[Fwd: [POSSIBLE VIRUS:###] [Fwd: Fw: msds for etchants (Aditya, jimkruger)]]

Mahnaz Mansourpour mahnaz at stanford.edu
Wed Jul 9 16:25:40 PDT 2008

Here is the process flow that goes with it, for the record. Send by Jim 
K. and Aditya and Kathy was cc'd on it.

Proecess flow:
on new Si wafer

STS Nitride dep


wet ech 6:1 BOE

solvent strip resist (optional-reist will strip in Si etch)

Si etch at specified temp. at WBgeneral or WBgaas; use water bath cap for        the EDA etchant

inspect surface roughness

strip Nitride in 6:1 BOE

step measurement at AlphaStep


-------------- next part --------------
An embedded message was scrubbed...
From: Mahnaz Mansourpour <mahnaz at stanford.edu>
Subject: [POSSIBLE VIRUS:###] [Fwd: Fw: msds for etchants (Aditya, jimkruger)]
Date: Wed, 09 Jul 2008 14:55:05 -0700
Size: 251283
URL: <http://snf.stanford.edu/pipermail/specmat/attachments/20080709/8e2d733b/attachment.eml>

More information about the specmat mailing list