From news at discount-educational-software.net Mon Nov 3 02:08:56 2008 From: news at discount-educational-software.net (Academic Software News) Date: Mon, 3 Nov 2008 02:08:56 -0800 Subject: Academic Software News - November 2008 Message-ID: <563a961885f7565fdd86a859eda1a2@mail> Adobe's new CS4 Creative Suite has just been released! Exciting new features and capabilities run throughout the entire CS4 productline. Check out the CS4 pricing below. Computer Products for Education is pleased to provide Educational Software News to current students, faculty, staff, and schools with news, pricing, and availability of Academic Edition Software from Microsoft, Adobe, Autodesk, Corel, Quark, EndNote, FileMaker, and many other major software manufacturers. Please visit our website for more information: http://www.discount-educational-software.us or call 800-679-7007. Educational software is exclusively available to Qualified Students, Faculty, Staff and Schools of K-12 and Higher Education institutions. (see below for details) ------ Education Prices for November 2008 -------- ---------------------- Education Standard You ADOBE Price Retail Save! ---------------------- --------- ------ ----- Acrobat 9.0 Pro Extended $222.95 $699 68% Acrobat 9.0 Professional $154.95 $499 69% After Effects CS4 $359.95 $999 64% CS4 Design Premium $598.95 $1799 67% CS4 Design Standard $449.95 $1399 68% CS4 Master Collection $998.95 $2499 60% CS4 Production Premium $598.95 $1699 65% CS4 Web Premium $549.95 $1699 68% CS4 Web Standard $398.95 $999 60% Dreamweaver CS4 $199.95 $399 50% Flash Professional CS4 $249.95 $699 64% Illustrator CS4 $199.95 $599 67% InDesign CS4 $199.95 $699 71% Photoshop Elem+Premiere Elem 7.0 $118.95 $180 34% Photoshop Elements 7.0 $68.95 $140 51% Photoshop Extendend CS4 $298.95 $999 70% Premiere Elements 7.0 $69.95 $140 50% Premiere Professional CS4 $349.95 $799 56% Soundbooth CS4 $79.95 $199 60% http://www.discount-educational-software.us/adobe.html (1) CS4 Design Premium includes: InDesign, Photoshop Extended, Illustrator, Flash Pro, Dreamweaver, and Acrobat 9 Pro (2) CS4 Design Standard includes: InDesign, Photoshop, Illustrator, and Acrobat 9 Pro (3) CS4 Master Collection includes: InDesign, Photoshop Extended, Illustrator, Flash Pro, Dreamweaver, Contribute, Fireworks, After Effects Pro, Premiere Pro, Soundbooth, Encore, OnLocation, Ultra, and Acrobat 9 Pro (4) CS4 Production Premium includes: Photoshop Extended, Illustrator, Flash Pro, After Effects Pro, Premiere Pro, Encore, OnLocation, and Ultra (5) CS4 Web Pemium includes: Photoshop Extended, Illustrator, Acrobat 9 Pro, Flash Pro, Dreamweaver, Contribute, and Fireworks (6) CS4 Web Standard includes: Flash Pro, Dreamweaver, Contribute, and Fireworks ---------------------- Education Standard You MICROSOFT Price Retail Save! ---------------------- --------- ------ ----- Expressions Web 2.0 $59.95 $150 60% Office 2007 Home & Student(1) $148.95 $399 63% Office 2007 Professional(3) $189.95 $499 62% Office 2007 Standard(2) $148.95 $399 63% Office 2007 Ultimate(4) $259.95 $679 62% Office 2008 for Macintosh $148.95 $500 70% Powerpoint 2007 $118.95 $229 48% Project 2007 Professional $198.95 $999 80% Project 2007 Standard $69.95 $349 80% Visio 2007 Professional $159.95 $559 71% Visio 2007 Standard $84.95 $259 67% Visual Studio 2008 Pro $109.95 $899 88% Windows Vista Business Full SP1 $164.95 $290 43% Windows Vista HomePrem Full SP1 $129.95 - - Windows Vista HomePrem Upgrade $74.95 $200 63% Windows Vista Ultimate Full SP1 $219.95 $399 45% ** Promotional price availabe through September 7th, 2008. http://www.discount-educational-software.us/microsoft.html (1)Office 2007 Home & Student includes: Word, Excel, PowerPoint, OneNote. (2)Office 2007 Standard includes: Word, Excel, PowerPoint, Outlook. (3)Office 2007 Professional includes: Word, Excel, PowerPoint, Outlook, Access, Publisher. (4)Office 2007 Ultimate includes: Word, Excel, PowerPoint, Outlook, Access, Publisher, Groove, InfoPath. ---------------------- Education Standard You AUTODESK Price Retail Save! ---------------------- --------- ------ ----- 3ds Max 2009 SuperPak 1-Yr Lic $198.95 $3495 94% 3ds Max Design 2008 1-Yr Lic $98.95 $3495 97% AutoCad 2009 1-Yr License $158.95 $3750 96% AutoCad 2009 Perpetual License $379.95 $3750 90% AutoCad Architecture 2009 1-Yr L $155.95 $4995 97% Inventor Professional 2009 1-Yr $155.95 $159 2% Maya Unlimited Superpack Perp. $388.95 $6630 94% http://www.discount-educational-software.us/autodesk.html These Autodesk prices are for Students, Faculty, & Staff for personal use - pricing for schools for institutional/class-room lab use is different. Please call 800-679-7007 for more information. ---------------------- Education Standard You AVID Price Retail Save! ---------------------- --------- ------ ----- Avid Media Composer $294.95 $2495 88% Avid Xpress Pro 5.7 HD $289.95 $1695 83% Media Composer Studio $994.95 $3495 72% Pinnacle Liquid 7.2 $159.95 $999 84% http://www.discount-educational-software.us/avid.html For more information, visit our website at: http://www.discount-educational-software.us or call 800-679-7007. School purchase orders may be faxed to: 800-679-6996. Educational Software has the exact same features and functionality as Commercial Full-Versions of the software. Visit our website to view thousands of other items and accessories available from CPE at similar discounts. All software products from CPE are authentic original software from the manufacturer. These are not pirated software copies. All software comes in original manufacturer's packaging and contains a valid verifiable license. ------------------------- Volume Licensing: ------------------------- For volume licensing information for schools for quantities of five to ten (5-10) or more units of software, depending on the product(s), please call 800-679-7007 for more information. ---------------------------------------- Qualified Educational Buyers: ---------------------------------------- The following are defined as Qualified Education Buyers. Qualified Educational Buyers must provide the below verification upon making any purchase. 1. Students of Higher Education - All enrolled college, junior college, community college, technical school, vocational school, and university students. 2. K-12 Students - K-12 students are eligible for most, but not all, academic-edition software products. 3. Teachers - All K-12 school and Higher Education institution teachers. 4. K-12 school and Higher Education institution faculty. 5. Staff - All K-12 school and Higher Education institution staff. 6. Schools - All elementary, middle and high schools (K-12 schools); vocational and technical schools; correspondence schools, including Internet correspondence schools, and all colleges, including junior and community colleges, and universities. 7. Home Schools - Home schools are now eligible to purchase most Academic Edition software. Home schools must be approved on a case by case basis. Please call for more details. ------------------------- Verification: ------------------------- Purchasers must provide fax-verification of status as being a current faculty, staff, or student. After placing your order, you simply fax to CPE either: (a) a copy of a current picture School I.D. Card; or, (b) a current paycheck stub with an alternative picture I.D. (drivers license, etc.) Sensitive information may be blacked out; or (c) Schools may purchase by faxing a valid school purchase order. For more details, call us or visit our website. ------------------------- CPE is an Authorized Education Reseller for Microsoft, Adobe, Macromedia, AutoDesk, Corel, Sony, Avid, Pinnacle, Symantec and many other major software manufacturers. CPE is a national software distributor committed to providing the best prices and the best customer service to the Education Community!! Prices generally remain unchanged until the end of the month. However, all prices and availability are subject to change without notice, due to factors outside our control. __________________________ We hope you have found this message valuable. However, if you do not wish to receive any more newsletters from CPE, please use the following link: http://www.discount-educational-software.us/rem.asp?a=remv&e=specmat at snf.stanford.edu Or call 800-679-7007 for additional options. __________________________ Sincerely, Computer Products for Education 5325 140th Avenue North Clearwater, Florida 33760 Tel: 800-679-7007 Fax: 800-679-6996 news at discount-educational-software.us ___________________ THANK YOU!!! From mtang at stanford.edu Tue Nov 4 14:43:06 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 04 Nov 2008 14:43:06 -0800 Subject: Polymethylsiloxane Resin. In-Reply-To: <016401c9357a$688c09a0$4d6318ac@stanford.edu> References: <016401c9357a$688c09a0$4d6318ac@stanford.edu> Message-ID: <4910CFFA.7040506@stanford.edu> Hi all -- I just spoke with Ying Chen about this. Her stack is as follows: Silicon or glass substrate 300 nm of Pt 100 nm of PMGI 15-20 nm of block co-polymer (polystyrene and organosilane) It seems she requested stsetch because a paper she was looking at used an STS (she'll send it to us -- I suspect it was not a Bosch process.) I can't help but think that the pquest might be a better fit for her process. What do you think? Mary Ying Chen wrote: > Dear Sir or Madam, > I would like to submit a request to use polymethylsiloxane resin as > etching mask for use in one of our STS etchers. > *My contact information:* > Name: Ying Chen > Coral login: mihuhou > Phone number: (650) 725-0417 (office), (650) 213-6979 (cell) > Email address: mihuhou at stanford.edu > My PI: Yoshio Nishi > *The chemical or material: * > Common name: Polymethylsiloxane resin > /*The MSDS is attached for the Polymethylsiloxane Resin Solution to be > spin-coated and cured (Outside of SNF) to generate the > polymethylsiloxane resin (a solid), which is the final state of the > material I request to bring in the STS tool.*/ > Reason for request: > I want to make a porous PMGI template with vertical pores of aspect > ratio of >10. The Polymethylsiloxane I am requesting here serves as > the etching mask. > Process Flow: (Note: Requests for PMGI, polystyrene and ITO envolved > in this process will be each filed separately.) > (1) Outside of SNF: The substrate is a platinum, Ti, or indium doped > tin oxide (ITO) coated Si wafer or glass sheet; (2) Outside of SNF: > The PMGI is spin coated and cured onto the substrate; The block > copolymer, containing polymethylsiloxane resin and polystyrene, is > spin coated and cured on top of the PMGI; (3) In SNF: Oxygen plasma > etching is used to etch the polystyrene domains and the PMGI below > these polystyrene domains; > Amount and form: > 20 thick of Polymethylsiloxane thin film. > Storage: > I won't store the PMGI coated samples in SNF. > Disposal: > Non hazardous. > Please Let me know if you need any more information! > Thank you! > Regards, > Ying Chen From mtang at stanford.edu Wed Nov 5 12:51:52 2008 From: mtang at stanford.edu (Mary Tang) Date: Wed, 05 Nov 2008 12:51:52 -0800 Subject: [Fwd: Re: Etch alpha-hydroxy, omega-carboxy terminated polystyrene with STS etchers.] Message-ID: <49120768.209@stanford.edu> Hi all -- Here's Ying's reference, describing use of an STS to transfer the block copolymer template into an organic transfer layer... Mary -------- Original Message -------- Subject: Re: Etch alpha-hydroxy, omega-carboxy terminated polystyrene with STS etchers. Date: Wed, 5 Nov 2008 11:53:40 -0800 From: Ying Chen To: Mary Tang References: <016901c9357a$a216b850$4d6318ac at stanford.edu> <4910D053.8050504 at stanford.edu> <005601c93ede$975d8480$4d6318ac at stanford.edu> <4911BF47.6040507 at stanford.edu> I am sorry! Here it is. Ying ----- Original Message ----- From: "Mary Tang" To: "Ying Chen" Sent: Wednesday, November 05, 2008 7:44 AM Subject: Re: Etch alpha-hydroxy, omega-carboxy terminated polystyrene with STS etchers. > Hi Ying -- > > Did you attach a paper? I did not see one... > > Thanks, > > Mary > > Ying Chen wrote: >> Hi, Mary, >> >> Here is the paper I mentioned. The STS tool was described in the >> experimental session. What is the difference between our tool and theirs? >> >> Thank you for refering me to LiWen! I will ask her about this. >> >> Ying >> >> ----- Original Message ----- From: "Mary Tang" >> To: "Ying Chen" >> Sent: Tuesday, November 04, 2008 2:44 PM >> Subject: Re: Etch alpha-hydroxy, omega-carboxy terminated polystyrene >> with STS etchers. >> >> >>> Hi Ying -- >>> >>> Have you spoken with LiWen Chang (coral ID: lwchang) about her block >>> copolymer etch process? She uses the pquest. >>> >>> Mary >>> >>> Ying Chen wrote: >>>> Dear Sir or Madam, >>>> I would like to submit a request to do oxygen plasma etching of >>>> polystyrene in one of our STS tools. >>>> *My contact information:* >>>> Name: Ying Chen >>>> Coral login: mihuhou >>>> Phone number: (650) 725-0417 (office), (650) 213-6979 (cell) >>>> Email address: mihuhou at stanford.edu >>>> My PI: Yoshio Nishi >>>> *The chemical or material: * >>>> Common name: alpha-hydroxy, omega-carboxy terminated polystyrene >>>> Tradename: N/A >>>> CAS numbers: N/A >>>> MSDS: Please see the attachment. >>>> Storage Group Identifier: G (No special precautions indicated. Store >>>> at room temperature. ) >>>> Main Hazard Class: Health 0; Flammability: 1; Reactivity: 0 >>>> Vendor/manufacturer info: >>>> Manufacturer name: Polymer Source Inc. >>>> Address: 124 Avro Street, Dorval (Montreal), QC, H9P 2X8, Canada >>>> For information, call: 1-866-422-9842, 514-421-5517 >>>> Emergency Number: 1-514-708-4114 >>>> Email: contact at polymersource.com >>>> Reason for request: >>>> I want to make a porous PMGI template with vertical pores of aspect >>>> ratio of >10. The polystyrene I am requesting here serves as the >>>> sacrificial material in the etching mask. >>>> Process Flow: (Note: Requests for organo silicon, PMGI and ITO >>>> envolved in this process will be each filed separately.) >>>> (1) Outside of SNF: The substrate is a platinum, Ti, or indium doped >>>> tin oxide (ITO) coated Si wafer or glass sheet; (2) Outside of SNF: >>>> The PMGI is spin coated and cured onto the substrate; The block >>>> copolymer, containing organo-silicon and polystyrene, is spin coated >>>> and cured on top of the PMGI; (3) In SNF: Oxygen plasma etching is >>>> used to etch the polystyrene domains and the PMGI below these >>>> polystyrene domains; >>>> Amount and form: >>>> Spherical polystyrene domain of 20nm diameter in a ~20nm thick >>>> di-block copolymer layer. >>>> Storage: >>>> I won't store the PMGI coated samples in SNF. >>>> Disposal: >>>> Non hazardous. >>>> Please Let me know if you need any more information! >>>> Thank you! >>>> Regards, >>>> Ying Chen >>> >> > -------------- next part -------------- A non-text attachment was scrubbed... Name: Oun-Ho Advanced Materials.pdf&mode=pdf Type: application/octet-stream Size: 325816 bytes Desc: not available URL: From jcdoll at stanford.edu Wed Nov 5 18:13:55 2008 From: jcdoll at stanford.edu (Joey Doll) Date: Wed, 5 Nov 2008 18:13:55 -0800 Subject: Molybdenum in the SNF Message-ID: <945664f50811051813r2bad4452offb419fa6b81ca63@mail.gmail.com> Hi SpecMat - What's the policy on molybdenum processing in the fab? It's listed on the materials page as a case-by-case basis, however the text refers to manganese. I'm interested in using it as an electrode for my aluminum nitride thin films for two reasons. First, Mo yields the best growth structure and piezoelectric performance of AlN (followed by Pt and Ti) and more importantly, it has good etch selectivity. Etching Mo in fluorine and aluminum nitride in chlorine is a common process. In fact, I was speaking with an engineer from Avago today and they process Mo in their production CMOS fab. Avago produces FBAR resonators in the ballpark of millions per year, and use Mo/AlN/Mo stacks. I'm currently using Ti, but Mo is a better alternative both in terms of performance and processing capability. I'm currently etching the AlN with TMAH with the Ti as a hard mask, which is a workable solution but the performance of AlN can be improved by about a factor of 2 by going to Mo. After depositing and patterning the Mo and AlN, I would need to go into STSEtch1 for my frontside and backside cantilever releases. All metal would be covered with photoresist, and the etch would be stopped on the buried oxide of an SOI. The Mo patterning could be done in drytek2 and the AlN patterning in p5000 potentially. I'm having the AlN (and potentially the Mo) deposited by a vendor in San Jose. Thanks! Joey -------------- next part -------------- An HTML attachment was scrubbed... URL: From junjun at twincreekstechnologies.com Fri Nov 14 17:18:22 2008 From: junjun at twincreekstechnologies.com (junjun wu) Date: Fri, 14 Nov 2008 17:18:22 -0800 Subject: request to use new material at SNF Message-ID: 1. Contact information Junjun Wu; Coral login: junjun; phone: 408-759-1426; Company: Twin Creeks Technologies 2. Material Al:ZnO (2%/98%) sintered disk forms. 1" in diameter and 1/8" in thickness. This is transparent conductive oxide. 3. Vendor info ACI Alloys, phone: 408-259-7337. www.acialloys.com 4. Reason for request Use as metal contact to silicon. Not available at SNF. 5. Process flow AZO deposit on silicon with Metalica -> bond to Pyrex glass with ev bond -> heat treat in RTAGAAS 6. Amount and form 1 piece of target each in disk form that works as target for Metalica. 7. Storage It will be stored in the area assigned to Twin Creeks. It is non reactive material. 8. Disposal We will bring them back to Twin Creeks site for disposal if needed. Thanks for taking the time to consider this request. Please let me know your decision as soon as you can since I need to decide to place an order with the vendor or not in the next couple of days. -- Junjun Wu Twin Creeks Technologies Phone: 408-759-1426 Fax: 408-986-9142 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mohamed at twincreekstechnologies.com Thu Nov 20 13:05:33 2008 From: mohamed at twincreekstechnologies.com (Mohamed Hilali) Date: Thu, 20 Nov 2008 13:05:33 -0800 Subject: [Fwd: Process flow for the Boron Spin-on dopant] In-Reply-To: <488A1905.5040601@stanford.edu> References: <488A0E98.5020208@stanford.edu> <488A1905.5040601@stanford.edu> Message-ID: <367f35eb0811201305m2757c16at3b34e5b97e58464d@mail.gmail.com> Hi Mary, I have attached the MSDS of a spin-on glass that I would like to get approved to store and use at SNF. The process sequence is shown below. spin on 700A SOG using Headway hot plate bake 200 C ,2 minutes. RTAgaas for annealing (900 C? 30 sec?). spin-on dopant using Headway RTAgaas for activation (900 C? 30 sec?). WbGaAs 50:1 HF deglaze STS PECVD nitride Litho, wet etch Metal Dep (Innotec) Litho, wet etch Metal Dep backside (Innotec) End Thank you very much. Mohamed Hilali Twin Creeks Technologies, Inc Tel: 408-507-1649 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PS3020 (700A Spin-on Glass).pdf Type: application/pdf Size: 40883 bytes Desc: not available URL: From chris.detrick at global-fab.com Sun Nov 23 16:07:20 2008 From: chris.detrick at global-fab.com (Christopher Detrick) Date: Sun, 23 Nov 2008 19:07:20 -0500 (EST) Subject: Equipment Available for immediate sale Message-ID: <1102338037184.1101401002153.9044.6.13190546@scheduler> G-Fab LOGO [http://rs6.net/tn.jsp?e=001_VoHDMJafodtcMV8Wtx0HxGF94POHR7DJmP9S1r4mdH1585p7Y9Tvs6h8ivTo4UUehcd4n2jSgdjZ60eAG2qSuuDWSM1ebM9LznnxVOVIAQ-yYUiA_6dQw==] ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Global Fab Surplus LLC [http://rs6.net/tn.jsp?e=001_VoHDMJafodtcMV8Wtx0HxGF94POHR7DJmP9S1r4mdH1585p7Y9Tvs6h8ivTo4UUehcd4n2jSgdjZ60eAG2qSuuDWSM1ebM9LznnxVOVIAQ-yYUiA_6dQw==](G-Fab) has several premium tools available for immediate sale. If you have any interest in these please feel free to contact us right away. 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We buy and sell used semiconductor equipment, including backend, front end and special application tools and toolsets. Visit us online at: www.global-fab.com [http://rs6.net/tn.jsp?e=001_VoHDMJafodtcMV8Wtx0HxGF94POHR7DJmP9S1r4mdH1585p7Y9Tvs6h8ivTo4UUehcd4n2jSgdjZ60eAG2qSuuDWSM1ebM9LznnxVOVIAQ-yYUiA_6dQw==] for a complete list of tools available. ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Forward email http://ui.constantcontact.com/sa/fwtf.jsp?m=1101401002153&ea=specmat at snf.stanford.edu&a=1102338037184 This email was sent to specmat at snf.stanford.edu by chris.detrick at global-fab.com. Update Profile/Email Address http://visitor.constantcontact.com/d.jsp?v=001RO3dPrXHwIHjNc18qg2uYpS-p4D8dFWvFxtB-PtxWSx_w3pd_ZWjuW1M0X1b1t5ICYzWqbI7c2Y%3D&p=oo Instant removal with SafeUnsubscribe(TM) http://visitor.constantcontact.com/d.jsp?v=001RO3dPrXHwIHjNc18qg2uYpS-p4D8dFWvFxtB-PtxWSx_w3pd_ZWjuW1M0X1b1t5ICYzWqbI7c2Y%3D&p=un Privacy Policy: http://ui.constantcontact.com/roving/CCPrivacyPolicy.jsp Global Fab Surplus | 195 Kirkstone Lane | Colorado Springs | CO | 80906 -------------- next part -------------- An HTML attachment was scrubbed... URL: From audet at stanford.edu Mon Nov 24 12:57:18 2008 From: audet at stanford.edu (Ross Audet) Date: Mon, 24 Nov 2008 12:57:18 -0800 Subject: FW: new chemical request: WaferBOND spin-on polymer Message-ID: <000901c94e77$3d0f2fd0$b72d8f70$@edu> Dear Mary, I submitted a request to Specmat about a month ago for an adhesive wafer bonding compound, but haven't received a reply yet. Is there anything you can do to help speed the review process? Perhaps you could take a look at the attached document and let me know if there are any concerns on your end about use of the chemical. Thanks, Ross Audet From: Ross Audet [mailto:audet at stanford.edu] Sent: Sunday, October 19, 2008 4:34 PM To: 'specmat at snf.stanford.edu' Subject: new chemical request: Waferbond spin on polymer Dear Specmat committee, Please see the attached document requesting permission to use of Brewer Waferbond in the SNF cleanroom. Contact me with any questions. Regards, Ross Audet -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: audet_waferbond_specmat_request_19oct2008.pdf Type: application/pdf Size: 991123 bytes Desc: not available URL: From mtang at stanford.edu Mon Nov 24 13:34:37 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 24 Nov 2008 13:34:37 -0800 Subject: FW: new chemical request: WaferBOND spin-on polymer In-Reply-To: <000901c94e77$3d0f2fd0$b72d8f70$@edu> References: <000901c94e77$3d0f2fd0$b72d8f70$@edu> Message-ID: <492B1DED.2060007@stanford.edu> Oops. We must have neglected to get back to him. As far as I can tell, this should be fine, other than the part about lampoly (drytek4 would be more appropriate coming out of KOH etching sans decontamination.) OK with you all? M Ross Audet wrote: > > Dear Mary, > > > > I submitted a request to Specmat about a month ago for an adhesive > wafer bonding compound, but haven't received a reply yet. Is there > anything you can do to help speed the review process? > > > > Perhaps you could take a look at the attached document and let me know > if there are any concerns on your end about use of the chemical. > > > > Thanks, > > Ross Audet > > > > *From:* Ross Audet [mailto:audet at stanford.edu] > *Sent:* Sunday, October 19, 2008 4:34 PM > *To:* 'specmat at snf.stanford.edu' > *Subject:* new chemical request: Waferbond spin on polymer > > > > > > Dear Specmat committee, > > > > Please see the attached document requesting permission to use of > Brewer Waferbond in the SNF cleanroom. Contact me with any questions. > > > > Regards, > > Ross Audet > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From senyod at gmail.com Tue Nov 25 13:33:56 2008 From: senyod at gmail.com (Senyo Dogbe) Date: Tue, 25 Nov 2008 13:33:56 -0800 Subject: Special Materials Message-ID: Dear Sir/Madam, I would like to seek permission to use a non-standard chemical for future work in device processing at SNF. The information below and the attached MSDS provide more information about the Chemical. Chemical Name - Techni-Gold 434 HS (for electroplating). MSDS - Attached. Equipment - GaAs wet bench. Procedure - Beaker (labuser to provide own beaker) with leads attached to DC regulated power supply. Beaker to be placed on hot plate at 50C. Plating Chemical will be lightly stirred with a stir bar. Power Supply -BK Precision DC regulated power supply. Model #1670A. Max current for electroplating will be at 5mA ( a couple of volts from DC power source required for this process). Waste Disposal - Lab user intends to use waste collection bottle to catch the rinse water so that waste water does not go into AWN system. The used 434 chemical will be stored in a labelled waste bottle. Thanks Senyo -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: MSDS 434 Ready To Use - X1013501_1.pdf Type: application/pdf Size: 56078 bytes Desc: not available URL: From mtang at stanford.edu Tue Nov 25 14:43:50 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 25 Nov 2008 14:43:50 -0800 Subject: [Fwd: Re: RTA4100 request] Message-ID: <492C7FA6.3030407@stanford.edu> Hi all -- Here's a SpecMat request from Kyeongran. She is working on a Dec. deadline and would like to be able to use RTA4100 instead of RTA4108 which she normally uses (the 4100 looks like it will come up soon, whereas the 4108 will take considerably more time.) She'd like to process in clean tools thereafter (the clean tools being amtetcher, lampoly, wet benches, and tylanbpsg.) What do you all think? Mary -------- Original Message -------- Subject: Re: RTA4100 request Date: Tue, 25 Nov 2008 14:38:04 -0800 (PST) From: Kyeongran Yoo To: Mary Tang Hello Mary, Here is the flow: W= whole wafer, C=chip RTA (W)->PR coating(W)->1st layer pattern ASML(W)->Amteher/lampoly(W)->gasonics(W)->wetnonmetal(W)->wetdiff(W)->tylanbpsg(W)->e-beam resist(W)-> pieces->2nd layer pattern raith(C)->amtetcher/lampoly(C) thanks, Kyeongran ----- Original Message ----- From: "Mary Tang" To: raneeyoo at snf.stanford.edu Sent: Tuesday, November 25, 2008 11:08:33 AM GMT -08:00 US/Canada Pacific Subject: RTA4100 request Hi Kyeongran -- Now, I'm confused. Sorry, I was going to write up and document your request for the SpecMat group and I'm confused. Could you please clarify your process flow for me again from RTA? I think it would be helpful to know exactly which clean tools and which cleans your wafers will be undergoing from the RTA on. Where does the lampoly fit in? And the amtetcher? From what I see, it looks like the lampoly follows tylanbpsg? (Which doesn't make sense to me.) By the way, do you have whole wafers or pieces? Thanks, Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Tue Nov 25 15:08:27 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 25 Nov 2008 15:08:27 -0800 Subject: Special Materials In-Reply-To: References: Message-ID: <492C856B.10700@stanford.edu> Hi Senyo -- Thanks for the request. I'm afraid, though, that you would have to justify using cyanide-based solution in our lab. Although this has been used in the distant past, it was used at a wet bench that was dedicated for gold electroplating. We no longer have this set up -- and manual handling of these kinds of chemicals poses greater risks. So, if this were to be allowed, we'd have to have very strict procedures and rules about use of this class of chemicals. The reason is that these cyanide based solutions are highly toxic. Cyanide can be easily absorbed through the skin upon contact. Free cyanide vapors are extremely toxic and can be easily generated when the solution comes in contact with oxidizing acids, as might occur when using at one of the shared stations. In fact, when medical professionals respond to cyanide poisonings, they will not work on a victim until all clothing and anything the person has come into contact is removed. And my concern is personal -- similar cyanide solutions are often used in synthetic chemistry -- just down the hall from the lab where I did my graduate work, a post-doc doing synthetic chemistry died from cyanide poisoning. I understand that cyanide based solutions are preferred for some applications, especially electronics, but that much safer solutions, such as sulfide based ones are also available. I'd recommend doing some investigation into other electroplating solutions to determine which would meet your needs. If your requirements are more stringent, then I'd suggest sending your devices out for gold electroplating -- there are several local services which specialize in electronics applications. Finally, I'm copying Mike Wiemer on this -- Mike is also interested in a non-cyanide-based gold electroplating solution for quick turnaround processing. Maybe you two could share notes and work with Uli and Jim H (who are responsible for the wbgaas station) on establishing a procedure for the lab. Thanks, Mary Senyo Dogbe wrote: > Dear Sir/Madam, > I would like to seek permission to use a non-standard chemical for > future work in device processing at SNF. > The information below and the attached MSDS provide more information > about the Chemical. > > Chemical Name - Techni-Gold 434 HS (for electroplating). > > MSDS - Attached. > > Equipment - GaAs wet bench. > > Procedure - Beaker (labuser to provide own beaker) with leads attached > to DC regulated power supply. Beaker to be placed on hot plate at 50C. > Plating Chemical will be lightly stirred with a stir bar. > > Power Supply -BK Precision DC regulated power supply. Model #1670A. > Max current for electroplating will be at 5mA ( a couple of volts > from DC power source required for this process). > > Waste Disposal - Lab user intends to use waste collection bottle to > catch the rinse water so that waste water does not go into AWN system. > The used 434 chemical will be stored in a labelled waste bottle. > > Thanks > > Senyo > > > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Tue Nov 25 16:00:36 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 25 Nov 2008 16:00:36 -0800 Subject: [Fwd: Re: [Fwd: Process flow for the Boron Spin-on dopant]] Message-ID: <492C91A4.3030804@stanford.edu> Hi all -- Any problems with this? It looks pretty conventional to me. Any objections to approving it? Mary -------- Original Message -------- Subject: Re: [Fwd: Process flow for the Boron Spin-on dopant] Date: Thu, 20 Nov 2008 13:05:33 -0800 From: Mohamed Hilali To: Mary Tang CC: jim kruger , Aditya Agarwal , Kathy Jackson , specmat at snf.stanford.edu References: <488A0E98.5020208 at stanford.edu> <488A1905.5040601 at stanford.edu> Hi Mary, I have attached the MSDS of a spin-on glass that I would like to get approved to store and use at SNF. The process sequence is shown below. spin on 700A SOG using Headway hot plate bake 200 C ,2 minutes. RTAgaas for annealing (900 C? 30 sec?). spin-on dopant using Headway RTAgaas for activation (900 C? 30 sec?). WbGaAs 50:1 HF deglaze STS PECVD nitride Litho, wet etch Metal Dep (Innotec) Litho, wet etch Metal Dep backside (Innotec) End Thank you very much. Mohamed Hilali Twin Creeks Technologies, Inc Tel: 408-507-1649 -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- A non-text attachment was scrubbed... Name: PS3020 (700A Spin-on Glass).pdf Type: application/pdf Size: 40883 bytes Desc: not available URL: From info at fabsurplus.com Tue Nov 25 17:05:28 2008 From: info at fabsurplus.com (SDI-Fabsurplus) Date: Wed, 26 Nov 2008 01:05:28 +0000 (GMT) Subject: Special Featured Fabsurplus.com Assembly and Test Equipment Clearance Message-ID: <22810902.1227661640304.JavaMail.root@server1.fabsurplus.com> Special Featured Fabsurplus.com Assembly and Test Equipment Clearance +++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++ Exclusively and on behalf of our European based clients, SDI-Fabsurplus Group is pleased to announce the following late model assembly and test equipment facility sale, including -More than 600 line items -K and S Maxum bonders, -Advantest test systems, -Disco dicing saws and other state of the art assembly and test equipment . This is the liquidation of a complete facility. All equipment must go. A COMPLETE LIST OF EQUIPMENT APPEARS IN THE ATTACHED EXCEL FILE, AND ON THE WEB AT http://www.fabsurplus.com/sdi_catalog/salesItemList.do?listTypeId=46 You may also browse each line item in the attached excel file for further details. All equipment is undergoing de-installation, and will be warehoused. Inspections are welcome by appointment. Equipment ages from 1995 to May 2008. Sincerely, Stephen Howe (Owner) HOT ITEMS FROM THE SALE INCLUDE: ******************************** 22003 Advantek ATR 1000 Tape and Reel http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22003 22096 Advantest T5375 Test system http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22096 22097 Advantest T5581HD Test system http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22097 22101 Advantest T5585 Test system http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22101 22107 Advantest T5593 Test system http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22107 22146 Agilent 5DX X-Ray system http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22146 22182 ASM BOC LINE consisting of:- ASM BOC LINE - BP200+REFLOW OV+CLEAN MDL ASM BOC LINE - CELL CONTROLLER ASM BOC LINE - IDEAL LAB ASM BOC LINE - IDEALMOLD 80T ASM BOC LINE - IDEALSCAN MODULE ASM BOC LINE - N.1 OFF-LOAD BUFFER FDFBGA ASM BOC LINE - N.2 OFF-LOAD BUFFER ASM BOC LINE - N.2 ON-LOAD BUFFER ASM BOC LINE - PLASMA HANDLER+MOLD LINK ASM BOC LINE - POST MOLD CURE ASM BOC LINE - PR KIT + CHASES FOR FD-FBGA ASM BOC LINE - TWIN INPUT BUFFER http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22182 22263 Disco DFD 6360 Half cutting dicing saw http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22263 ONLY SOLD AS PART OF A COMPLETE DICING BEFORE GRINDING LINE TOGETHER WITH THE FOLLOWING ITEMS:- 22270 DISCO FULLY AUTOMATIC GRINDER DFG860 22386 LINTEC TAPE MOUNT + PEEL LTD2500 22387 LINTEC AUTO LAMINATOR RAD3500 22364 Jeol JSM 5600 LV Inspection Sem with EDX http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22364 22365 K AND S Maxum Plus Bonders Qty 8 available http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22365 22373 K AND S Maxum Ultra Bonders Qty 6 available http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22373 22478 Shibuya Solder Ball Mounter http://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=22478 Interested to become a fabsurplus.com representative ? E-mail us your CV today at info at fabsurplus.com SELL YOUR SURPLUS EQUIPMENT If you have under-used equipment and you would like SDI/Fabsurplus to assist you in selling it please send the following list of requirements and SDI/Fabsurplus will sell your items at no charge to you: Manufacture: Model: Vintage: Condition: Configuration: Warranty (If any): Location: Pictures: Lowest acceptable price: Thank you, Stephen Howe CEO, SDI-Fabsurplus Group c/o SDI Semiconductor Instruments Srl Via Rocco Galdieri, 6 Napoli 80123 Italy Office: (Naples) Italy (39) 081 575 0506 Mobile: Italy (39) 335 710 7756 Fax: Italy (39) 066 051 3344 showe at fabsurplus.com Skype: Stephencshowe http://www.fabsurplus.com Ollie Dunne Managing Director SDI Semiconductor Instruments Ireland Ltd. Trim, Co. Meath, Ireland Phone: (353) 4694 37097 Mobile: (353) 872 985 561 Fax: (353) 4694 37113 ollie.dunne at fabsurplus.com Important Notice: This message is intended for the attention of the person or organization to which it has been addressed. It may contain information that is confidential, proprietary and/or exempt from disclosure by law. If you have received this message in error please be aware that the sender does not waive any confidentiality, ownership rights or privilege applicable to it. You are therefore strictly prohibited to disseminate, distribute or copy this message in any way. This message may be considered an advertisement or solicitation under U.S.law. If you would like to opt-out of receiving future commercial e-mail marketing messages from the sender, please send a message to the following e-mail address with the word "REMOVE" in the subject line to: info at fabsurplus.com -------------- next part -------------- A non-text attachment was scrubbed... Name: Fabsurplus_Assembly_Test_Clearance_Sale_Nov_08.xls Type: application/octet-stream Size: 617472 bytes Desc: not available URL: From mwiemer at sj-solar.com Wed Nov 26 17:40:55 2008 From: mwiemer at sj-solar.com (Mike Wiemer) Date: Wed, 26 Nov 2008 17:40:55 -0800 Subject: Special Materials References: <492C856B.10700@stanford.edu> Message-ID: Hi Mary & Specmat, Senyo and I are working together on this. 1.) How about if we switch the chemical to the non-cyanide based one? Everything else would be the same (see Senyo's specmat request below). I have attached the new MSDS for the non-cyanide chemical. 2.) Where would we store the chemical? I would be a 1 gal jug.... Best, -Mike -----Original Message----- From: Mary Tang [mailto:mtang at stanford.edu] Sent: Tuesday, November 25, 2008 3:08 PM To: Senyo Dogbe Cc: specmat at snf.stanford.edu; uli at snf.stanford.edu; mwiemer at snf.stanford.edu Subject: Re: Special Materials Hi Senyo -- Thanks for the request. I'm afraid, though, that you would have to justify using cyanide-based solution in our lab. Although this has been used in the distant past, it was used at a wet bench that was dedicated for gold electroplating. We no longer have this set up -- and manual handling of these kinds of chemicals poses greater risks. So, if this were to be allowed, we'd have to have very strict procedures and rules about use of this class of chemicals. The reason is that these cyanide based solutions are highly toxic. Cyanide can be easily absorbed through the skin upon contact. Free cyanide vapors are extremely toxic and can be easily generated when the solution comes in contact with oxidizing acids, as might occur when using at one of the shared stations. In fact, when medical professionals respond to cyanide poisonings, they will not work on a victim until all clothing and anything the person has come into contact is removed. And my concern is personal -- similar cyanide solutions are often used in synthetic chemistry -- just down the hall from the lab where I did my graduate work, a post-doc doing synthetic chemistry died from cyanide poisoning. I understand that cyanide based solutions are preferred for some applications, especially electronics, but that much safer solutions, such as sulfide based ones are also available. I'd recommend doing some investigation into other electroplating solutions to determine which would meet your needs. If your requirements are more stringent, then I'd suggest sending your devices out for gold electroplating -- there are several local services which specialize in electronics applications. Finally, I'm copying Mike Wiemer on this -- Mike is also interested in a non-cyanide-based gold electroplating solution for quick turnaround processing. Maybe you two could share notes and work with Uli and Jim H (who are responsible for the wbgaas station) on establishing a procedure for the lab. Thanks, Mary Senyo Dogbe wrote: > Dear Sir/Madam, > I would like to seek permission to use a non-standard chemical for > future work in device processing at SNF. > The information below and the attached MSDS provide more information > about the Chemical. > > Chemical Name - Techni-Gold 434 HS (for electroplating). > > MSDS - Attached. > > Equipment - GaAs wet bench. > > Procedure - Beaker (labuser to provide own beaker) with leads attached > to DC regulated power supply. Beaker to be placed on hot plate at 50C. > Plating Chemical will be lightly stirred with a stir bar. > > Power Supply -BK Precision DC regulated power supply. Model #1670A. > Max current for electroplating will be at 5mA ( a couple of volts > from DC power source required for this process). > > Waste Disposal - Lab user intends to use waste collection bottle to > catch the rinse water so that waste water does not go into AWN system. > The used 434 chemical will be stored in a labelled waste bottle. > > Thanks > > Senyo > > > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- A non-text attachment was scrubbed... Name: MSDS TG-25ES.PDF Type: application/octet-stream Size: 172561 bytes Desc: MSDS TG-25ES.PDF URL: