illustrator, Flash Pro, Dreamweaver, and Acrobat 8 Pro (2) CS3 Design Standard includes: InDesign, Photoshop, Illustrator, and Acrobat 8 Pro (3) CS3 Master Collection includes: InDesign, Photoshop Extended, Illustrator, Flash Pro, Dreamweaver, Contribute, Fireworks, After Effects Pro, Premiere Pro, Soundbooth, Encore, OnLocation, Ultra, and Acrobat 8 Pro (4) CS3 Production Premium includes: Photoshop Extended, Illustrator, Flash Pro, After Effects Pro, Premiere Pro, Encore, OnLocation, and Ultra (5) CS3 Web Pemium includes: Photoshop Extended, Illustrator, Acrobat 8 Pro, Flash Pro, Dreamweaver, Contribute, and Fireworks (6) CS3 Web Standard includes: Flash Pro, Dreamweaver, Contribute, and Fireworks ---------------------- Education Standard You MICROSOFT Price Retail Save! ---------------------- --------- ------ ----- Expressions Web 1.0 $59.95 $299 80% Office 2007 Professional(2) $189.95 $499 62% Office 2007 Standard(1) $148.95 $399 63% Office 2007 Ultimate(3) $259.95 $679 62% Office 2008 for Macintosh $148.95 $500 70% Office Accounting Pro 2007 $89.95 $229 61% Powerpoint 2007 $118.95 $229 48% Project 2007 Professional $198.95 $999 80% Project 2007 Standard $69.95 $349 80% Visio 2007 Professional $159.95 $559 71% Visio 2007 Standard $84.95 $259 67% Visual Studio 2008 Pro $109.95 $899 88% Windows Vista Home Prem Upg $74.95 $160 53% Windows XP Pro Full Version $159.95 - - Windows XP Pro Upgrade $94.95 $200 53% http://www.discount-educational-software.net/microsoft.html (1)Office 2007 Standard includes: Word, Excel, PowerPoint, Outlook. 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However, if you do not wish to receive any more newsletters from CPE, please use the following link: http://www.discount-educational-software.net/rem.asp?a=remv&e=specmat at snf.stanford.edu Or call 800-679-7007 for additional options. __________________________ Sincerely, Computer Products for Education 5325 140th Avenue North Clearwater, Florida 33760 Tel: 800-679-7007 Fax: 800-679-6996 news at discount-educational-software.net ___________________ THANK YOU!!! From mtang at stanford.edu Fri Apr 25 13:25:12 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 25 Apr 2008 13:25:12 -0700 Subject: Thermally Conductive Adhesive Transfer Tapes Message-ID: <48123E28.80304@stanford.edu> Hi all -- Il Woong got this information from UCSB, where he does gold-contaminated etching in the STS. This is what they recommend for bonding wafers. It is thermally conductive, yet electrically insulating. It also appears to have a "ceramic filler" for thermal conductivity which appears to be boron nitride. There's an antioxidant in this formulation as well, which appears from the MSDS CAS number to be Octadecyl 3-(3,5-Di-tert-butyl-4-Hydroxyphenyl)Propionate -- basically, just a long chain organic no worse than the acrylate adhesive. The 3M website is here: http://solutions.3m.com/wps/portal/3M/en_WW/electronics/home/productsandservices/products/ProductNavigator/TapeAdhesives/?PC_7_RJH9U5230GE3E02LECIE20KHO6_nid=FDPLP2X4B3beG7W0C8BLTFgl What are the prospects for use in STSetch? Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- A non-text attachment was scrubbed... Name: 3MThermallyConductiveTapeMSDS.pdf Type: application/pdf Size: 29711 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 3MThermallyConductiveTapeAppNote.pdf Type: application/pdf Size: 51089 bytes Desc: not available URL: From mtang at stanford.edu Fri Apr 25 13:27:34 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 25 Apr 2008 13:27:34 -0700 Subject: Thermally Conductive Adhesive Transfer Tapes In-Reply-To: <48123E28.80304@stanford.edu> References: <48123E28.80304@stanford.edu> Message-ID: <48123EB6.6060208@stanford.edu> Oh, and here's the technical datasheet. M Mary Tang wrote: > Hi all -- > > Il Woong got this information from UCSB, where he does > gold-contaminated etching in the STS. This is what they recommend for > bonding wafers. It is thermally conductive, yet electrically > insulating. It also appears to have a "ceramic filler" for thermal > conductivity which appears to be boron nitride. There's an > antioxidant in this formulation as well, which appears from the MSDS > CAS number to be Octadecyl > 3-(3,5-Di-tert-butyl-4-Hydroxyphenyl)Propionate -- basically, just a > long chain organic no worse than the acrylate adhesive. > > The 3M website is here: > > http://solutions.3m.com/wps/portal/3M/en_WW/electronics/home/productsandservices/products/ProductNavigator/TapeAdhesives/?PC_7_RJH9U5230GE3E02LECIE20KHO6_nid=FDPLP2X4B3beG7W0C8BLTFgl > > > What are the prospects for use in STSetch? > > Mary > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- A non-text attachment was scrubbed... Name: 3MThermallyConductiveTapeDataSheet.pdf Type: application/pdf Size: 46052 bytes Desc: not available URL: From bwchui at yahoo.com Sun Apr 27 22:22:37 2008 From: bwchui at yahoo.com (Benjamin Chui) Date: Sun, 27 Apr 2008 22:22:37 -0700 (PDT) Subject: PVDF specmat question Message-ID: <831367.71608.qm@web36504.mail.mud.yahoo.com> Hi all, I'd like to know if a certain kind of co-polymer (PVDF-TrFe) is allowed in the SNF clean room. Also, is MEK (methyl ethyl ketone) allowed these days? I missed last Monday's specmat forum cause I was out of town; do you have another scheduled? Thanks, Ben From Salowitz at Stanford.edu Mon Apr 28 10:08:16 2008 From: Salowitz at Stanford.edu (Nathan Salowitz) Date: Mon, 28 Apr 2008 10:08:16 -0700 Subject: Spin Coating PZT films Message-ID: <6.2.5.6.2.20080428095115.03ae4610@Stanford.edu> Hello I submitted a Specmat request on 4/17 regarding Spin Coating and curing of PZT films. I have discussed some of my process with James and clarified the specifics of the sol-gel deposition of PZT/2-methoxyethanol which I intend to do. Please give me an update on the status of my request. I would like to do the deposition Thursday or Friday this week, for which I would need to use Headway2 and rtagaas. I need to know at least 2 days ahead of time to prepare other aspects of my research. Thankyou, Nathan Salowitz From edmyers at stanford.edu Mon Apr 28 14:15:48 2008 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 28 Apr 2008 14:15:48 -0700 Subject: Spin Coating PZT films In-Reply-To: <6.2.5.6.2.20080428095115.03ae4610@Stanford.edu> References: <6.2.5.6.2.20080428095115.03ae4610@Stanford.edu> Message-ID: <6.2.5.6.2.20080428141308.02d30d10@stanford.edu> Nathan, I thought it was me you talked to. As long as you comply to our discussion, it should be OK to process. Remember, lead oxides are volatile and hazardous. Any heating of the sample must be in an exhausted enclosure. Ed At 10:08 AM 4/28/2008, you wrote: >Hello > I submitted a Specmat request on 4/17 regarding Spin > Coating and curing of PZT films. I have discussed some of my > process with James and clarified the specifics of the sol-gel > deposition of PZT/2-methoxyethanol which I intend to do. Please > give me an update on the status of my request. I would like to do > the deposition Thursday or Friday this week, for which I would need > to use Headway2 and rtagaas. I need to know at least 2 days ahead > of time to prepare other aspects of my research. > > Thankyou, > Nathan Salowitz From chris.detrick at global-fab.com Tue Apr 29 15:00:39 2008 From: chris.detrick at global-fab.com (Christopher Detrick) Date: Tue, 29 Apr 2008 18:00:39 -0400 (EDT) Subject: ASML i-line stepper, LAM Alliance and More for sale Message-ID: <1102078810936.1101401002153.9044.5.12175546@scheduler> Global Fab Surplus Has available the tools below. 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URL: From mtang at stanford.edu Wed Apr 30 13:31:53 2008 From: mtang at stanford.edu (Mary Tang) Date: Wed, 30 Apr 2008 13:31:53 -0700 Subject: GaAs in CPD Message-ID: <4818D739.1020308@stanford.edu> Hi all -- A labmember has requested training on the critical point dryer. This person wants to process GaAs substrates. Uli is wondering if there are any SpecMat concerns with this. Some thoughts: The CPD is officially "gold". There is no high temperature processing or acid in the processing, so free As is not a concern. Uli's concern is what to do if a piece shatters inside the CPD. How do we clean it up? We allow GaAs in litho and if a piece shatters in the headway2, it can be cleaned up. But it is under a ventilated hood, whereas the CPD is not. What do you all think? Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu