Fwd: Impurity levels for "clean" status

Paul Rissman rissman at stanford.edu
Fri Aug 14 16:45:52 PDT 2009

Hi All,

Please respond to Jeff's concern.


>Delivered-To: rissman at stanford.edu
>Date: Fri, 14 Aug 2009 19:27:17 -0400
>From: "King, Jeffrey S" <KingJS at corning.com>
>Subject: Impurity levels for "clean" status
>To: rissman at stanford.edu
>Thread-Topic: Impurity levels for "clean" status
>Thread-Index: AcodNsNQTf/4WjlWQ6aT/xX/VWQoPQ==
>X-OriginalArrivalTime: 14 Aug 2009 23:27:18.0854 (UTC)
>  FILETIME=[C4139E60:01CA1D36]
>Dear Paul,
>Gary Trott and I still have not come over to Stanford yet to use the 
>SNF, but I may finally have a need for it in the next couple of 
>months. I have a project in mind that would utilize polycrystalline 
>silicon wafers from a source other than standard wafers, and I would 
>like to use some of the silicon processing tools at SNF on them. 
>What are the maximum impurity levels that we need to make sure that 
>the wafers are below in order to put them in the "clean" tools? 
>Would we have to provide you with samples of the material to test, 
>or if we perform ICP-MS on them and show you the data would that be 
>enough to qualify them?
>Best Regards,
>Jeffrey S. King, Ph.D.
>Research Scientist
>Corning West Technology Center
>Corning Incorporated
>1891 Page Mill Road, Suite 100
>Palo Alto, CA 94304
>(650) 846-6017

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