FW: Request to use Semiclean RTP

[Ed Myers]

All,

This request poses an interesting question.  By definition of 
Semiclean (<1E12), her samples meet our requirements.  The question 
is how comfortable are we knowingly putting in gold and iron in to the tool.

Any thoughts,
Ed

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>Delivered-To: edmyers at stanford.edu
>Delivered-To: emyers at snf.stanford.edu
>Subject: FW: Request to use Semiclean RTP
>Date: Tue, 8 Jan 2008 17:09:07 -0800
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>Thread-Topic: Request to use Semiclean RTP
>Thread-Index: AcgziykvasHCHahvTTe7gh4Ehl/rQgez8XAA
>From: "Alice Fischer-Colbrie" <AFischer-Colbrie at nanosysinc.com>
>To: <emyers at snf.stanford.edu>
>Cc: "Mary Tang" <mtang at stanford.edu>
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>Hi Ed,
>
>I understand you lead the 'SpecMat' committee and could best address 
>my question to Mary below.  (Unfortunately, she was out of town when 
>I sent in this request late in November.)
>
>We would like to use/test the semi-clean RTP (with N2O capability) 
>with a sample that is not entirely CMOS-grade clean. (See attached data.)
>
>Could you please let us know if this sample might meet spec?  If you 
>know what the contamination spec limit is, that would also be 
>helpful. As appropriate, could you please bring this to be reviewed 
>with the SpecMat Committee?
>
>Finally, could you please let me know as soon as possible, what the 
>timing for a decision might be?
>
>Many thanks,
>
>Alice
>(650) 331-2185
>
>-----Original Message-----
>From: Alice Fischer-Colbrie
>Sent: Friday, November 30, 2007 11:57 AM
>To: 'mtang at stanford.edu'
>Subject: Request to use Semiclean RTP
>
>Hi Mary,
>
>As we discussed, Nanosys is interested in running Si nanowire wafers 
>through an oxidation with nitiridation.  At this time, it looks like 
>the 'contaminated' RTP tool does not have N2O capability but the 
>semi-clean tool does.  Therefore we would like use this tool, at 
>least for testing purposes, if possible.
>
>Attached are TXRF results (Nanosys Proprietatry and Confidential) of 
>our Si nanowires per your request.  Our NWs use Au catalyst that we 
>subsequently etch off.   For the TXRF measurement, the Si nanowires 
>are removed from the substrate and put onto a carrier 
>substrate.  (However, for the process, we do not plan to remove the 
>NWs from the substrate.)
>
>Could you please forward our request as appropriate?
>
>Thanks,
>Alice
>
>
>Alice Fischer-Colbrie, Ph.D.
>Nanosys Inc.
>2625 Hanover St.
>Palo Alto, CA 94304
>(650) 331-2185
>
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