From damodei at Princeton.EDU  Wed Aug 12 00:52:56 2009
From: damodei at Princeton.EDU (Dario Amodei)
Date: Wed, 12 Aug 2009 00:52:56 -0700
Subject: ITO Coated Glass Slides
Message-ID: <4A8274D8.2080608@princeton.edu>

Dear SpecMat committee,

I would like to perform some processing on ITO coated glass slides.  I 
checked the SNF materials guidelines and ITO has previously been used in 
the lab, but I am supposed to check with SpecMat before using it.  The 
details of the material and of my process are attached below.

1. Contact info: Dario Amodei, damodei, 415-505-5563, graduate student 
at Princeton University, PI Michael Berry.
2. Material: 150 nm thin film of ITO on soda lime glass.
3. Vendor: Delta Technologies,  http://www.delta-technologies.com/, 
651-439-5741.  Address: 13960 47th Street North Stillwater, MN 
55082-1234, USA
4. I need to make some transparent multielectrode arrays for retinal 
measurements (the size and density I want is not available 
commercially).  ITO is the standard material for such arrays.
5. Process flow: The ITO-coated glass slides will be bonded to a silicon 
wafer via photoresist (baked 1 hour).  The slides will then be coated in 
photoresist (using svgcoat if possible, otherwise manual) and exposed in 
the karlsuss mask aligner, developed, and then wet etched with HCl (or a 
similar etchant).  The resist (or a mask layer, if this proves 
necessary), will then be stripped in acetone at the lithosolvent hood.  
A passivating layer of silicon nitride will then be deposited in the 
sts.  Another layer of photolithography will take place in the karlsuss, 
then vias will be etched in the nitride layer using SF6, in the drytek4 
(the ITO will not be etched by the SF6).
6. Amount and form: I will be bringing in up to 20 slides of 2 inch x 2 
inch x 180 um ITO-coated glass.
7. Storage: The box of slides will be stored in my cleanroom box.
8. Disposal: Old slides will be disposed of in the sharps box, ITO 
etchants will be disposed of according to the standard procedures for 
disposing of indium.

Please let me know if there is any other information you need.

Thanks,
Dario Amodei



From rissman at stanford.edu  Fri Aug 14 16:45:52 2009
From: rissman at stanford.edu (Paul Rissman)
Date: Fri, 14 Aug 2009 16:45:52 -0700
Subject: Fwd: Impurity levels for "clean" status
Message-ID: <20090814234558.08D1A37D24@smtp-roam.stanford.edu>

Hi All,

Please respond to Jeff's concern.

Paul

>Delivered-To: rissman at stanford.edu
>Date: Fri, 14 Aug 2009 19:27:17 -0400
>From: "King, Jeffrey S" <KingJS at corning.com>
>Subject: Impurity levels for "clean" status
>To: rissman at stanford.edu
>Thread-Topic: Impurity levels for "clean" status
>Thread-Index: AcodNsNQTf/4WjlWQ6aT/xX/VWQoPQ==
>X-MS-Has-Attach:
>X-MS-TNEF-Correlator:
>X-OriginalArrivalTime: 14 Aug 2009 23:27:18.0854 (UTC)
>  FILETIME=[C4139E60:01CA1D36]
>
>Dear Paul,
>
>Gary Trott and I still have not come over to Stanford yet to use the 
>SNF, but I may finally have a need for it in the next couple of 
>months. I have a project in mind that would utilize polycrystalline 
>silicon wafers from a source other than standard wafers, and I would 
>like to use some of the silicon processing tools at SNF on them. 
>What are the maximum impurity levels that we need to make sure that 
>the wafers are below in order to put them in the "clean" tools? 
>Would we have to provide you with samples of the material to test, 
>or if we perform ICP-MS on them and show you the data would that be 
>enough to qualify them?
>
>Best Regards,
>
>Jeff
>
>
>Jeffrey S. King, Ph.D.
>Research Scientist
>Corning West Technology Center
>Corning Incorporated
>1891 Page Mill Road, Suite 100
>Palo Alto, CA 94304
>(650) 846-6017
>



From jprovine at stanford.edu  Tue Aug 25 10:11:50 2009
From: jprovine at stanford.edu (J Provine)
Date: Tue, 25 Aug 2009 10:11:50 -0700 (PDT)
Subject: TiN for ALD Precursors
In-Reply-To: <57053679.88641251220307714.JavaMail.root@zm08.stanford.edu>
Message-ID: <488675763.88741251220310914.JavaMail.root@zm08.stanford.edu>

j
-------------- next part --------------
A non-text attachment was scrubbed...
Name: TDMAT-Ti-MSDSPage.pdf
Type: application/pdf
Size: 60518 bytes
Desc: not available
URL: <http://snf.stanford.edu/pipermail/specmat/attachments/20090825/7d775a8a/attachment.pdf>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: Ammonia-MSDSPage.pdf
Type: application/pdf
Size: 76464 bytes
Desc: not available
URL: <http://snf.stanford.edu/pipermail/specmat/attachments/20090825/7d775a8a/attachment-0001.pdf>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: TiN from Ti(NMe2)4 and NH3.pdf
Type: application/pdf
Size: 194246 bytes
Desc: not available
URL: <http://snf.stanford.edu/pipermail/specmat/attachments/20090825/7d775a8a/attachment-0002.pdf>