From nppatil at stanford.edu  Tue May 12 14:25:19 2009
From: nppatil at stanford.edu (Nishant Parag Patil)
Date: Tue, 12 May 2009 14:25:19 -0700 (PDT)
Subject: Scandium MSDS
In-Reply-To: <6.2.5.6.2.20071126135431.03de6bf0@stanford.edu>
Message-ID: <829730604.3331781242163519033.JavaMail.root@zm06.stanford.edu>

Ed,

Here are some more Scandium MSDS sheets.

Scandium is similar to Erbium which has been approved for Innotec.

The Scandium wafers will be limited to gold-contaminated equipment.

Thanks,
Nishant


----- Original Message -----
From: Ed Myers <edmyers at stanford.edu>
To: Nishant Patil <nppatil at stanford.edu>
Sent: Mon, 26 Nov 2007 13:56:28 -0800 (PST)
Subject: Re: Scandium MSDS

Nishant,

Part of a specmat request must include where the material will flow 
through the fab.

Have you read the MSDS sheets?  Aren't you worried about the toxicity 
levels and the potential for explosion?  You should also look at 
other MSDS sources than the second source suppliers.  They often 
understate the material properties.

Ed


At 09:57 AM 11/26/2007, you wrote:
>Hi,
>
>I would like to use the Innotec to evaporate the metal Scandium. The 
>MSDS for Scandium and Scandium powder is attached.
>
>Thanks,
>Nishant
>



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From edmyers at stanford.edu  Thu May 14 14:14:40 2009
From: edmyers at stanford.edu (Ed Myers)
Date: Thu, 14 May 2009 14:14:40 -0700
Subject: spec mat request
In-Reply-To: <e879d48f0905071742q17a13e61p98a68be18486857a@mail.gmail.co
 m>
References: <e879d48f0905071742q17a13e61p98a68be18486857a@mail.gmail.com>
Message-ID: <6.2.5.6.2.20090514141341.027b09f8@stanford.edu>

Rostam,

Go for it.  I do not have a Pt target for the SCT.  With current Pt 
prices, it's going to be expensive.

Ed

At 05:42 PM 5/7/2009, Rostam Dinyari wrote:
>Ed,
>
>My emails bounce back from 
><mailto:spectmat at snf.stanford.edu>spectmat at snf.stanford.edu, so I 
>sent it to you directly.
>I would like to do lift off of Ti/Cr (and maybe later Ti/Pt) in SCT. 
>I'd appreciate it if you can let me know if it's possible by the end 
>of next week 5/15.
>
>The reason for this request is that I want to do lift off of Ti/Cr 
>(or Ti/Pt) and then be able to deposit LTO400 in tylanbpsg.
>
>Thanks,
>Rostam




From kibs at stanford.edu  Mon May 18 10:49:29 2009
From: kibs at stanford.edu (Jakob Kibsgaard)
Date: Mon, 18 May 2009 10:49:29 -0700 (PDT)
Subject: Dihydrogen hexachloroplatinate(IV) hydrate
In-Reply-To: <1931480588.3306171242668879963.JavaMail.root@zm05.stanford.edu>
Message-ID: <1361761063.3306551242668969501.JavaMail.root@zm05.stanford.edu>

Hello,

I would like to bring in a water solution containing dihydrogen hexachloroplatinate(IV) hydrate. The details are given below:


1. Your contact information: 
Name: 		Jakob Kibsgaard 
Coral login: 	kibs  
phone number 	650-739-5617 
email address: 	kibs at stanford.edu  
PI: 		Thomas F. Jaramillo

2. The chemical or material:
Dihydrogen hexachloroplatinate(IV) hydrate

3. Other names, CAS#, MSDS:
Chloroplatinic acid, chloroplatinic acid hexahydrate
CAS# 26023-84-7
MSDS is attached

4. Vendor/manufacturer info: 
Alfa Aesar, A Johnson Matthey Company
Johnson Matthey Catalog Company, Inc.
30 Bond Street
Ward Hill, MA 01835-8099
Emergency Phone: (978) 521-6300
CHEMTREC: (800) 424-9300
Web Site: www.alfa.com

5. Reason for request:
Galvanic deposition of Pt on silicon and siliconcarbide samples using a solution of HF and dihydrogen hexachloroplatinate(IV) hydrate. 

6. Process Flow: 

Experiment 1:
Dip silicon/siliconcarbide sample in:
(1)	2% hydrofluoric acid 
(2)	Water
(3)	1mM dihydrogen hexachloroplatinate(IV) hydrate
(4)	Water

Experiment 2:
Dip silicon/siliconcarbide sample in:
(1)	2% hydrofluoric acid 
(2)	Solution of 2% hydrofluoric acid and 1mM dihydrogen hexachloroplatinate(IV) hydrate
(3)	Water

Experiment 3:
Dip silicon/siliconcarbide sample in:
(1)	Solution of 2% hydrofluoric acid and 1mM dihydrogen hexachloroplatinate(IV) hydrate
(2)	Water

All experiments will be performed at wbgeneral using  the ?gold contaminated labware?.

7. Amount and form. 
Liquid: The dihydrogen hexachloroplatinate(IV) hydrate will be dissolved in water (concentration: 1mM) before bringing it to SNF.
For experiment 2 and 3 the dihydrogen hexachloroplatinate(IV) hydrate solution will be mixed with 2% hydrofluoric acid.

8. Storage: 
I will not store the chemical at SNF.

9. Disposal: 
Solutions containing HF: HF drain
Any dihydrogen hexachloroplatinate(IV) hydrate solution not mixed with HF will be brought back to our own lab or placed in waste containers and sent out for hazardous waste disposal. 


Best Regards,
Jakob

-------------------------
Jakob Kibsgaard, PhD
Dept. of Chemical Engineering
Keck Science Building, Room 264
Stanford University
Stanford, CA 94305-5025
USA

Office Phone: +1 650-725-9727
Cell Phone:   +1 650-739-5617
e-mail: kibs at stanford.edu
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From mtang at stanford.edu  Mon May 18 13:06:47 2009
From: mtang at stanford.edu (Mary Tang)
Date: Mon, 18 May 2009 13:06:47 -0700
Subject: Dihydrogen hexachloroplatinate(IV) hydrate
In-Reply-To: <1361761063.3306551242668969501.JavaMail.root@zm05.stanford.edu>
References: <1361761063.3306551242668969501.JavaMail.root@zm05.stanford.edu>
Message-ID: <4A11BFD7.8000207@stanford.edu>

Hi Jakob --

A couple of things.  First, thanks for recognizing the policy on powders 
and crystals in the lab and arranging to mix up the chemical outside the 
cleanroom.  (We do have a small bench area outside the lab, if you want 
to make up your stock solution there.)

Second, when you say "galvanic deposition", this generally means you are 
using a power supply to provide potential energy for the reaction - 
i.e., electroplating.  If this is the case, then we really need to talk 
in detail about your experimental setup.

So, let us know about the power supply --

Thanks,

Mary


Jakob Kibsgaard wrote:
> Hello,
>
> I would like to bring in a water solution containing dihydrogen hexachloroplatinate(IV) hydrate. The details are given below:
>
>
> 1. Your contact information: 
> Name: 		Jakob Kibsgaard 
> Coral login: 	kibs  
> phone number 	650-739-5617 
> email address: 	kibs at stanford.edu  
> PI: 		Thomas F. Jaramillo
>
> 2. The chemical or material:
> Dihydrogen hexachloroplatinate(IV) hydrate
>
> 3. Other names, CAS#, MSDS:
> Chloroplatinic acid, chloroplatinic acid hexahydrate
> CAS# 26023-84-7
> MSDS is attached
>
> 4. Vendor/manufacturer info: 
> Alfa Aesar, A Johnson Matthey Company
> Johnson Matthey Catalog Company, Inc.
> 30 Bond Street
> Ward Hill, MA 01835-8099
> Emergency Phone: (978) 521-6300
> CHEMTREC: (800) 424-9300
> Web Site: www.alfa.com
>
> 5. Reason for request:
> Galvanic deposition of Pt on silicon and siliconcarbide samples using a solution of HF and dihydrogen hexachloroplatinate(IV) hydrate. 
>
> 6. Process Flow: 
>
> Experiment 1:
> Dip silicon/siliconcarbide sample in:
> (1)	2% hydrofluoric acid 
> (2)	Water
> (3)	1mM dihydrogen hexachloroplatinate(IV) hydrate
> (4)	Water
>
> Experiment 2:
> Dip silicon/siliconcarbide sample in:
> (1)	2% hydrofluoric acid 
> (2)	Solution of 2% hydrofluoric acid and 1mM dihydrogen hexachloroplatinate(IV) hydrate
> (3)	Water
>
> Experiment 3:
> Dip silicon/siliconcarbide sample in:
> (1)	Solution of 2% hydrofluoric acid and 1mM dihydrogen hexachloroplatinate(IV) hydrate
> (2)	Water
>
> All experiments will be performed at wbgeneral using  the ?gold contaminated labware?.
>
> 7. Amount and form. 
> Liquid: The dihydrogen hexachloroplatinate(IV) hydrate will be dissolved in water (concentration: 1mM) before bringing it to SNF.
> For experiment 2 and 3 the dihydrogen hexachloroplatinate(IV) hydrate solution will be mixed with 2% hydrofluoric acid.
>
> 8. Storage: 
> I will not store the chemical at SNF.
>
> 9. Disposal: 
> Solutions containing HF: HF drain
> Any dihydrogen hexachloroplatinate(IV) hydrate solution not mixed with HF will be brought back to our own lab or placed in waste containers and sent out for hazardous waste disposal. 
>
>
> Best Regards,
> Jakob
>
> -------------------------
> Jakob Kibsgaard, PhD
> Dept. of Chemical Engineering
> Keck Science Building, Room 264
> Stanford University
> Stanford, CA 94305-5025
> USA
>
> Office Phone: +1 650-725-9727
> Cell Phone:   +1 650-739-5617
> e-mail: kibs at stanford.edu


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From mtang at stanford.edu  Tue May 19 13:04:56 2009
From: mtang at stanford.edu (Mary Tang)
Date: Tue, 19 May 2009 13:04:56 -0700
Subject: Dihydrogen hexachloroplatinate(IV) hydrate
In-Reply-To: <1361761063.3306551242668969501.JavaMail.root@zm05.stanford.edu>
References: <1361761063.3306551242668969501.JavaMail.root@zm05.stanford.edu>
Message-ID: <4A1310E8.3030600@stanford.edu>

Hi Jakob --

Your request is approved, with the following:

1.  To bring your solution into the lab, first make sure to obtain a personal chemicals yellow label (ask Mahnaz, Ed, or me) and log your chemical on the logsheet.  Label your chemical.

2.  Place your chemical in the top shelf (for personal chemicals) in the chemicals pass-through, from the corridor side (ask a Staff member to open it).  You can access the chemical from inside the lab.

3.  Please dispose of your non-HF containing solution in a properly labeled hazardous waste container.  Follow standard wbgeneral operating procedures (check with Uli if you need a refresher.)  I'd suggest making up enough for your experiment and don't bother transporting back to your own lab for disposal.

4.  We're assuming these are relatively small amounts we're talking about here (no more than a couple hundred ml or so, not liters), correct?

Thanks,


Mary




Hi Mary,

Yes, the term "galvanic deposition" may be misleading, a blunder from my side. I will not require a power supply. The experimental procedure is simply to dip my silicon/silicon-carbide samples in the beaker containing the HF/Dihydrogen hexachloroplatinate(IV) hydrate solution. 

Best,
- Jakob



Jakob Kibsgaard wrote:
> Hello,
>
> I would like to bring in a water solution containing dihydrogen hexachloroplatinate(IV) hydrate. The details are given below:
>
>
> 1. Your contact information: 
> Name: 		Jakob Kibsgaard 
> Coral login: 	kibs  
> phone number 	650-739-5617 
> email address: 	kibs at stanford.edu  
> PI: 		Thomas F. Jaramillo
>
> 2. The chemical or material:
> Dihydrogen hexachloroplatinate(IV) hydrate
>
> 3. Other names, CAS#, MSDS:
> Chloroplatinic acid, chloroplatinic acid hexahydrate
> CAS# 26023-84-7
> MSDS is attached
>
> 4. Vendor/manufacturer info: 
> Alfa Aesar, A Johnson Matthey Company
> Johnson Matthey Catalog Company, Inc.
> 30 Bond Street
> Ward Hill, MA 01835-8099
> Emergency Phone: (978) 521-6300
> CHEMTREC: (800) 424-9300
> Web Site: www.alfa.com
>
> 5. Reason for request:
> Galvanic deposition of Pt on silicon and siliconcarbide samples using a solution of HF and dihydrogen hexachloroplatinate(IV) hydrate. 
>
> 6. Process Flow: 
>
> Experiment 1:
> Dip silicon/siliconcarbide sample in:
> (1)	2% hydrofluoric acid 
> (2)	Water
> (3)	1mM dihydrogen hexachloroplatinate(IV) hydrate
> (4)	Water
>
> Experiment 2:
> Dip silicon/siliconcarbide sample in:
> (1)	2% hydrofluoric acid 
> (2)	Solution of 2% hydrofluoric acid and 1mM dihydrogen hexachloroplatinate(IV) hydrate
> (3)	Water
>
> Experiment 3:
> Dip silicon/siliconcarbide sample in:
> (1)	Solution of 2% hydrofluoric acid and 1mM dihydrogen hexachloroplatinate(IV) hydrate
> (2)	Water
>
> All experiments will be performed at wbgeneral using  the ?gold contaminated labware?.
>
> 7. Amount and form. 
> Liquid: The dihydrogen hexachloroplatinate(IV) hydrate will be dissolved in water (concentration: 1mM) before bringing it to SNF.
> For experiment 2 and 3 the dihydrogen hexachloroplatinate(IV) hydrate solution will be mixed with 2% hydrofluoric acid.
>
> 8. Storage: 
> I will not store the chemical at SNF.
>
> 9. Disposal: 
> Solutions containing HF: HF drain
> Any dihydrogen hexachloroplatinate(IV) hydrate solution not mixed with HF will be brought back to our own lab or placed in waste containers and sent out for hazardous waste disposal. 
>
>
> Best Regards,
> Jakob
>
> -------------------------
> Jakob Kibsgaard, PhD
> Dept. of Chemical Engineering
> Keck Science Building, Room 264
> Stanford University
> Stanford, CA 94305-5025
> USA
>
> Office Phone: +1 650-725-9727
> Cell Phone:   +1 650-739-5617
> e-mail: kibs at stanford.edu


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From mtang at stanford.edu  Wed May 20 15:01:28 2009
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 20 May 2009 15:01:28 -0700
Subject: Magnetic Polymer in Metallica?
In-Reply-To: <6fb9796f0905201441s42759d38o429483a808f23f23@mail.gmail.com>
References: <6fb9796f0905201441s42759d38o429483a808f23f23@mail.gmail.com>
Message-ID: <4A147DB8.2040605@stanford.edu>

Hi Nathan --

I don't think this is a problem, but am forwarding to SpecMat, just for 
the record.  Jeannie, Ed, what do you think?

Mary

Nathan K wrote:
> Metal Quality Circle,
>
> I would like to try sputtering metal using Metallica on my printed
> polystyrene-iron composite material (the same material that caused no
> trouble in XeF2 (see attached)) on silicon substrates to do metal
> liftoff.  The polymer shows excellent adhesion to the substrate, so
> there should be no particulate problems, withstands temperatures up to
> 100C, and is solvent free, so there should be minimal outgassing.  Do
> you forsee any problems, or can I go ahead and run a test?  I would
> appreciate your input.
>
> Regards,
> Nathan Klejwa
>   
>
> ------------------------------------------------------------------------
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From jperez at snf.stanford.edu  Thu May 21 07:49:31 2009
From: jperez at snf.stanford.edu (Jeannie Perez)
Date: Thu, 21 May 2009 07:49:31 -0700
Subject: Magnetic Polymer in Metallica?
In-Reply-To: <4A147DB8.2040605@stanford.edu>
References: <6fb9796f0905201441s42759d38o429483a808f23f23@mail.gmail.com>
 <4A147DB8.2040605@stanford.edu>
Message-ID: <6.2.5.6.2.20090521074844.00bb7328@snf.stanford.edu>

Hi,
I also don't see a problem with this process in Metalica.
Jeannie

At 03:01 PM 5/20/2009, Mary Tang wrote:
>Hi Nathan --
>
>I don't think this is a problem, but am forwarding to SpecMat, just 
>for the record.  Jeannie, Ed, what do you think?
>
>Mary
>
>Nathan K wrote:
>>Metal Quality Circle,
>>
>>I would like to try sputtering metal using Metallica on my printed
>>polystyrene-iron composite material (the same material that caused no
>>trouble in XeF2 (see attached)) on silicon substrates to do metal
>>liftoff.  The polymer shows excellent adhesion to the substrate, so
>>there should be no particulate problems, withstands temperatures up to
>>100C, and is solvent free, so there should be minimal outgassing.  Do
>>you forsee any problems, or can I go ahead and run a test?  I would
>>appreciate your input.
>>
>>Regards,
>>Nathan Klejwa
>>
>>
>>------------------------------------------------------------------------
>
>
>--
>Mary X. Tang, Ph.D.
>Stanford Nanofabrication Facility
>CIS Room 136, Mail Code 4070
>Stanford, CA  94305
>(650)723-9980
>mtang at stanford.edu
>http://snf.stanford.edu
>

Jeannie Perez
Science and Engineering Technician
Stanford Nanofabrication Facility
Stanford University
Tel: (650) 723-7997
Fax: (650) 725-6278

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From mtang at stanford.edu  Thu May 28 17:24:24 2009
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 28 May 2009 17:24:24 -0700
Subject: [Fwd: ErGd/Ox wafers for POCL]
Message-ID: <4A1F2B38.2030801@stanford.edu>

Hi all --

This is the start of a specmat request from Aleta.  As I understand it, 
these are considered electronics grade clean films.  At my request, she 
looked into TXRF measurements -- I'll forward you her response, which 
I've just received.

Mary

-------- Original Message --------
Subject: 	ErGd/Ox wafers for POCL
Date: 	Wed, 20 May 2009 17:53:28 -0700
From: 	Aleta Jamora <artyjamo at gmail.com>
To: 	Mary Tang <mtang at stanford.edu>



Hi Mary,
 
     A few weeks ago I asked you about processing some silicon wafers 
that have a coating of Erbium Gadolinium Oxide on them in the POCL 
tube.  You said that it might be possible on a scheduled basis,  if we 
could provide sufficient and acceptable information about our wafers 
regarding safety and contamination issues.    From what I can remember 
from our conversation, I need to give you MSDS sheets,  information on 
volatility, and XRF data.    We grow single crystal Erbium Gadolinium 
oxide films on Si wafers using MBE.    We have MSDS sheets for Erbium 
and Gadolinium oxides in thier powdered forms and I am attaching 
them. there are no MSDS sheets for the  single crystal  films 
themselves.  If approved we would be processing the wafers at 900 
degrees in the POCL tube (the same temperature that the films on the 
wafers are grown at)  and the films are stable at this temperature.  
 From the properties of Erbium and Gadolinium oxides we expect 
the stability to be much higher.    We are working on getting the XRF 
data to show any potential contaminants.  Would you be able to look over 
the MSDS sheets and let me know what other specific information you 
might need. 
 
Much Thanks,
 
-Aleta
 
 
 
 
 
 
 

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From mtang at stanford.edu  Thu May 28 17:25:41 2009
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 28 May 2009 17:25:41 -0700
Subject: [Fwd: Fwd: FW: TXRF measurements]
Message-ID: <4A1F2B85.1070402@stanford.edu>

Hi all --

What do you think of glow discharge mass spec as an assay for trace 
contaminants?  I've not a clue.

Mary

-------- Original Message --------
Subject: 	Fwd: FW: TXRF measurements
Date: 	Thu, 28 May 2009 17:21:25 -0700
From: 	Aleta Jamora <artyjamo at gmail.com>
To: 	Mary Tang <mtang at stanford.edu>
References: 
<AD77C2DFAF33994E83AA9AAF3DB4FD951265CC at server01.xlucent.local>



Hi Mary,
 
          We contacted Evans Analytical Group and asked them if they 
could do tXRF on one of our rare earth oxide wafers and their response 
was that it was not an appropriate technique for rare earth oxides as 
the peaks associated with the rare earth metals  drown out any signals 
from the contaminants that we are looking for.   They maintain that the 
glow discharge mass spec would be the best technique.  Here is an EAG 
link discussing thier GDMS services, it also has some links to technical 
notes at the bottom. 
 
_http://www.eaglabs.com/techniques/analytical_techniques/gdms.php_

 

When we spoke yesterday you said that  the details and conditions of the 
GDMS analysis could be very different and it is important to know 
exactly what conditions are used.    If we were to provide GDMS analysis 
data, is there a specific set of conditions that you are looking for so 
that we can ask Evans to do the way you would like it to be?

I am forwarding our correspondance with Evans.  

 

Much thanks,

-Aleta 



---------- Forwarded message ----------
From: *Aleta Jamora* <aleta at translucentinc.com 
<mailto:aleta at translucentinc.com>>
Date: Thu, May 28, 2009 at 5:05 PM
Subject: FW: TXRF measurements
To: artyjamo at gmail.com <mailto:artyjamo at gmail.com>




-----Original Message-----
From: Lori Bisaha [mailto:lbisaha at eaglabs.com <mailto:lbisaha at eaglabs.com>]
Sent: Thursday, May 28, 2009 3:45 PM
To: Richard Sewell
Cc: Operations Desk at EAG
Subject: RE: TXRF measurements

Richard,
TXRF analysis of a rare earth film is not practical.  The rare earths
produce numerous peaks and at matrix level, the spectrum is dominated by
them.  Peaks of elements present at lower levels are either completely
obscured or the detection limits are far too high to be useful.
You might want to speak to Jim Norberg (408-530-3758) about the specific
aim of your analysis and possible alternative methods.
Best regards,
Lori

-----Original Message-----
From: Richard Sewell [mailto:richard at translucentinc.com 
<mailto:richard at translucentinc.com>]
Sent: Wednesday, May 27, 2009 5:08 PM
To: info
Subject: TXRF measurements

Hi,

I need to get one TXRF measurement done on a 100mm diameter silicon
wafer coated with a rare-earth oxide layer. We have an open PO with EAG
that this will be charged to. Can you please put me in touch with
someone for a quick discussion of the measurement.

Regards,

Richard

--
Richard Sewell

Director of Technology, Translucent Inc
952 Commercial Street Palo Alto CA 94303 e-mail
richard at translucentinc.com <mailto:richard at translucentinc.com> Tel 
650-213-9311 x225 Fax 650-213-9511 Cell
650-644-8700








-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu


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From mtang at stanford.edu  Fri May 29 11:47:05 2009
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 29 May 2009 11:47:05 -0700
Subject: [Fwd: Fwd: FW: GDMS results]
Message-ID: <4A202DA9.2070403@stanford.edu>

Hi all --

I got some clarification from Aleta.  She says this is GDMS analysis on 
the starting materials only, but that they can run the same analysis on 
their deposited MBE films,  if we agree this type of analysis provides 
sufficient confidence that a "good" result will qualify this as 
acceptable as "clean" material. 

So, should we go ahead and ask them to get GDMS done on their deposited 
film to qualify for clean processing at SNF?

Mary

-------- Original Message --------
Subject: 	Fwd: FW: GDMS results
Date: 	Thu, 28 May 2009 17:29:07 -0700
From: 	Aleta Jamora <artyjamo at gmail.com>
To: 	Mary Tang <mtang at stanford.edu>
References: 
<AD77C2DFAF33994E83AA9AAF3DB4FD951265CD at server01.xlucent.local>



Hi Mary,
 
   We have had some GDMS analysis on our films and the results are 
attached to this e-mail.  I am sending this as an example, we will/can 
get another GDMS done if the data in this result looks okay to you.
 
I  will write up the Spec Mat request as soon as we know (and get) what 
kind of contamination analysis data will be acceptable for Spec Mat review.
 
thanks,
Aleta

-----Original Message-----
From: Richard Sewell
Sent: Thursday, May 28, 2009 5:12 PM
To: Aleta Jamora
Subject: GDMS results


--
Richard Sewell

Director of Technology, Translucent Inc
952 Commercial Street Palo Alto CA 94303
e-mail richard at translucentinc.com <mailto:richard at translucentinc.com>
Tel 650-213-9311 x225
Fax 650-213-9511
Cell 650-644-8700





-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu


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