[Fwd: ErGd/Ox wafers for POCL]

Mary Tang mtang at stanford.edu
Thu May 28 17:24:24 PDT 2009


Hi all --

This is the start of a specmat request from Aleta.  As I understand it, 
these are considered electronics grade clean films.  At my request, she 
looked into TXRF measurements -- I'll forward you her response, which 
I've just received.

Mary

-------- Original Message --------
Subject: 	ErGd/Ox wafers for POCL
Date: 	Wed, 20 May 2009 17:53:28 -0700
From: 	Aleta Jamora <artyjamo at gmail.com>
To: 	Mary Tang <mtang at stanford.edu>



Hi Mary,
 
     A few weeks ago I asked you about processing some silicon wafers 
that have a coating of Erbium Gadolinium Oxide on them in the POCL 
tube.  You said that it might be possible on a scheduled basis,  if we 
could provide sufficient and acceptable information about our wafers 
regarding safety and contamination issues.    From what I can remember 
from our conversation, I need to give you MSDS sheets,  information on 
volatility, and XRF data.    We grow single crystal Erbium Gadolinium 
oxide films on Si wafers using MBE.    We have MSDS sheets for Erbium 
and Gadolinium oxides in thier powdered forms and I am attaching 
them. there are no MSDS sheets for the  single crystal  films 
themselves.  If approved we would be processing the wafers at 900 
degrees in the POCL tube (the same temperature that the films on the 
wafers are grown at)  and the films are stable at this temperature.  
 From the properties of Erbium and Gadolinium oxides we expect 
the stability to be much higher.    We are working on getting the XRF 
data to show any potential contaminants.  Would you be able to look over 
the MSDS sheets and let me know what other specific information you 
might need. 
 
Much Thanks,
 
-Aleta
 
 
 
 
 
 
 

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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