Request Use of Transcene SCE-200 NaOH based Si etchant
jimkruger at yahoo.com
Fri Jul 25 09:50:35 PDT 2008
on new Si wafer
STS Nitride dep
wet ech 6:1 BOE
solvent strip resist (optional-reist will strip in Si etch)
Transcene SCE-200 Si etch (NaOH based) at specified temp. at WBgeneral or Wbgaas.
Inspect surface roughness
Strip Nitride in 6:1 BOE
Step measurement at AlphaStep, NanoSpec
Transene Si etchant, SCE-200, NaOH based
We will test it at WBgeneral or Wbgaas, comparing to plain KOH and to TMAH.
Probably only a few tests.
The bottle is one liter.
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