[Fwd: Parylene]

Mahnaz Mansourpour mahnaz at stanford.edu
Fri May 9 14:29:05 PDT 2008


 Hello all,

He can not go to the yes oven any way. He will  use the track coater 
prime station.
Please get back to him regarding the  etching. He will do the litho this 
week.
mahnaz
Mary Tang wrote:

> Hi all --
>
> My two cents'...  Since the parylene is already polymerized/deposited, 
> it's pretty inert.  It is a cyclic, fairly inert polymer, maybe kind 
> of like cyclotene/BCB, so I think the etching chemistry might be 
> similar -- so fluorine-based chemistry with oxygen, I suspect, would 
> be a good place to start.  This places the etching in drytek4 or 
> pquest.  It would be helpful to know what his etch needs are (how 
> deep, what for, what resist/mask, what size structures.)  That would 
> help determine whether the drytek4 or pquest can meet his process needs.
>
> Who will be getting back to him?
>
> Mary
>
> Mahnaz Mansourpour wrote:
>
>>
>> Hello all,
>>
>> I already have talked to him , I need to look at the msds and decide 
>> on the yes oven part of it, the rest of litho is ok.  What do every 
>> one think of the etching part of it?
>> mahnaz
>> -------- Original Message --------
>> Subject:     Parylene
>> Date:     Thu, 8 May 2008 16:01:26 -0700
>> From:     "Vikram Mukundan" <mvikram at stanford.edu>
>> Organization:     Stanford University
>> To:     "Mahnaz Mansourpour" <mahnaz at snf.stanford.edu>
>>
>>
>>
>> Hi Mahnaz,
>>  
>> I had talked to you this afternoon about allowing parylene coated 
>> wafers in the litho and possibly in the plasma. I have attached some 
>> files related to this for your reference.
>>  
>> 1. My process run with highlighted steps after parylene-N deposition.
>> 2. MSDS for parylene-N.
>> 3. A paper on the thermal stability of parylene-N (they are stable up 
>> to 350 C)
>> 4. A paper on plasma etching techniques on parylene coatings using O2 
>> plasma, RIE and Bosch process. This paper involves lithography with 
>> HMDS prime, spin resist, baking and developing. In a private 
>> communication, the author of this paper has mentioned that parylene 
>> is inert in most processes.
>>  
>> My minimum requirement would be to be able to perform litho steps on 
>> coated wafers. If things work out well I would like to see if I can 
>> use one of the plasma etchers. My process is gold contaminated at 
>> this stage.
>>  
>> Please let me know if you need any more information.
>>  
>> thank you for the help,
>> Vikram
>
>
>





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