Request Approval for SIPR - 9684M-3.0
mahnaz at stanford.edu
Tue Oct 7 16:55:24 PDT 2008
This is to let you know this chemical is approved for use at SNF.
One thin though you mentioned about the other resist with different
viscosity, I have two emails from you and the other email is for the
same chemical as above. Do you mind sending it one more time please.
Aleta Jamora wrote:
> Hello Spec Mat,
> I would like to bring in a new positive resist, SIPR 9684M-3.0
> The purpose of this resist is to print single layer lift-off patterns.
> I am planning on bringing the samples in in 8 oz brown bottles (like
> we have in the store room) and storing them
> in the Flammables cabinet that we have (shelf L) along with the other
> photo-resist samples. My intention is to use these resists to coat
> 3 and 4 inch Silicon wafers on the Headway spinner (3-7 um thick)
> and soft
> bake the resist on the hotplates that are adjacent to the Headway.
> I am
> planning on using the Karl Seuss aligners to expose the wafers, and then
> I will develop the patterns at the develop bench in beakers using
> or which ever MIF developer is available at SNF.
> Disposal and clean up of these materials should follow the standard
> procedures for DQN positive photoresists - bagging contaminated
> clean room
> wipes, foil & empty bottles and putting them in the designated
> chemical trash
> bins. The resists themselves can be dispensed in the chemical carboys
> for organics in the solvent hoods for disposal. The used LDD-26W
> developer containing the resist will go down the drain at
> the develop bench.
> I am attaching a PDF file of the MSDS sheet for this resist.
> > >
> > > -Aleta Jamora
> > >
> > > Translucent Inc
> > > 510 378 1602
> > > artyjamo at comcast.net <mailto:artyjamo at comcast.net>
> <mailto:artyjamo at comcast.net>
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