[Fwd: [POSSIBLE VIRUS:###] [Fwd: Fw: msds for etchants (Aditya, jimkruger)]]

Mahnaz Mansourpour mahnaz at stanford.edu
Wed Jul 9 16:25:40 PDT 2008


Here is the process flow that goes with it, for the record. Send by Jim 
K. and Aditya and Kathy was cc'd on it.
mahnaz



Proecess flow:
on new Si wafer

STS Nitride dep

photomask

wet ech 6:1 BOE

solvent strip resist (optional-reist will strip in Si etch)

Si etch at specified temp. at WBgeneral or WBgaas; use water bath cap for        the EDA etchant

inspect surface roughness

strip Nitride in 6:1 BOE

step measurement at AlphaStep


End



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From: Mahnaz Mansourpour <mahnaz at stanford.edu>
Subject: [POSSIBLE VIRUS:###] [Fwd: Fw: msds for etchants (Aditya, jimkruger)]
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