From mtang at stanford.edu  Tue Dec  1 14:55:31 2009
From: mtang at stanford.edu (Mary Tang)
Date: Tue, 01 Dec 2009 14:55:31 -0800
Subject: [Fwd: Re: oven]
Message-ID: <4B159EE3.6000506@stanford.edu>

Hi all --

Here is a request from Kat Tsai, refined from the original submission.   
Mahnaz and I have reviewed it.  The plan is to perform mixing and 
chemical handling in the wafersaw room.  The emergency lights have amber 
sleeves and with the windows covered, should provide a uv-protected area 
for mixing photosensitive chemicals (we set it up this way for mixing 
nanoimprint chemicals.)  The powder has to be weighed into vials in a 
still environment.  The SU-8 has to be handled in an exhausted hood and 
added to vials following nickel powder.  These vials will be capped and 
placed in a rotating stirrer placed in an oven.  The plan is to place 
one of Paul jerabek's ovens in the wafersaw room, next to the 
Thermalyne.  Since they will be airtight, exhaust is not needed for this 
specific experiment (although we should plan on it for the future.)

Sound OK?


Mary



-------- Original Message --------
Subject: 	Re: oven
Date: 	Tue, 1 Dec 2009 12:40:37 -0800
From: 	Katherine Tsai <kattsai at stanford.edu>
To: 	mtang at snf.stanford.edu
References: 
<1c62e49d0911301708y32282eebv2d79194b93b50307 at mail.gmail.com> 
<4B14ACDC.8090509 at stanford.edu>



Hi Mary,

I submitted a SpecMat request for the nickel powder a couple of years
ago.  I've modified the process section in the original request (see
attached).  Please let me know if you have any questions.  Thanks so
much for your help!

Best,
Kat

On Mon, Nov 30, 2009 at 9:42 PM, Mary Tang <mtang at stanford.edu> wrote:
> Thanks!  I'll forward your "reminder".  Plans are to do this tomorrow so I
> hope you'll have this by Wednesday.  By the way, would you mind just writing
> out exactly what it is you'll be doing?   I don't remember if you had a
> formal SpecMat request for this -- it would be good to have for the
> records...
>
> Best,
>
> Mary
>
> Katherine Tsai wrote:
>>
>> Hi Mary,
>>
>> This is just a friendly reminder about moving the oven from the AFM
>> room to the wafersaw room, preferably by Wed morning.  Thanks!
>>
>> Best,
>> Kat
>>
>
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From roberth at quswami.com  Mon Dec 14 11:31:49 2009
From: roberth at quswami.com (Robert Huang)
Date: Mon, 14 Dec 2009 11:31:49 -0800
Subject: processing of Ti foil in SNF?
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A18D@QUSWAMI-DSRV1.quswami.local>

SNF Specmat Committee:

I am interested in processing pieces of Ti foil in SNF on the following pieces of equipment:


1)      Wbgeneral for cleaning/rinsing

2)      Innotec for a metal deposition

3)      Tylan 4 (metal-contaminated) for an anneal

The sample size will be <2"x2" (that's currently the total sample size that I will have) and the thickness is 0.25mm (250nm/1mil) .  The source for the material will be Alfa Aesar, and it is 99.99+% purity.  Here is Alfa Aesar's website for this material, and I am attaching their MSDS.

http://www.alfa.com/en/GP100w.pgm?DSSTK=013975

Thanks in advance for taking this into consideration.  I am hoping this is straightforward and can be approved quickly given Ti is already a material commonly used throughout SNF, this material is 99.99+% pure Ti, and the tools that I plan to use are all in the Au-contaminated category.  If any questions, don't hesitate to contact me either by email or phone, roberth at quswami.com<mailto:roberth at quswami.com>, 408-854-0450.

Regards,

Robert Huang
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From roberth at quswami.com  Tue Dec 15 09:05:29 2009
From: roberth at quswami.com (Robert Huang)
Date: Tue, 15 Dec 2009 09:05:29 -0800
Subject: processing of Ti foil in SNF?
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local>

Hi there,

Just one correction to my email, the thickness of the material is 10mils, not 1mil (the dimensions I gave of 0.25mm and 250nm are correct).

Thanks.

Robert

From: Robert Huang
Sent: Monday, December 14, 2009 11:32 AM
To: specmat at snf.stanford.edu
Subject: processing of Ti foil in SNF?

SNF Specmat Committee:

I am interested in processing pieces of Ti foil in SNF on the following pieces of equipment:


1)      Wbgeneral for cleaning/rinsing

2)      Innotec for a metal deposition

3)      Tylan 4 (metal-contaminated) for an anneal

The sample size will be <2"x2" (that's currently the total sample size that I will have) and the thickness is 0.25mm (250nm/1mil) .  The source for the material will be Alfa Aesar, and it is 99.99+% purity.  Here is Alfa Aesar's website for this material, and I am attaching their MSDS.

http://www.alfa.com/en/GP100w.pgm?DSSTK=013975

Thanks in advance for taking this into consideration.  I am hoping this is straightforward and can be approved quickly given Ti is already a material commonly used throughout SNF, this material is 99.99+% pure Ti, and the tools that I plan to use are all in the Au-contaminated category.  If any questions, don't hesitate to contact me either by email or phone, roberth at quswami.com<mailto:roberth at quswami.com>, 408-854-0450.

Regards,

Robert Huang
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From roberth at quswami.com  Tue Dec 15 09:11:21 2009
From: roberth at quswami.com (Robert Huang)
Date: Tue, 15 Dec 2009 09:11:21 -0800
Subject: final correction...RE: processing of Ti foil in SNF?
In-Reply-To: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local>
References: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local>
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.quswami.local>

OK, I think I will get it right this time - for all 3 units:

0.25mm=250um (not nm!)=10mils

Sorry for the confusion and multiple emails.

Robert

From: Robert Huang
Sent: Tuesday, December 15, 2009 9:05 AM
To: Robert Huang; specmat at snf.stanford.edu
Subject: RE: processing of Ti foil in SNF?

Hi there,

Just one correction to my email, the thickness of the material is 10mils, not 1mil (the dimensions I gave of 0.25mm and 250nm are correct).

Thanks.

Robert

From: Robert Huang
Sent: Monday, December 14, 2009 11:32 AM
To: specmat at snf.stanford.edu
Subject: processing of Ti foil in SNF?

SNF Specmat Committee:

I am interested in processing pieces of Ti foil in SNF on the following pieces of equipment:


1)      Wbgeneral for cleaning/rinsing

2)      Innotec for a metal deposition

3)      Tylan 4 (metal-contaminated) for an anneal

The sample size will be <2"x2" (that's currently the total sample size that I will have) and the thickness is 0.25mm (250nm/1mil) .  The source for the material will be Alfa Aesar, and it is 99.99+% purity.  Here is Alfa Aesar's website for this material, and I am attaching their MSDS.

http://www.alfa.com/en/GP100w.pgm?DSSTK=013975

Thanks in advance for taking this into consideration.  I am hoping this is straightforward and can be approved quickly given Ti is already a material commonly used throughout SNF, this material is 99.99+% pure Ti, and the tools that I plan to use are all in the Au-contaminated category.  If any questions, don't hesitate to contact me either by email or phone, roberth at quswami.com<mailto:roberth at quswami.com>, 408-854-0450.

Regards,

Robert Huang
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From mtang at stanford.edu  Tue Dec 15 10:00:18 2009
From: mtang at stanford.edu (Mary Tang)
Date: Tue, 15 Dec 2009 10:00:18 -0800
Subject: final correction...RE: processing of Ti foil in SNF?
In-Reply-To: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.quswami.local>
References: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local> <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.quswami.local>
Message-ID: <4B27CEB2.20503@stanford.edu>

Hi all --


This seems OK to me, with the considerations that the Ti would need to 
be mounted to a carrier wafer for innotec and sit on top of a wafer in 
tylan4. Anything else before we get back to Robert?

M


Robert Huang wrote:
>
> OK, I think I will get it right this time ? for all 3 units:
>
> 0.25mm=250um (not nm!)=10mils
>
> Sorry for the confusion and multiple emails.
>
> Robert
>
> *From:* Robert Huang
> *Sent:* Tuesday, December 15, 2009 9:05 AM
> *To:* Robert Huang; specmat at snf.stanford.edu
> *Subject:* RE: processing of Ti foil in SNF?
>
> Hi there,
>
> Just one correction to my email, the thickness of the material is 
> 10mils, not 1mil (the dimensions I gave of 0.25mm and 250nm are correct).
>
> Thanks.
>
> Robert
>
> *From:* Robert Huang
> *Sent:* Monday, December 14, 2009 11:32 AM
> *To:* specmat at snf.stanford.edu
> *Subject:* processing of Ti foil in SNF?
>
> SNF Specmat Committee:
>
> I am interested in processing pieces of Ti foil in SNF on the 
> following pieces of equipment:
>
> 1) Wbgeneral for cleaning/rinsing
>
> 2) Innotec for a metal deposition
>
> 3) Tylan 4 (metal-contaminated) for an anneal
>
> The sample size will be <2?x2? (that?s currently the total sample size 
> that I will have) and the thickness is 0.25mm (250nm/1mil) . The 
> source for the material will be Alfa Aesar, and it is 99.99+% purity. 
> Here is Alfa Aesar?s website for this material, and I am attaching 
> their MSDS.
>
> http://www.alfa.com/en/GP100w.pgm?DSSTK=013975
>
> Thanks in advance for taking this into consideration. I am hoping this 
> is straightforward and can be approved quickly given Ti is already a 
> material commonly used throughout SNF, this material is 99.99+% pure 
> Ti, and the tools that I plan to use are all in the Au-contaminated 
> category. If any questions, don?t hesitate to contact me either by 
> email or phone, roberth at quswami.com <mailto:roberth at quswami.com>, 
> 408-854-0450.
>
> Regards,
>
> Robert Huang
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From edmyers at stanford.edu  Tue Dec 15 14:55:21 2009
From: edmyers at stanford.edu (Ed Myers)
Date: Tue, 15 Dec 2009 14:55:21 -0800
Subject: final correction...RE: processing of Ti foil in SNF?
In-Reply-To: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.q
 uswami.local>
References: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local>
 <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.quswami.local>
Message-ID: <6.2.5.6.2.20091215145331.04b81a70@stanford.edu>

Robert,

My concern is your anneal temperature.  Ti can 
oxidize extremely fast and the atmospheric tubes 
will have a background of oxygen.  I don't see a 
problem with what you have proposed depending on 
your anneal, which you have not outlined.

Regards,
Ed

At 09:11 AM 12/15/2009, Robert Huang wrote:
>OK, I think I will get it right this time ? for all 3 units:
>
>0.25mm=250um (not nm!)=10mils
>
>Sorry for the confusion and multiple emails.
>
>Robert
>
>From: Robert Huang
>Sent: Tuesday, December 15, 2009 9:05 AM
>To: Robert Huang; specmat at snf.stanford.edu
>Subject: RE: processing of Ti foil in SNF?
>
>Hi there,
>
>Just one correction to my email, the thickness 
>of the material is 10mils, not 1mil (the 
>dimensions I gave of 0.25mm and 250nm are correct).
>
>Thanks.
>
>Robert
>
>From: Robert Huang
>Sent: Monday, December 14, 2009 11:32 AM
>To: specmat at snf.stanford.edu
>Subject: processing of Ti foil in SNF?
>
>SNF Specmat Committee:
>
>I am interested in processing pieces of Ti foil 
>in SNF on the following pieces of equipment:
>
>1)      Wbgeneral for cleaning/rinsing
>2)      Innotec for a metal deposition
>3)      Tylan 4 (metal-contaminated) for an anneal
>
>The sample size will be <2?x2? (that?s currently 
>the total sample size that I will have) and the 
>thickness is 0.25mm (250nm/1mil) .  The source 
>for the material will be Alfa Aesar, and it is 
>99.99+% purity.  Here is Alfa Aesar?s website 
>for this material, and I am attaching their MSDS.
>
><http://www.alfa.com/en/GP100w.pgm?DSSTK=013975>http://www.alfa.com/en/GP100w.pgm?DSSTK=013975
>
>Thanks in advance for taking this into 
>consideration.  I am hoping this is 
>straightforward and can be approved quickly 
>given Ti is already a material commonly used 
>throughout SNF, this material is 99.99+% pure 
>Ti, and the tools that I plan to use are all in 
>the Au-contaminated category.  If any questions, 
>don?t hesitate to contact me either by email or 
>phone, <mailto:roberth at quswami.com>roberth at quswami.com, 408-854-0450.
>
>Regards,
>
>Robert Huang




From roberth at quswami.com  Wed Dec 16 08:53:57 2009
From: roberth at quswami.com (Robert Huang)
Date: Wed, 16 Dec 2009 08:53:57 -0800
Subject: final correction...RE: processing of Ti foil in SNF?
In-Reply-To: <6.2.5.6.2.20091215145331.04b81a70@stanford.edu>
References: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local>
 <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.quswami.local>
 <6.2.5.6.2.20091215145331.04b81a70@stanford.edu>
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1B9@QUSWAMI-DSRV1.quswami.local>

Hi Ed,

Thanks for the reply.  We expect the anneal condition to be between 400C and 600C for several hours.

Regards,

Robert

-----Original Message-----
From: Ed Myers [mailto:edmyers at stanford.edu] 
Sent: Tuesday, December 15, 2009 2:55 PM
To: Robert Huang; specmat at snf.stanford.edu
Subject: Re: final correction...RE: processing of Ti foil in SNF?

Robert,

My concern is your anneal temperature.  Ti can 
oxidize extremely fast and the atmospheric tubes 
will have a background of oxygen.  I don't see a 
problem with what you have proposed depending on 
your anneal, which you have not outlined.

Regards,
Ed

At 09:11 AM 12/15/2009, Robert Huang wrote:
>OK, I think I will get it right this time - for all 3 units:
>
>0.25mm=250um (not nm!)=10mils
>
>Sorry for the confusion and multiple emails.
>
>Robert
>
>From: Robert Huang
>Sent: Tuesday, December 15, 2009 9:05 AM
>To: Robert Huang; specmat at snf.stanford.edu
>Subject: RE: processing of Ti foil in SNF?
>
>Hi there,
>
>Just one correction to my email, the thickness 
>of the material is 10mils, not 1mil (the 
>dimensions I gave of 0.25mm and 250nm are correct).
>
>Thanks.
>
>Robert
>
>From: Robert Huang
>Sent: Monday, December 14, 2009 11:32 AM
>To: specmat at snf.stanford.edu
>Subject: processing of Ti foil in SNF?
>
>SNF Specmat Committee:
>
>I am interested in processing pieces of Ti foil 
>in SNF on the following pieces of equipment:
>
>1)      Wbgeneral for cleaning/rinsing
>2)      Innotec for a metal deposition
>3)      Tylan 4 (metal-contaminated) for an anneal
>
>The sample size will be <2"x2" (that's currently 
>the total sample size that I will have) and the 
>thickness is 0.25mm (250nm/1mil) .  The source 
>for the material will be Alfa Aesar, and it is 
>99.99+% purity.  Here is Alfa Aesar's website 
>for this material, and I am attaching their MSDS.
>
><http://www.alfa.com/en/GP100w.pgm?DSSTK=013975>http://www.alfa.com/en/GP100w.pgm?DSSTK=013975
>
>Thanks in advance for taking this into 
>consideration.  I am hoping this is 
>straightforward and can be approved quickly 
>given Ti is already a material commonly used 
>throughout SNF, this material is 99.99+% pure 
>Ti, and the tools that I plan to use are all in 
>the Au-contaminated category.  If any questions, 
>don't hesitate to contact me either by email or 
>phone, <mailto:roberth at quswami.com>roberth at quswami.com, 408-854-0450.
>
>Regards,
>
>Robert Huang




From nlatta at stanford.edu  Wed Dec 16 14:09:06 2009
From: nlatta at stanford.edu (Nancy Latta)
Date: Wed, 16 Dec 2009 14:09:06 -0800
Subject: [POSSIBLE VIRUS:###] [Fwd: FW: HgTe Etch in MRC Etcher]
Message-ID: <14103_1261001350_4B295A86_14103_126_1_4B295A82.5040001@stanford.edu>


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