CVD of nitride layer onto organosilicate glass

Ed Myers edmyers at stanford.edu
Wed May 28 13:30:04 PDT 2008


Andrew,

By chance are you following Bree Sharrat's work?  If so, she was not 
approved for our LPCVD systems managed by Maurice, but allowed to run 
her samples in the STS PECVD system for nitride deposition.

Regards,
Ed


At 01:15 PM 5/28/2008, Andrew Thiel wrote:
>Hello,
>
>I'm a graduate student in materials science interested in using CVD at
>SNF.  I have a silicon wafer topped with a thin film of an
>organosilicate glass, and I'd simply like a silicon nitride film
>deposited onto it.  My research group (Dauskardt in MSE) has actually
>done this exact deposition at SNF several times over the past couple
>years without any issues, but the current manager of CVD at SNF
>(Maurice Stevens) is reluctant to allow an organosilicate glass into
>any chamber without the permission of SpecMat.
>
>The specific organosilicate glass I would be introducing into the CVD
>chamber is DiEthoxyMethylSilane (DEMS).  My research group has
>conducted thermal studies and found this material to stable up to
>temperatures of at least 400 C.
>
>Please let me know of any other additional information you may need.
>
>Thanks,
>Andrew





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