[Fwd: Process flow for the Boron Spin-on dopant]
Mohamed Hilali
mohamed at twincreekstechnologies.com
Thu Nov 20 13:05:33 PST 2008
Hi Mary,
I have attached the MSDS of a spin-on glass that I would like to get
approved to store and use at SNF. The process sequence is shown below.
spin on 700A SOG using Headway
hot plate bake 200 C ,2 minutes.
RTAgaas for annealing (900 C? 30 sec?).
spin-on dopant using Headway
RTAgaas for activation (900 C? 30 sec?).
WbGaAs 50:1 HF deglaze
STS PECVD nitride
Litho, wet etch
Metal Dep (Innotec)
Litho, wet etch
Metal Dep backside (Innotec)
End
Thank you very much.
Mohamed Hilali
Twin Creeks Technologies, Inc
Tel: 408-507-1649
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