new material request: HP Lab's PECVD oxide
jwpchen at stanford.edu
Wed Dec 3 05:25:14 PST 2008
Hi Mary and Specmat,
As I described briefly yesterday morning, I will be depositing HP
Laboratories' PECVD oxide in one of my process steps. It's a
P5000-series PECVD system, able to deposit 20um of oxide rapidly and
I have communicated with HP's Peter Hartwell regarding their
"... it has seen metals typical to the interconnect metallization in a
standard cmos process - aluminum, tantalum, titanium ,tungsten. We
have kept metals out of it that would interfere with active device
performance (specifically, gold). We have fabricated thin film
transistors in the machine including the doped silicon layers and the
I would like it classified as semi-clean, same as our metal-boat LTO.
My wafers before PECVD are SNF-clean.
This is the HP Laboratories on Page Mill Road.
More information about the specmat