[Fwd: Yes oven after APTES]

[Mahnaz Mansourpour]

-------- Original Message --------
Subject: Yes oven after APTES
Date: Mon, 05 May 2008 12:43:25 -0700
From: Johan Andreasson <johan at andreasson.com>
To: Mahnaz Mansourpour <mahnaz at stanford.edu>



Hi Mahnaz,
For my project I will add a layer of APTES 
(3-AminoPropylTriEthoxySilane) to my quartz wafer before adding the 
photoresist. Should I still use the YES oven before using the svgcoat 
(is this even allowed?), or should I use another approach? The protocol 
calls for 20 min bake at 115 degrees after dipping the wafer into the 
APTES solution and I was planning on doing this step in my lab. Do I 
need to use HDMS after that or should I use the normal program, as it is 
defined in the recipe?
Best regards
Johan

-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/specmat/attachments/20080505/bec1b20d/attachment.html>