Fwd: SIPR 9684HM-5.0

Mahnaz Mansourpour mahnaz at stanford.edu
Tue Oct 7 17:07:13 PDT 2008

Hello Aleta,

Never mind, I found it.
This is to confirm that you may use the chemical, Please stop by and get 
all the labels and fill out the paper work.
Be aware that we are short of space.

Aleta Jamora wrote:
> Sorry, forgot to attach the MSDS file
> ---------- Forwarded message ----------
> From: *Aleta Jamora* <artyjamo at gmail.com <mailto:artyjamo at gmail.com>>
> Date: Thu, Sep 11, 2008 at 2:07 PM
> Subject: SIPR 9684HM-5.0
> To: specmat stanford <specmat at snf.stanford.edu 
> <mailto:specmat at snf.stanford.edu>>
> Hello Spec Mat,
>     I would like to bring in a new positive resist, SIPR 9684HM-5
> The purpose of this resist is to print single layer lift-off patterns.
>  I am planning on bringing the samples in  in 8 oz brown bottles (like
>  we have in the store room)  and storing them
>  in the Flammables cabinet that we have (shelf L)   along with the other
>  photo-resist samples.   My intention is to use these resists to coat
> 3 and 4 inch Silicon wafers on the Headway spinner   (7-12 um thick) 
> and soft
>  bake the resist on the hotplates that are adjacent to the Headway.
> I am
>  planning on using the Karl Seuss aligners to expose the wafers,  and then
>  I will develop the patterns at the develop bench in beakers using 
> LDD-26W
> or which ever MIF developer is available at SNF.
>   Disposal and clean up of these materials should follow the standard
>  procedures for DQN positive photoresists  - bagging contaminated 
> clean room
> wipes, foil & empty bottles and putting them in the designated  
> chemical trash
> bins.  The resists themselves can be dispensed in the chemical carboys
> for organics in the solvent hoods for disposal.   The  used LDD-26W
> developer containing the resist will go down the drain at
>  the develop bench.
>  I am attaching a PDF file of the MSDS sheet for this resist.
>  Thanks
> Aleta Jamora
> Translucent Inc
> (510 378 1602)

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