Request Use of Transcene SCE-200 NaOH based Si etchant

jim kruger jimkruger at yahoo.com
Fri Jul 25 09:50:35 PDT 2008


Process flow:
on new Si wafer

STS Nitride dep

photomask

wet ech 6:1 BOE

solvent strip resist (optional-reist will strip in Si etch)

Transcene SCE-200 Si etch (NaOH based) at specified temp. at WBgeneral or Wbgaas.

Inspect surface roughness

Strip Nitride in 6:1 BOE

Step measurement at AlphaStep, NanoSpec

End




Transene Si etchant,  SCE-200, NaOH based 

We will test it at WBgeneral or Wbgaas, comparing to plain KOH and to TMAH.  

Probably only a few tests.

The bottle is one liter.
MSDS attached.

jim



      
-------------- next part --------------
A non-text attachment was scrubbed...
Name: SCE-200.doc
Type: application/msword
Size: 34816 bytes
Desc: not available
URL: <http://snf.stanford.edu/pipermail/specmat/attachments/20080725/7bbb618c/attachment.doc>


More information about the specmat mailing list