Headway spinner

Dan Daranciang daranciang at stanford.edu
Thu Jun 5 13:01:07 PDT 2008


Hi,

Would it be okay to run BaTiO3 nanoparticles in ethanol on the Headway  
spinner? the substrate is just Si.

Thanks.

--
Dan Daranciang
Lindenberg Group, Materials Science and Engineering, Stanford University

2575 Sand Hill Rd. MS 69
Menlo Park, CA 94025
650-926-2064 (office)
650-926-1725 (lab)
650-926-1720 (fax)

On Jun 5, 2008, at 12:46 PM, James Conway <jwc at snf.stanford.edu> wrote:

> If you have approval from SPEC MAT committee for your material you  
> can run this material on headway.
>
> Here is the current announcement:
>
> ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on  
> the Headway Coater.
>
> Greetings SNF Lab Users,
>
> I will be conducting my next "Take A Spin with Me" training class  
> Tuesday June 10th and 24th , 2008 from 10:15 AM  - 12:30 PM. There  
> is a sign up sheet posted on the white board in my office if you  
> desire to sign up in advance.
>
> This is a great opportunity for you to get acquainted with the  
> specific points to employ when working with our Ebeam or Optical  
> Resist materials in order to obtain high quality thin film coatings  
> over your wafers for Electron Beam, Scanning Probe (SPL), and  
> Optical Lithography. In these applications accurate control of  
> polymer thickness is important in order to obtain consistent high  
> quality lithography results.
>
> We will be conducting this training on the Headway Spin Coater.   
> Users attending this session will gain their qualification on this  
> tool and also learn to perform thin film measurements on the  
> Nanospec TFA measurement tool.
> This is a Hands-On Lab Session, please have your substrates clean  
> and ready to coat on the Headway Coater.
>
> Class Schedule:
>
> 10:15 - 11:00 I will start with substrate cleans on WET BENCH  
> NONMETAL performing Pirhana substrate cleans and HF etching of the  
> intrinsic native oxide on Silicon wafers.  All users must have their  
> substrates cleaned and ready to go for spinning by the session time;  
> either coming out of the 150 degree Singe oven, or if you are  
> working on oxides or nitrides, coming out of the YES HMDS Prime oven  
> directly.
>
> 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system  
> you desire for your work.
>
> 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film  
> Analyzer
>
> All interested parties are welcome to attend this session.
> Thank you for your interest in Ebeam and Optical Lithography at  
> Stanford Nanofabrication Facility,
>
> James W. Conway
> Ebeam Technology Group
> Stanford Nanofabrication Facility
> 650-725-7075  office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31
>
>
> Dan Daranciang wrote:
>> Hi James,
>>
>> I'm a student of Aaron Lindenberg's in MSE. I'm interested in using  
>> the Headway spinner to spincoat a thin film.
>>
>> My material is BaTiO3 nanoparticles, and my substrate is Si. I will  
>> most likely be dissolving the BaTiO3 in ethanol.
>>
>> Would I be able to run this on the Headway spinner? Thanks.
>>
>> -- 
>> Dan Daranciang
>> Lindenberg Group, Materials Science and Engineering, Stanford  
>> University
>>
>> 2575 Sand Hill Rd. MS 69
>> Menlo Park, CA 94025
>> 650-926-2064 (office)
>> 650-926-1725 (lab)
>> 650-926-1720 (fax)
>>
>
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