[Fwd: Process flow for the Boron Spin-on dopant]

Mohamed Hilali mohamed at twincreekstechnologies.com
Thu Nov 20 13:05:33 PST 2008


Hi Mary,

I have attached the MSDS of a spin-on glass that I would like to get
approved to store and use at SNF. The process sequence is shown below.



spin on 700A SOG using Headway

hot plate bake 200 C ,2 minutes.

RTAgaas for annealing  (900 C?  30 sec?).
spin-on dopant using Headway

RTAgaas for activation  (900 C?  30 sec?).

WbGaAs 50:1 HF deglaze

STS PECVD nitride

Litho, wet etch

Metal Dep (Innotec)

Litho, wet etch

Metal Dep backside (Innotec)
End


Thank you very much.

Mohamed Hilali
Twin Creeks Technologies, Inc
Tel: 408-507-1649
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