mtang at stanford.edu
Thu Jun 5 13:02:35 PDT 2008
Hi Dan --
As James indicates, a SpecMat request is required for new materials such
as this. That said, we do not allow nanoparticles in solution at the
headway station because of the possibility of cross-contamination
(solutions will aerosolize.) We do have a rather crude, but functional
spin coater outside the lab where this kind of processing can be done,
if this works for you. Let us know your specific requirements.
James Conway wrote:
> If you have approval from SPEC MAT committee for your material you can
> run this material on headway.
> Here is the current announcement:
> *ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on
> the Headway Coater.
> Greetings SNF Lab Users,
> I will be conducting my next *"Take A Spin with Me" *training class
> Tuesday June 10th and 24th , 2008 from 10:15 AM - 12:30 PM. There is
> a sign up sheet posted on the white board in my office if you desire
> to sign up in advance.
> This is a great opportunity for you to get acquainted with the
> specific points to employ when working with our Ebeam or Optical
> Resist materials in order to obtain high quality thin film coatings
> over your wafers for Electron Beam, Scanning Probe (SPL), and Optical
> Lithography. In these applications accurate control of polymer
> thickness is important in order to obtain consistent high quality
> lithography results.
> We will be conducting this training on the Headway Spin Coater. Users
> attending this session will gain their qualification on this tool and
> also learn to perform thin film measurements on the Nanospec TFA
> measurement tool.
> This is a Hands-On Lab Session, please have your substrates clean and
> ready to coat on the Headway Coater.
> Class Schedule:
> 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL
> performing Pirhana substrate cleans and HF etching of the intrinsic
> native oxide on Silicon wafers. All users must have their substrates
> cleaned and ready to go for spinning by the session time; either
> coming out of the 150 degree Singe oven, or if you are working on
> oxides or nitrides, coming out of the YES HMDS Prime oven directly.
> 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system
> you desire for your work.
> 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer
> All interested parties are welcome to attend this session.
> Thank you for your interest in Ebeam and Optical Lithography at
> Stanford Nanofabrication Facility,
> James W. Conway
> Ebeam Technology Group
> Stanford Nanofabrication Facility
> 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31
> Dan Daranciang wrote:
>> Hi James,
>> I'm a student of Aaron Lindenberg's in MSE. I'm interested in using
>> the Headway spinner to spincoat a thin film.
>> My material is BaTiO3 nanoparticles, and my substrate is Si. I will
>> most likely be dissolving the BaTiO3 in ethanol.
>> Would I be able to run this on the Headway spinner? Thanks.
>> Dan Daranciang
>> Lindenberg Group, Materials Science and Engineering, Stanford University
>> 2575 Sand Hill Rd. MS 69
>> Menlo Park, CA 94025
>> 650-926-2064 (office)
>> 650-926-1725 (lab)
>> 650-926-1720 (fax)
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
mtang at stanford.edu
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